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Takahiro Hamada
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Toyama, JP
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last 30 patents
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Patent Grant
Resist underlayer film forming composition containing low molecular...
Patent number
9,645,494
Issue date
May 9, 2017
Nissan Chemical Industries, Ltd.
Masakazu Kato
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Composition for forming photosensitive resist underlayer film
Patent number
9,436,085
Issue date
Sep 6, 2016
Nissan Chemical Industries, Ltd.
Yusuke Horiguchi
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Patents Applications
last 30 patents
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Patent Application
COMPOSITION FOR FORMING PHOTOSENSITIVE RESIST UNDERLAYER FILM
Publication number
20120251950
Publication date
Oct 4, 2012
Nissan Chemical Industries, Ltd.
Yusuke Horiguchi
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING BRANCHED POLY...
Publication number
20100291483
Publication date
Nov 18, 2010
Nissan Chemical Industries, Ltd.
Takahiro Hamada
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING LOW MOLECULAR...
Publication number
20100075253
Publication date
Mar 25, 2010
NISSAN CHEMICAL INDUSTRIES , LTD.
Masakazu Kato
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY