Takahiro Sakaguchi

Person

Chiba, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Polymer and resin composition containing the same
- Patent number 10,793,677
- Issue date Oct 6, 2020
- Nissan Chemical Industries, Ltd.
- Yuki Sugawara
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Thermosetting resin composition
- Patent number 10,774,237
- Issue date Sep 15, 2020
- Nissan Chemical Industries, Ltd.
- Takahiro Sakaguchi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resin composition
- Patent number 10,752,714
- Issue date Aug 25, 2020
- Nissan Chemical Industries, Ltd.
- Isao Adachi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resin composition for forming color filter underlayer film
- Patent number 10,634,999
- Issue date Apr 28, 2020
- Nissan Chemical Industries, Ltd.
- Takahiro Sakaguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resin composition for flattened film or microlens
- Patent number 10,487,205
- Issue date Nov 26, 2019
- Nissan Chemical Industries, Ltd.
- Isao Adachi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resin composition
- Patent number 9,994,685
- Issue date Jun 12, 2018
- Nissan Chemical Industries, Ltd.
- Takahiro Sakaguchi
- G02 - OPTICS
Information Patent Grant
Non-photosensitive resin composition
- Patent number 9,823,391
- Issue date Nov 21, 2017
- Nissan Chemical Industries, Ltd.
- Takahiro Sakaguchi
- G02 - OPTICS
Information Patent Grant
Photosensitive resin composition
- Patent number 9,348,224
- Issue date May 24, 2016
- Nissan Chemical Industries, Ltd.
- Isao Adachi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive resist composition and method for production of microlens
- Patent number 9,348,222
- Issue date May 24, 2016
- Nissan Chemical Industries, Ltd.
- Shojiro Yukawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Photosensitive resin composition for forming microlens
- Patent number 9,052,437
- Issue date Jun 9, 2015
- Nissan Chemical Industries, Ltd.
- Takahiro Sakaguchi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resin composition
- Patent number 9,029,467
- Issue date May 12, 2015
- Nissan Chemical Industries, Ltd.
- Hiroyuki Soda
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Photosensitive resin composition for microlens
- Patent number 8,993,699
- Issue date Mar 31, 2015
- Nissan Chemical Industries, Ltd.
- Takahiro Kishioka
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photosensitive resin and process for producing microlens
- Patent number 8,940,470
- Issue date Jan 27, 2015
- Nissan Chemical Industries, Inc.
- Takayuki Negi
- G02 - OPTICS
Information Patent Grant
Photosensitive resin composition for microlenses
- Patent number 8,796,349
- Issue date Aug 5, 2014
- Nissan Chemical Industries, Ltd.
- Hiroyuki Soda
- G02 - OPTICS
Information Patent Grant
Production method of microlens
- Patent number 8,766,158
- Issue date Jul 1, 2014
- Nissan Chemical Industries, Ltd.
- Shinya Arase
- G02 - OPTICS
Information Patent Grant
Resist underlayer film forming composition for lithography, contain...
- Patent number 8,709,701
- Issue date Apr 29, 2014
- Nissan Chemical Industries, Ltd.
- Takahiro Sakaguchi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Photosensitive composition including photopolymerizable polymer hav...
- Patent number 8,658,342
- Issue date Feb 25, 2014
- Nissan Chemicals Industries, Ltd.
- Hiroyuki Soda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist underlayer film forming composition for electron beam lithog...
- Patent number 8,603,731
- Issue date Dec 10, 2013
- Nissan Chemical Industries, Ltd.
- Tomoyuki Enomoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist underlayer film forming composition
- Patent number 8,361,694
- Issue date Jan 29, 2013
- Nissan Chemical Industries, Ltd.
- Takahiro Sakaguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Coating-type underlayer coating forming composition for lithography...
- Patent number 8,257,908
- Issue date Sep 4, 2012
- Nissan Chemical Industries, Ltd.
- Takahiro Sakaguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Underlayer coating forming composition for lithography containing n...
- Patent number 8,088,546
- Issue date Jan 3, 2012
- Nissan Chemical Industries, Ltd.
- Satoshi Takei
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Mask blank and mask
- Patent number 7,833,681
- Issue date Nov 16, 2010
- Hoya Corporation
- Masahiro Hashimoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Coating-type underlayer coating forming composition for lithography...
- Patent number 7,816,067
- Issue date Oct 19, 2010
- Nissan Chemical Industries, Ltd.
- Tomoyuki Enomoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist underlayer coating forming composition for mask blank, mask...
- Patent number 7,736,822
- Issue date Jun 15, 2010
- Hoya Corporation
- Masahiro Hashimoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
POLYMER AND RESIN COMPOSITION CONTAINING THE SAME
- Publication number 20190055359
- Publication date Feb 21, 2019
- Nissan Chemical Industries, Ltd.
- Yuki SUGAWARA
- G02 - OPTICS
Information Patent Application
RESIN COMPOSITION
- Publication number 20180362685
- Publication date Dec 20, 2018
- Nissan Chemical Industries, Ltd.
- Isao ADACHI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
THERMOSETTING RESIN COMPOSITION
- Publication number 20180305578
- Publication date Oct 25, 2018
- Nissan Chemical Industries, Ltd.
- Takahiro SAKAGUCHI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RESIN COMPOSITION FOR FORMING COLOR FILTER UNDERLAYER FILM
- Publication number 20170227848
- Publication date Aug 10, 2017
- Nissan Chemical Industries, Ltd.
- Takahiro SAKAGUCHI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RESIN COMPOSITION FOR FLATTENED FILM OR MICROLENS
- Publication number 20170166737
- Publication date Jun 15, 2017
- Nissan Chemical Industries, Ltd.
- Isao ADACHI
- G02 - OPTICS
Information Patent Application
NON-PHOTOSENSITIVE RESIN COMPOSITION
- Publication number 20150338556
- Publication date Nov 26, 2015
- Nissan Chemical Industries, Ltd.
- Takahiro SAKAGUCHI
- G02 - OPTICS
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION
- Publication number 20150050593
- Publication date Feb 19, 2015
- Nissan Chemical Industries, Ltd.
- Isao Adachi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIN COMPOSITION
- Publication number 20140200304
- Publication date Jul 17, 2014
- Nissan Chemical Industries, Ltd.
- Hiroyuki Soda
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RESIN COMPOSITION
- Publication number 20140135426
- Publication date May 15, 2014
- Nissan Chemical Industries, Ltd.
- Takahiro Sakaguchi
- G02 - OPTICS
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION FOR FORMING MICROLENS
- Publication number 20130310480
- Publication date Nov 21, 2013
- Nissan Chemical Industries, Ltd.
- Takahiro Sakaguchi
- G02 - OPTICS
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION FOR MICROLENSES
- Publication number 20130245152
- Publication date Sep 19, 2013
- Nissan Chemical Industries, Ltd.
- Hiroyuki Soda
- G02 - OPTICS
Information Patent Application
PRODUCTION METHOD OF MICROLENS
- Publication number 20120298842
- Publication date Nov 29, 2012
- Nissan Chemical Industries, Ltd.
- Shinya Arase
- G02 - OPTICS
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION FOR MICROLENS
- Publication number 20120156598
- Publication date Jun 21, 2012
- Nissan Chemical Industries, Ltd.
- Takahiro Kishioka
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Resist underlayer film forming composition for lithography, contain...
- Publication number 20110207331
- Publication date Aug 25, 2011
- Nissan Chemical Industries, Ltd.
- Takahiro Sakaguchi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE RESIST COMPOSITION AND METHOD FOR PRODUCTION OF MICROLENS
- Publication number 20110086310
- Publication date Apr 14, 2011
- Nissan Chemical Industries, Ltd.
- Shojiro Yukawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOSENSITIVE RESIN AND PROCESS FOR PRODUCING MICROLENS
- Publication number 20100096663
- Publication date Apr 22, 2010
- Nissan Chemical Industries, Ltd.
- Takayuki Negi
- G02 - OPTICS
Information Patent Application
RESIST UNDERLAYER FILM FORMING COMPOSITION FOR ELECTRON BEAM LITHOG...
- Publication number 20100081081
- Publication date Apr 1, 2010
- Nissan Chemical Industries, Ltd.
- Tomoyuki Enomoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST UNDERLAYER FILM FORMING COMPOSITION
- Publication number 20100035181
- Publication date Feb 11, 2010
- Nissan Chemical Industries, Ltd.
- Takahiro Sakaguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST UNDERLAYER FILM FORMING COMPOSITION FOR LITHOGRAPHY, CONTAIN...
- Publication number 20100022090
- Publication date Jan 28, 2010
- Nissan Chemical Industries, Ltd.
- Takahiro Sakaguchi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Coating-type underlayer coating forming composition for lithography...
- Publication number 20090253076
- Publication date Oct 8, 2009
- Nissan Chemical Industries, Ltd.
- Takahiro Sakaguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Coating-type underlayer coating forming composition for lithography...
- Publication number 20090053647
- Publication date Feb 26, 2009
- Nissan Chemical Industries, Ltd.
- Tomoyuki Enomoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Mask blank and mask
- Publication number 20080070132
- Publication date Mar 20, 2008
- HOYA CORPORATION
- Masahiro Hashimoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Underlayer Coating Forming Composition for Lithography Containing N...
- Publication number 20070238029
- Publication date Oct 11, 2007
- Nissan Chemical Industries, Ltd.
- Satoshi Takei
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Resist underlayer coating forming composition for mask blank, mask...
- Publication number 20070190459
- Publication date Aug 16, 2007
- HOYA CORPORATION
- Masahiro Hashimoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Takahiro Sakaguchi

Person

Patents Grantslast 30 patents

Polymer and resin composition containing the same

Thermosetting resin composition

Resin composition

Resin composition for forming color filter underlayer film

Resin composition for flattened film or microlens

Resin composition

Non-photosensitive resin composition

Photosensitive resin composition

Positive resist composition and method for production of microlens

Photosensitive resin composition for forming microlens

Resin composition

Photosensitive resin composition for microlens

Photosensitive resin and process for producing microlens

Photosensitive resin composition for microlenses

Production method of microlens

Resist underlayer film forming composition for lithography, contain...

Photosensitive composition including photopolymerizable polymer hav...

Resist underlayer film forming composition for electron beam lithog...

Resist underlayer film forming composition

Coating-type underlayer coating forming composition for lithography...

Underlayer coating forming composition for lithography containing n...

Mask blank and mask

Coating-type underlayer coating forming composition for lithography...

Resist underlayer coating forming composition for mask blank, mask...

Patents Applicationslast 30 patents

POLYMER AND RESIN COMPOSITION CONTAINING THE SAME

RESIN COMPOSITION

THERMOSETTING RESIN COMPOSITION

RESIN COMPOSITION FOR FORMING COLOR FILTER UNDERLAYER FILM

RESIN COMPOSITION FOR FLATTENED FILM OR MICROLENS

NON-PHOTOSENSITIVE RESIN COMPOSITION

PHOTOSENSITIVE RESIN COMPOSITION

RESIN COMPOSITION

RESIN COMPOSITION

PHOTOSENSITIVE RESIN COMPOSITION FOR FORMING MICROLENS

PHOTOSENSITIVE RESIN COMPOSITION FOR MICROLENSES

PRODUCTION METHOD OF MICROLENS

PHOTOSENSITIVE RESIN COMPOSITION FOR MICROLENS

Resist underlayer film forming composition for lithography, contain...

POSITIVE RESIST COMPOSITION AND METHOD FOR PRODUCTION OF MICROLENS

PHOTOSENSITIVE RESIN AND PROCESS FOR PRODUCING MICROLENS

RESIST UNDERLAYER FILM FORMING COMPOSITION FOR ELECTRON BEAM LITHOG...

RESIST UNDERLAYER FILM FORMING COMPOSITION

RESIST UNDERLAYER FILM FORMING COMPOSITION FOR LITHOGRAPHY, CONTAIN...

Coating-type underlayer coating forming composition for lithography...

Coating-type underlayer coating forming composition for lithography...

Mask blank and mask

Underlayer Coating Forming Composition for Lithography Containing N...

Resist underlayer coating forming composition for mask blank, mask...