Takahiro Shimomura

Person

Kudamatsu-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 9,378,929
- Issue date Jun 28, 2016
- Hitachi High-Technologies Corporation
- Kenji Maeda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vacuum processing apparatus and operating method of the same
- Patent number 9,245,780
- Issue date Jan 26, 2016
- Hitachi High-Technologies Corporation
- Takahiro Shimomura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 8,951,385
- Issue date Feb 10, 2015
- Hitachi High-Technologies Corporation
- Kenji Maeda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for manufacturing semiconductor devices
- Patent number 7,364,956
- Issue date Apr 29, 2008
- Hitachi High-Technologies Corporation
- Go Saito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method for working the surface of semiconductor d...
- Patent number 7,098,138
- Issue date Aug 29, 2006
- Hitachi, Ltd.
- Takao Arase
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method for working the surface of semiconductor d...
- Patent number 6,617,255
- Issue date Sep 9, 2003
- Hitachi, Ltd.
- Takao Arase
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20150221477
- Publication date Aug 6, 2015
- Hitachi High-Technologies Corporation
- Kenji MAEDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VACUUM PROCESSING APPARATUS AND METHOD OF OPERATING THE SAME
- Publication number 20140044502
- Publication date Feb 13, 2014
- Takashi UEMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20130267098
- Publication date Oct 10, 2013
- Kenji MAEDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VACUUM PROCESSING APPARATUS AND OPERATING METHOD OF THE SAME
- Publication number 20130142595
- Publication date Jun 6, 2013
- Hitachi High-Technologies Corporation
- Takahiro SHIMOMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VACUUM PROCESSING APPARATUS AND VACUUM PROCESSING METHOD
- Publication number 20120093617
- Publication date Apr 19, 2012
- Hitachi High-Technologies Corporation
- Yutaka Kudou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VACUUM PROCESSING SYSTEM
- Publication number 20120067521
- Publication date Mar 22, 2012
- Hitachi High-Technologies Corporation
- Takahiro SHIMOMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VACUUM PROCESSING APPARATUS
- Publication number 20120067522
- Publication date Mar 22, 2012
- Hitachi High-Technologies Corporation
- Takahiro SHIMOMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for manufacturing semiconductor devices
- Publication number 20070026611
- Publication date Feb 1, 2007
- Go Saito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing method for working the surface of semiconductor d...
- Publication number 20060048892
- Publication date Mar 9, 2006
- Takao Arase
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for processing plasma processing apparatus
- Publication number 20050072444
- Publication date Apr 7, 2005
- Shigeru Shirayone
- B08 - CLEANING
Information Patent Application
Plasma processing method for working the surface of semiconductor d...
- Publication number 20040175940
- Publication date Sep 9, 2004
- Takao Arase
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing method for working the surface of semiconductor d...
- Publication number 20010055885
- Publication date Dec 27, 2001
- Takao Arase
- H01 - BASIC ELECTRIC ELEMENTS

Takahiro Shimomura

Person

Patents Grantslast 30 patents

Plasma processing apparatus and plasma processing method

Vacuum processing apparatus and operating method of the same

Plasma processing apparatus and plasma processing method

Method for manufacturing semiconductor devices

Plasma processing method for working the surface of semiconductor d...

Plasma processing method for working the surface of semiconductor d...

Patents Applicationslast 30 patents

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

VACUUM PROCESSING APPARATUS AND METHOD OF OPERATING THE SAME

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

VACUUM PROCESSING APPARATUS AND OPERATING METHOD OF THE SAME

VACUUM PROCESSING APPARATUS AND VACUUM PROCESSING METHOD

VACUUM PROCESSING SYSTEM

VACUUM PROCESSING APPARATUS

Method for manufacturing semiconductor devices

Plasma processing method for working the surface of semiconductor d...

Method for processing plasma processing apparatus

Plasma processing method for working the surface of semiconductor d...

Plasma processing method for working the surface of semiconductor d...