Takahiro Hidaka

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Ibaraki, JP

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Patents Grantslast 30 patents

Information Patent Grant
Resist pattern, process for producing same, and utilization thereof
- Patent number 7,309,559
- Issue date Dec 18, 2007
- Hitachi Chemical Co., Ltd.
- Michiko Natori
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Photosensitive resin composition, photosensitive element using the...
- Patent number 7,232,647
- Issue date Jun 19, 2007
- Hitachi Chemical Co., Ltd.
- Yasuhara Murakami
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photosensitive resin composition, photosensitive element using the...
- Patent number 7,220,533
- Issue date May 22, 2007
- Hitachi Chemical Co., Ltd.
- Yasuharu Murakami
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Hexaaryl biimidazole compounds as photoinitiators, photosensitive c...
- Patent number 6,524,770
- Issue date Feb 25, 2003
- Hitachi Chemical Co., Ltd.
- Takahiro Hidaka
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR

Patents Applicationslast 30 patents

Information Patent Application
Photosensitive resin composition, photosensitive element using the...
- Publication number 20050164124
- Publication date Jul 28, 2005
- Hitachi Chemical Co., Ltd.
- Yasuharu Murakami
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist pattern, process for producing same, and utilization thereof
- Publication number 20040063025
- Publication date Apr 1, 2004
- Michiko Natori
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Photosensitive resin composition, photosensitive element comprising...
- Publication number 20040038149
- Publication date Feb 26, 2004
- Yasuharu Murakami
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY