Takahisa Iwasaki

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Hillsboro, OR, US

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Patents Grantslast 30 patents

Information Patent Grant
Method of etching film and plasma processing apparatus
- Patent number 11,404,282
- Issue date Aug 2, 2022
- Tokyo Electron Limited
- Kosuke Ogasawara
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF ETCHING FILM AND PLASMA PROCESSING APPARATUS
- Publication number 20220336224
- Publication date Oct 20, 2022
- TOKYO ELECTRON LIMITED
- Kosuke Ogasawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMING METHOD AND FILM FORMING APPARATUS
- Publication number 20210140044
- Publication date May 13, 2021
- Hiroshi Nagaike
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMING APPARATUS AND FILM FORMING METHOD
- Publication number 20210130955
- Publication date May 6, 2021
- TOKYO ELECTRON LIMITED
- Hiroshi NAGAIKE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF ETCHING FILM AND PLASMA PROCESSING APPARATUS
- Publication number 20200303203
- Publication date Sep 24, 2020
- TOKYO ELECTRON LIMITED
- Kosuke Ogasawara
- H01 - BASIC ELECTRIC ELEMENTS