Takahiro Dazai

Person

Kawasaki, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Resin composition for forming phase-separated structure, method for...
- Patent number 11,780,948
- Issue date Oct 10, 2023
- Tokyo Ohka Kogyo Co., Ltd.
- Ken Miyagi
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Resin composition for forming phase-separated structure, method for...
- Patent number 11,472,956
- Issue date Oct 18, 2022
- Tokyo Ohka Kogyo Co., Ltd.
- Teruaki Hayakawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resin composition for forming phase-separated structure, method for...
- Patent number 11,466,114
- Issue date Oct 11, 2022
- Tokyo Ohka Kogyo Co., Ltd.
- Ken Miyagi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method of producing structure containing phase-separated structure
- Patent number 10,995,234
- Issue date May 4, 2021
- Tokyo Ohka Kogyo Co., Ltd.
- Takahiro Dazai
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of forming resist pattern
- Patent number 9,690,194
- Issue date Jun 27, 2017
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi Nakamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of producing structure containing phase-separated structure...
- Patent number 9,644,110
- Issue date May 9, 2017
- Tokyo Ohka Kogyo Co., Ltd.
- Takehiro Seshimo
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Resist composition, method of forming resist pattern, polymeric com...
- Patent number 9,606,433
- Issue date Mar 28, 2017
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshiyuki Utsumi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Undercoat agent and method of producing structure containing phase-...
- Patent number 9,567,477
- Issue date Feb 14, 2017
- Tokyo Ohka Kogyo Co., Ltd.
- Takehiro Seshimo
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method of producing structure containing phase-separated structure,...
- Patent number 9,442,371
- Issue date Sep 13, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Takehiro Seshimo
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Polymerization method of high-molecular weight compound, resist com...
- Patent number 9,383,642
- Issue date Jul 5, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Takahiro Dazai
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method of producing structure containing phase-separated structure,...
- Patent number 9,206,307
- Issue date Dec 8, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Tasuku Matsumiya
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of producing structure containing phase-separation structure...
- Patent number 9,188,869
- Issue date Nov 17, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Takehiro Seshimo
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and method for forming resist pattern
- Patent number 9,122,157
- Issue date Sep 1, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Masatoshi Arai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compound, radical polymerization initiator, method for producing co...
- Patent number 9,097,971
- Issue date Aug 4, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshiyuki Utsumi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Substrate provided with metal nanostructure on surface thereof and...
- Patent number 9,051,648
- Issue date Jun 9, 2015
- Riken
- Shigenori Fujikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming polymeric compound, resist composition and method...
- Patent number 9,023,580
- Issue date May 5, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Daiju Shiono
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Primer and pattern forming method for layer including block copolymer
- Patent number 8,999,631
- Issue date Apr 7, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Takahiro Senzaki
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method of producing polymeric compound, resist composition, and met...
- Patent number 8,987,386
- Issue date Mar 24, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshiyuki Utsumi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Primer and pattern forming method for layer including block copolymer
- Patent number 8,956,810
- Issue date Feb 17, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Takahiro Senzaki
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Fluorine-containing block copolymeric compound
- Patent number 8,846,838
- Issue date Sep 30, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Tasuku Matsumiya
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Resist composition, method of forming resist pattern and polymeric...
- Patent number 8,795,948
- Issue date Aug 5, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Takahiro Dazai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative resist composition, method of forming resist pattern and p...
- Patent number 8,771,921
- Issue date Jul 8, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Abe Sho
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition for immersion exposure, method of forming resist...
- Patent number 8,742,038
- Issue date Jun 3, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Daiju Shiono
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition for immersion exposure, method of forming resist...
- Patent number 8,642,244
- Issue date Feb 4, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Daiju Shiono
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Method of forming resist pattern and negative tone-development resi...
- Patent number 8,632,960
- Issue date Jan 21, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoyuki Hirano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition, method of forming resist pattern, and...
- Patent number 8,541,529
- Issue date Sep 24, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Takahiro Dazai
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition for immersion exposure, method of forming resist...
- Patent number 8,501,387
- Issue date Aug 6, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Daiju Shiono
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive resist composition and method of forming resist pattern
- Patent number 8,487,056
- Issue date Jul 16, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Tasuku Matsumiya
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resist composition for immersion exposure, method of forming resist...
- Patent number 8,475,997
- Issue date Jul 2, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Daiju Shiono
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Negative resist composition, method of forming resist pattern and p...
- Patent number 8,404,426
- Issue date Mar 26, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Sho Abe
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR PRODUCING STRUCTURE BODY INCLUDING PHASE-SEPARATED STRUC...
- Publication number 20250011616
- Publication date Jan 9, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Takuya Uehara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
BLOCK COPOLYMER, UNDERCOAT AGENT, RESIN COMPOSITION FOR FORMING PHA...
- Publication number 20250011622
- Publication date Jan 9, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Takuya Uehara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIN COMPOSITION FOR FORMING PHASE-SEPARATED STRUCTURE, AND METHOD...
- Publication number 20240425694
- Publication date Dec 26, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Ken Miyagi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIN COMPOSITION FOR FORMING ETCHING MASK PATTERN, AND METHOD FOR...
- Publication number 20240368393
- Publication date Nov 7, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Takehiro Seshimo
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD FOR MANUFACTURING ETCHING MASK PATTERN, AND RESIN COMPOSITIO...
- Publication number 20240361686
- Publication date Oct 31, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Takehiro Seshimo
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RESIN COMPOSITION FOR FORMING ETCHING MASK PATTERN, AND METHOD FOR...
- Publication number 20240360267
- Publication date Oct 31, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Takehiro SESHIMO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIN COMPOSITION FOR FORMING PHASE-SEPARATED STRUCTURE, METHOD OF...
- Publication number 20240182701
- Publication date Jun 6, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Toshifumi Satoh
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD OF PRODUCING BLOCK COPOLYMER, AND BLOCK COPOLYMER
- Publication number 20240182623
- Publication date Jun 6, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Toshifumi Satoh
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
AUTHENTICATION OBJECT, AUTHENTICATION SYSTEM, AND AUTHENTICATION ME...
- Publication number 20220138305
- Publication date May 5, 2022
- Tsuyoshi KUROSAWA
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
RESIN COMPOSITION FOR FORMING PHASE-SEPARATED STRUCTURE, METHOD FOR...
- Publication number 20220017741
- Publication date Jan 20, 2022
- Tokyo Ohka Kogyo Co., Ltd.
- Teruaki HAYAKAWA
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
RESIN COMPOSITION FOR FORMING PHASE-SEPARATED STRUCTURE, METHOD FOR...
- Publication number 20210230340
- Publication date Jul 29, 2021
- Tokyo Ohka Kogyo Co., Ltd.
- Ken MIYAGI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD OF PRODUCING PURIFIED PRODUCT OF RESIN COMPOSITION FOR FORMI...
- Publication number 20210017343
- Publication date Jan 21, 2021
- Tokyo Ohka Kogyo Co., Ltd.
- Takahiro Dazai
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIN COMPOSITION FOR FORMING PHASE-SEPARATED STRUCTURE, METHOD FOR...
- Publication number 20200369819
- Publication date Nov 26, 2020
- Tokyo Ohka Kogyo Co., Ltd.
- Ken Miyagi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIN COMPOSITION FOR FORMING A PHASE-SEPARATED STRUCTURE, AND METH...
- Publication number 20200183281
- Publication date Jun 11, 2020
- Tokyo Ohka Kogyo Co., Ltd.
- Takahiro DAZAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE
- Publication number 20190284387
- Publication date Sep 19, 2019
- Tokyo Ohka Kogyo Co., Ltd.
- Takahiro DAZAI
- B32 - LAYERED PRODUCTS
Information Patent Application
METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE
- Publication number 20190276698
- Publication date Sep 12, 2019
- Tokyo Ohka Kogyo Co., Ltd.
- Takahiro DAZAI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RESIN COMPOSITION FOR FORMING PHASE-SEPARATED STRUCTURE AND METHOD...
- Publication number 20180171172
- Publication date Jun 21, 2018
- Tokyo Ohka Kogyo Co., Ltd.
- Hitoshi YAMANO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIN COMPOSITION FOR FORMING PHASE-SEPARATED STRUCTURE AND METHOD...
- Publication number 20180072564
- Publication date Mar 15, 2018
- Tokyo Ohka Kogyo Co., Ltd.
- Ken MIYAGI
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE...
- Publication number 20150291832
- Publication date Oct 15, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Takehiro Seshimo
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE,...
- Publication number 20150205207
- Publication date Jul 23, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Takehiro Seshimo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE,...
- Publication number 20150034593
- Publication date Feb 5, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Tasuku Matsumiya
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATION STRUCTURE...
- Publication number 20150034595
- Publication date Feb 5, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Takehiro Seshimo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
UNDERCOAT AGENT AND METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-...
- Publication number 20150030773
- Publication date Jan 29, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Takehiro Seshimo
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
- Publication number 20140147787
- Publication date May 29, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Takahiro Dazai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLYMERIZATION METHOD OF HIGH-MOLECULAR WEIGHT COMPOUND, RESIST COM...
- Publication number 20140147792
- Publication date May 29, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Takahiro Dazai
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD OF FORMING RESIST PATTERN
- Publication number 20140147793
- Publication date May 29, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi Nakamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
- Publication number 20140147788
- Publication date May 29, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Masatoshi Arai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOUND, RADICAL POLYMERIZATION INITIATOR, METHOD FOR PRODUCING CO...
- Publication number 20140141373
- Publication date May 22, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshiyuki Utsumi
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION FOR NEGATIVE DEVELOPMENT WHICH IS USED FOR FORMA...
- Publication number 20140127626
- Publication date May 8, 2014
- Riken
- Takahiro Senzaki
- B82 - NANO-TECHNOLOGY
Information Patent Application
PRIMER AND PATTERN FORMING METHOD FOR LAYER INCLUDING BLOCK COPOLYMER
- Publication number 20140030652
- Publication date Jan 30, 2014
- Riken
- Takahiro Senzaki
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Takahiro Dazai

Person

Patents Grantslast 30 patents

Resin composition for forming phase-separated structure, method for...

Resin composition for forming phase-separated structure, method for...

Resin composition for forming phase-separated structure, method for...

Method of producing structure containing phase-separated structure

Method of forming resist pattern

Method of producing structure containing phase-separated structure...

Resist composition, method of forming resist pattern, polymeric com...

Undercoat agent and method of producing structure containing phase-...

Method of producing structure containing phase-separated structure,...

Polymerization method of high-molecular weight compound, resist com...

Method of producing structure containing phase-separated structure,...

Method of producing structure containing phase-separation structure...

Resist composition and method for forming resist pattern

Compound, radical polymerization initiator, method for producing co...

Substrate provided with metal nanostructure on surface thereof and...

Method of forming polymeric compound, resist composition and method...

Primer and pattern forming method for layer including block copolymer

Method of producing polymeric compound, resist composition, and met...

Primer and pattern forming method for layer including block copolymer

Fluorine-containing block copolymeric compound

Resist composition, method of forming resist pattern and polymeric...

Negative resist composition, method of forming resist pattern and p...

Resist composition for immersion exposure, method of forming resist...

Resist composition for immersion exposure, method of forming resist...

Method of forming resist pattern and negative tone-development resi...

Positive resist composition, method of forming resist pattern, and...

Resist composition for immersion exposure, method of forming resist...

Positive resist composition and method of forming resist pattern

Resist composition for immersion exposure, method of forming resist...

Negative resist composition, method of forming resist pattern and p...

Patents Applicationslast 30 patents

METHOD FOR PRODUCING STRUCTURE BODY INCLUDING PHASE-SEPARATED STRUC...

BLOCK COPOLYMER, UNDERCOAT AGENT, RESIN COMPOSITION FOR FORMING PHA...

RESIN COMPOSITION FOR FORMING PHASE-SEPARATED STRUCTURE, AND METHOD...

RESIN COMPOSITION FOR FORMING ETCHING MASK PATTERN, AND METHOD FOR...

METHOD FOR MANUFACTURING ETCHING MASK PATTERN, AND RESIN COMPOSITIO...

RESIN COMPOSITION FOR FORMING ETCHING MASK PATTERN, AND METHOD FOR...

RESIN COMPOSITION FOR FORMING PHASE-SEPARATED STRUCTURE, METHOD OF...

METHOD OF PRODUCING BLOCK COPOLYMER, AND BLOCK COPOLYMER

AUTHENTICATION OBJECT, AUTHENTICATION SYSTEM, AND AUTHENTICATION ME...

RESIN COMPOSITION FOR FORMING PHASE-SEPARATED STRUCTURE, METHOD FOR...

RESIN COMPOSITION FOR FORMING PHASE-SEPARATED STRUCTURE, METHOD FOR...

METHOD OF PRODUCING PURIFIED PRODUCT OF RESIN COMPOSITION FOR FORMI...

RESIN COMPOSITION FOR FORMING PHASE-SEPARATED STRUCTURE, METHOD FOR...

RESIN COMPOSITION FOR FORMING A PHASE-SEPARATED STRUCTURE, AND METH...

METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE

METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE

RESIN COMPOSITION FOR FORMING PHASE-SEPARATED STRUCTURE AND METHOD...

RESIN COMPOSITION FOR FORMING PHASE-SEPARATED STRUCTURE AND METHOD...

METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE...

METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE,...

METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE,...

METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATION STRUCTURE...

UNDERCOAT AGENT AND METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-...

RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

POLYMERIZATION METHOD OF HIGH-MOLECULAR WEIGHT COMPOUND, RESIST COM...

METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

COMPOUND, RADICAL POLYMERIZATION INITIATOR, METHOD FOR PRODUCING CO...

RESIST COMPOSITION FOR NEGATIVE DEVELOPMENT WHICH IS USED FOR FORMA...

PRIMER AND PATTERN FORMING METHOD FOR LAYER INCLUDING BLOCK COPOLYMER