Takahiro Shimizu

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Kanagawa, JP

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Patents Grantslast 30 patents

Information Patent Grant
Chemically amplified positive-type photosensitive resin composition
- Patent number 9,557,651
- Issue date Jan 31, 2017
- Tokyo Ohka Kogyo Co., Ltd.
- Shota Katayama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-type photoresist composition, photoresist laminate, method...
- Patent number 9,091,916
- Issue date Jul 28, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Takahiro Shimizu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
POLYMER AND TRIAZINE COMPOUND
- Publication number 20240052103
- Publication date Feb 15, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Takahiro Shimizu
- C07 - ORGANIC CHEMISTRY
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION
- Publication number 20150268553
- Publication date Sep 24, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Shota Katayama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE-TYPE PHOTORESIST COMPOSITION, PHOTORESIST LAMINATE, METHOD...
- Publication number 20130230801
- Publication date Sep 5, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Takahiro Shimizu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTORESIST COMPOSITION FOR THIC...
- Publication number 20120141940
- Publication date Jun 7, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Takahiro Shimizu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY