Takahiko Moriya

Person

Yokohama, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method of cleaning reaction tube and exhaustion piping system in he...
- Patent number 5,637,153
- Issue date Jun 10, 1997
- Tokyo Electron Limited
- Reiji Niino
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming a conductive film on an insulating region of a su...
- Patent number 5,580,615
- Issue date Dec 3, 1996
- Kabushiki Kaisha Toshiba
- Hitoshi Itoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of cleaning reaction tube
- Patent number 5,380,370
- Issue date Jan 10, 1995
- Tokyo Electron Limited
- Reiji Niino
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vertically oriented CVD apparatus including gas inlet tube having g...
- Patent number 5,252,133
- Issue date Oct 12, 1993
- Kabushiki Kaisha Toshiba
- Shinji Miyazaki
- C30 - CRYSTAL GROWTH
Information Patent Grant
Method of manufacturing silicon nitride film
- Patent number 5,234,869
- Issue date Aug 10, 1993
- Kabushiki Kaisha Toshiba
- Yuuichi Mikata
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming refractory metal film
- Patent number 5,223,455
- Issue date Jun 29, 1993
- Kabushiki Kaisha Toshiba
- Hitoshi Itoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vertical heat treatment apparatus
- Patent number 5,048,800
- Issue date Sep 17, 1991
- Kabushiki Kaisha Toshiba
- Shinji Miyazaki
- C30 - CRYSTAL GROWTH
Information Patent Grant
Film forming method and film forming device
- Patent number 5,015,330
- Issue date May 14, 1991
- Kabushiki Kaisha Toshiba
- Katsuya Okumura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for producing semiconductor device including a refractory me...
- Patent number 4,957,880
- Issue date Sep 18, 1990
- Kabushiki Kaisha Toshiba
- Hitoshi Itoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming thin film of refractory material
- Patent number 4,746,549
- Issue date May 24, 1988
- Kabushiki Kaisha Toshiba
- Hitoshi Ito
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device
- Patent number 4,699,801
- Issue date Oct 13, 1987
- Kabuskiki Kaisha Toshiba
- Hitoshi Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a thin film of a metal or metal compound on a sub...
- Patent number 4,650,698
- Issue date Mar 17, 1987
- Kabushiki Kaisha Toshiba
- Takahiko Moriya
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming a metal film on a selectively diffused layer
- Patent number 4,597,167
- Issue date Jul 1, 1986
- Kabushiki Kaisha Toshiba
- Takahiko Moriya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for forming multi-layer interconnections
- Patent number 4,582,563
- Issue date Apr 15, 1986
- Kabushiki Kaisha Toshiba
- Yoshikazu Hazuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for producing semiconductor device
- Patent number 4,377,438
- Issue date Mar 22, 1983
- Tokyo Shibaura Denki Kabushiki Kaisha
- Takahiko Moriya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a semiconductor device by forming a tungste...
- Patent number 4,283,439
- Issue date Aug 11, 1981
- Vlsi Technology Research Association
- Iwao Higashinakagawa
- H01 - BASIC ELECTRIC ELEMENTS

Takahiko Moriya

Person

Patents Grantslast 30 patents

Method of cleaning reaction tube and exhaustion piping system in he...

Method of forming a conductive film on an insulating region of a su...

Method of cleaning reaction tube

Vertically oriented CVD apparatus including gas inlet tube having g...

Method of manufacturing silicon nitride film

Method of forming refractory metal film

Vertical heat treatment apparatus

Film forming method and film forming device

Method for producing semiconductor device including a refractory me...

Method for forming thin film of refractory material

Semiconductor device

Method of forming a thin film of a metal or metal compound on a sub...

Method of forming a metal film on a selectively diffused layer

Process for forming multi-layer interconnections

Method for producing semiconductor device

Method of manufacturing a semiconductor device by forming a tungste...