Takahiro YASUE

Person

Osaka, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Salt, acid generator, resist composition and method for producing r...
- Patent number 11,366,387
- Issue date Jun 21, 2022
- Sumitomo Chemical Company, Limited
- Tatsuro Masuyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and method for producing resist pattern
- Patent number 9,791,776
- Issue date Oct 17, 2017
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and method for producing resist pattern
- Patent number 9,638,996
- Issue date May 2, 2017
- Sumitomo Chemical Company, Limited
- Tatsuro Masuyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist composition, compound and process of producing photores...
- Patent number 9,448,475
- Issue date Sep 20, 2016
- Sumitomo Chemical Company, Limited
- Tatsuro Masuyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Salt and photoresist composition comprising the same
- Patent number 9,348,221
- Issue date May 24, 2016
- Sumitomo Chemical Company, Limited
- Yukako Anryu
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and method for producing resist pattern
- Patent number 9,176,378
- Issue date Nov 3, 2015
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and method for producing resist pattern
- Patent number 9,176,379
- Issue date Nov 3, 2015
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and method for producing resist pattern
- Patent number 9,128,373
- Issue date Sep 8, 2015
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist composition
- Patent number 9,063,414
- Issue date Jun 23, 2015
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and method for producing resist pattern
- Patent number 9,052,591
- Issue date Jun 9, 2015
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and method for producing resist pattern
- Patent number 8,859,182
- Issue date Oct 14, 2014
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and method for producing resist pattern
- Patent number 8,563,218
- Issue date Oct 22, 2013
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Salt and photoresist composition comprising the same
- Patent number 8,557,500
- Issue date Oct 15, 2013
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- C07 - ORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING R...
- Publication number 20200057369
- Publication date Feb 20, 2020
- Sumitomo Chemical Company, Limited
- Tatsuro MASUYAMA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20160062234
- Publication date Mar 3, 2016
- Sumitomo Chemical Company, Limited
- Tatsuro MASUYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITION, COMPOUND AND PROCESS OF PRODUCING PHOTORES...
- Publication number 20150241769
- Publication date Aug 27, 2015
- Sumitomo Chemical Company, Limited
- Tatsuro MASUYAMA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME
- Publication number 20150118619
- Publication date Apr 30, 2015
- Sumitomo Chemical Company, Limited
- Yukako ANRYU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20130022924
- Publication date Jan 24, 2013
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20120264059
- Publication date Oct 18, 2012
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20120258404
- Publication date Oct 11, 2012
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20120258405
- Publication date Oct 11, 2012
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20120258401
- Publication date Oct 11, 2012
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME
- Publication number 20120225385
- Publication date Sep 6, 2012
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20120219908
- Publication date Aug 30, 2012
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20120219907
- Publication date Aug 30, 2012
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITION
- Publication number 20120028188
- Publication date Feb 2, 2012
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Takahiro YASUE

Person

Patents Grantslast 30 patents

Salt, acid generator, resist composition and method for producing r...

Resist composition and method for producing resist pattern

Resist composition and method for producing resist pattern

Photoresist composition, compound and process of producing photores...

Salt and photoresist composition comprising the same

Resist composition and method for producing resist pattern

Resist composition and method for producing resist pattern

Resist composition and method for producing resist pattern

Photoresist composition

Resist composition and method for producing resist pattern

Resist composition and method for producing resist pattern

Resist composition and method for producing resist pattern

Salt and photoresist composition comprising the same

Patents Applicationslast 30 patents

SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING R...

RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

PHOTORESIST COMPOSITION, COMPOUND AND PROCESS OF PRODUCING PHOTORES...

SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME

RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME

RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

PHOTORESIST COMPOSITION