Takahiro Horiguchi

Person

Tsukui, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus
- Patent number 8,733,281
- Issue date May 27, 2014
- Tokyo Electron Limited
- Masaki Hirayama
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 7,934,468
- Issue date May 3, 2011
- Tokyo Electron Limited
- Takahiro Horiguchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus
- Patent number 7,771,536
- Issue date Aug 10, 2010
- Tokyo Electron Limited
- Takahiro Horiguchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 7,723,637
- Issue date May 25, 2010
- Tohoku University
- Tadahiro Ohmi
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 7,655,111
- Issue date Feb 2, 2010
- Tokyo Electron Limited
- Takahiro Horiguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 7,432,468
- Issue date Oct 7, 2008
- Tokyo Electron Limited
- Shinsuke Oka
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Single-substrate-processing apparatus for semiconductor process
- Patent number 6,719,849
- Issue date Apr 13, 2004
- Tokyo Electron Limited
- Takahiro Horiguchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Single-substrate-processing apparatus for semiconductor process
- Patent number 6,660,097
- Issue date Dec 9, 2003
- Tokyo Electron Limited
- Takahiro Horiguchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Single-substrate-heat-processing apparatus for semiconductor process
- Patent number 6,537,422
- Issue date Mar 25, 2003
- Tokyo Electron Limited
- Takeshi Sakuma
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Single-substrate-processing apparatus for semiconductor process
- Patent number 6,506,257
- Issue date Jan 14, 2003
- Tokyo Electron Limited
- Takahiro Horiguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Single-substrate-treating apparatus for semiconductor processing sy...
- Patent number 6,402,848
- Issue date Jun 11, 2002
- Tokyo Electron Limited
- Takahiro Horiguchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20130112352
- Publication date May 9, 2013
- TOHOKU UNIVERSITY
- Masaki Hirayama
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20100183827
- Publication date Jul 22, 2010
- TOKYO ELECTRON LIMITED
- Masaki Hirayama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD THEREOF
- Publication number 20090152243
- Publication date Jun 18, 2009
- Tokyo Electron Limited
- Takahiro Horiguchi
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
SUBSTRATE TRANSPORTING MECHANISM, SUBSTRATE TRANSPORTING METHOD AND...
- Publication number 20070296134
- Publication date Dec 27, 2007
- Takahiro Horiguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20070289533
- Publication date Dec 20, 2007
- TOKYO ELECTRON LIMITED
- Takahiro HORIGUCHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20070235425
- Publication date Oct 11, 2007
- TOKYO ELECTRON LIMITED
- Shinsuke Oka
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
MICROWAVE PLASMA PROCESSING APPARATUS, METHOD FOR MANUFACTURING MIC...
- Publication number 20070227661
- Publication date Oct 4, 2007
- TOKYO ELECTRON LIMITED
- Takahiro HORIGUCHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD
- Publication number 20070221623
- Publication date Sep 27, 2007
- TOKYO ELECTRON LIMITED
- Takahiro HORIGUCHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20070181531
- Publication date Aug 9, 2007
- TOKYO ELECTRON LIMITED
- Takahiro Horiguchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma processing apparatus and plasma processing method
- Publication number 20070163996
- Publication date Jul 19, 2007
- TOKYO ELECTRON LIMITED
- Takahiro Horiguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus
- Publication number 20070102403
- Publication date May 10, 2007
- Tadahiro Ohmi
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Microwave plasma processing method, microwave plasma processing app...
- Publication number 20070054064
- Publication date Mar 8, 2007
- Tadahiro Ohmi
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Plasma processing apparatus, slot antenna and plasma processing method
- Publication number 20060225656
- Publication date Oct 12, 2006
- TOKYO ELECTON LIMITED
- Takahiro Horiguchi
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Substrate processing apparatus
- Publication number 20060057799
- Publication date Mar 16, 2006
- TOKYO ELECTRON LIMITED
- Takahiro Horiguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate processing apparatus
- Publication number 20060048710
- Publication date Mar 9, 2006
- TOKYO ELECTRON LIMITED
- Takahiro Horiguchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Single-substrate-processing apparatus for semiconductor process
- Publication number 20020007791
- Publication date Jan 24, 2002
- Takahiro Horiguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Single-substrate-processing apparatus for semiconductor process
- Publication number 20010054385
- Publication date Dec 27, 2001
- Takahiro Horiguchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Single-substrate-processing apparatus for semiconductor
- Publication number 20010052321
- Publication date Dec 20, 2001
- Takahiro Horiguchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Single-substrate-heat-processing apparatus for semiconductor process
- Publication number 20010035131
- Publication date Nov 1, 2001
- Takeshi Sakuma
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Takahiro Horiguchi

Person

Patents Grantslast 30 patents

Plasma processing apparatus

Plasma processing apparatus and plasma processing method

Substrate processing apparatus

Plasma processing apparatus

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and plasma processing method

Single-substrate-processing apparatus for semiconductor process

Single-substrate-processing apparatus for semiconductor process

Single-substrate-heat-processing apparatus for semiconductor process

Single-substrate-processing apparatus for semiconductor process

Single-substrate-treating apparatus for semiconductor processing sy...

Patents Applicationslast 30 patents

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND METHOD THEREOF

SUBSTRATE TRANSPORTING MECHANISM, SUBSTRATE TRANSPORTING METHOD AND...

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

MICROWAVE PLASMA PROCESSING APPARATUS, METHOD FOR MANUFACTURING MIC...

PLASMA PROCESSING APPARATUS AND METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

Plasma processing apparatus and plasma processing method

Plasma processing apparatus

Microwave plasma processing method, microwave plasma processing app...

Plasma processing apparatus, slot antenna and plasma processing method

Substrate processing apparatus

Substrate processing apparatus

Single-substrate-processing apparatus for semiconductor process

Single-substrate-processing apparatus for semiconductor process

Single-substrate-processing apparatus for semiconductor

Single-substrate-heat-processing apparatus for semiconductor process