Takahisa Namiki

Person

Kawasaki, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Manufacturing process of semiconductor device
- Patent number 8,349,542
- Issue date Jan 8, 2013
- Fujitsu Limited
- Miwa Kozawa
- G11 - INFORMATION STORAGE
Information Patent Grant
Resist pattern swelling material, and method for patterning using same
- Patent number 8,334,091
- Issue date Dec 18, 2012
- Fujitsu Limited
- Koji Nozaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist pattern thickening material and process for forming resist p...
- Patent number 8,198,009
- Issue date Jun 12, 2012
- Fujitsu Limited
- Miwa Kozawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resist cover film forming material, resist pattern forming method,...
- Patent number 8,198,014
- Issue date Jun 12, 2012
- Fujitsu Limited
- Miwa Kozawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Resist pattern thickening material and process for forming resist p...
- Patent number 7,820,367
- Issue date Oct 26, 2010
- Fujitsu Limited
- Miwa Kozawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resist pattern thickening material and process for forming resist p...
- Patent number 7,799,508
- Issue date Sep 21, 2010
- Fujitsu Limited
- Koji Nozaki
- G11 - INFORMATION STORAGE
Information Patent Grant
Resist pattern thickening material, resist pattern and forming proc...
- Patent number 7,744,768
- Issue date Jun 29, 2010
- Fujitsu Limited
- Miwa Kozawa
- G11 - INFORMATION STORAGE
Information Patent Grant
Semiconductor device having a pillar structure
- Patent number 7,642,650
- Issue date Jan 5, 2010
- Fujitsu Microelectronics Limited
- Iwao Sugiura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist pattern thickening material and process for forming resist p...
- Patent number 7,585,610
- Issue date Sep 8, 2009
- Fujitsu Limited
- Koji Nozaki
- G11 - INFORMATION STORAGE
Information Patent Grant
Resist pattern thickening material and process for forming resist p...
- Patent number 7,550,248
- Issue date Jun 23, 2009
- Fujitsu Limited
- Takahisa Namiki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition, method of forming resist pattern, semiconductor...
- Patent number 7,452,657
- Issue date Nov 18, 2008
- Fujitsu Limited
- Takahisa Namiki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist pattern thickening material, process for forming resist patt...
- Patent number 7,364,829
- Issue date Apr 29, 2008
- Fujitsu Limited
- Miwa Kozawa
- G11 - INFORMATION STORAGE
Information Patent Grant
Resist pattern thickening material and process for forming the same...
- Patent number 7,361,448
- Issue date Apr 22, 2008
- Fujitsu Limited
- Koji Nozaki
- G11 - INFORMATION STORAGE
Information Patent Grant
Resist pattern thickness reducing material, resist pattern and proc...
- Patent number 7,338,750
- Issue date Mar 4, 2008
- Fujitsu Limited
- Miwa Kozawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Biodegradable resin composition, filler therefor and molded article...
- Patent number 7,202,289
- Issue date Apr 10, 2007
- Fujitsu Limited
- Koji Nozaki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist pattern thickening material, resist pattern and forming proc...
- Patent number 7,189,783
- Issue date Mar 13, 2007
- Fujitsu Limited
- Miwa Kozawa
- G11 - INFORMATION STORAGE
Information Patent Grant
Negative resist composition, method for the formation of resist pat...
- Patent number 6,794,112
- Issue date Sep 21, 2004
- Fujitsu Limited
- Koji Nozaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Negative resist composition, method for the formation of resist pat...
- Patent number 6,794,113
- Issue date Sep 21, 2004
- Fujitsu Limited
- Koji Nozaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Negative resist composition, method for the formation of resist pat...
- Patent number 6,787,288
- Issue date Sep 7, 2004
- Fujitsu Limited
- Koji Nozaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Negative resist composition, method for the formation of resist pat...
- Patent number 6,773,867
- Issue date Aug 10, 2004
- Fujitsu Limited
- Koji Nozaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing magnetoresistance head
- Patent number 6,605,414
- Issue date Aug 12, 2003
- Fujitsu Limtied
- Keiji Watanabe
- G11 - INFORMATION STORAGE
Information Patent Grant
Chemical amplification resist compositions and process for the form...
- Patent number 6,582,878
- Issue date Jun 24, 2003
- Fujitsu Limited
- Takahisa Namiki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative resist composition, method for the formation of resist pat...
- Patent number 6,506,534
- Issue date Jan 14, 2003
- Fujitsu Limited
- Koji Nozaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist composition and pattern forming process
- Patent number 6,465,137
- Issue date Oct 15, 2002
- Fujitsu Limited
- Keiji Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemically amplified resist compositions and process for the format...
- Patent number 6,329,125
- Issue date Dec 11, 2001
- Fujitsu Limited
- Satoshi Takechi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemically amplified resist compositions and process for the format...
- Patent number 6,200,725
- Issue date Mar 13, 2001
- Fujitsu Limited
- Satoshi Takechi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemical amplification resist compositions and process for the form...
- Patent number 6,200,724
- Issue date Mar 13, 2001
- Fujitsu Limited
- Takahisa Namiki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for manufacturing magnetoresistance head
- Patent number 6,052,261
- Issue date Apr 18, 2000
- Fujitsu Limited
- Keiji Watanabe
- G11 - INFORMATION STORAGE
Information Patent Grant
Chemically amplified resist compositions and process for the format...
- Patent number 6,013,416
- Issue date Jan 11, 2000
- Fujitsu Limited
- Koji Nozaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemically amplified resist compositions and process for the format...
- Patent number 5,968,713
- Issue date Oct 19, 1999
- Fujitsu Limited
- Koji Nozaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
RESIST PATTERN THICKENING MATERIAL AND PROCESS FOR FORMING RESIST P...
- Publication number 20100305248
- Publication date Dec 2, 2010
- Fujitsu Limited
- Miwa Kozawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MANUFACTURING PROCESS OF SEMICONDUCTOR DEVICE
- Publication number 20100227278
- Publication date Sep 9, 2010
- Fujitsu Limited
- Miwa Kozawa
- G11 - INFORMATION STORAGE
Information Patent Application
Resist pattern thickening material and process for forming resist p...
- Publication number 20090226844
- Publication date Sep 10, 2009
- Fujitsu Limited
- Koji Nozaki
- G11 - INFORMATION STORAGE
Information Patent Application
Resist pattern swelling material, and method for patterning using same
- Publication number 20080274431
- Publication date Nov 6, 2008
- Fujitsu Limited
- Koji Nozaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COVER FILM FORMING MATERIAL, RESIST PATTERN FORMING METHOD,...
- Publication number 20080220223
- Publication date Sep 11, 2008
- FUJITSU LIMTIED
- Miwa KOZAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Resist pattern thickening material, resist pattern and forming proc...
- Publication number 20070106021
- Publication date May 10, 2007
- FUJITSU LIMITED
- Miwa Kozawa
- G11 - INFORMATION STORAGE
Information Patent Application
Resist composition, method for forming resist pattern, semiconducto...
- Publication number 20070048660
- Publication date Mar 1, 2007
- FUJITSU LIMITED
- Koji Nozaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist pattern thickening material and process for forming resist p...
- Publication number 20070048659
- Publication date Mar 1, 2007
- FUJITSU LIMITED
- Takahisa Namiki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist composition, method of forming resist pattern, semiconductor...
- Publication number 20070003862
- Publication date Jan 4, 2007
- FUJITSU LIMITED
- Takahisa Namiki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist pattern thickening material and process for forming resist p...
- Publication number 20060188805
- Publication date Aug 24, 2006
- FUJITSU LIMITED
- Koji Nozaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist pattern thickening material and process for forming resist p...
- Publication number 20060073419
- Publication date Apr 6, 2006
- FUJITSU LIMITED
- Miwa Kozawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist pattern thickening material and process for forming the same...
- Publication number 20050277054
- Publication date Dec 15, 2005
- Koji Nozaki
- G11 - INFORMATION STORAGE
Information Patent Application
Semiconductor device having a pillar structure
- Publication number 20040164418
- Publication date Aug 26, 2004
- FUJITSU LIMITED
- Iwao Sugiura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Resist pattern thickening material, process for forming resist patt...
- Publication number 20040121259
- Publication date Jun 24, 2004
- FUJIITSU LIMITED
- Miwa Kozawa
- G11 - INFORMATION STORAGE
Information Patent Application
Biodegradable resin composition, filler therefor and molded article...
- Publication number 20040034121
- Publication date Feb 19, 2004
- FUJITSU LIMITED
- Koji Nozaki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Resist pattern swelling material, and method for patterning using same
- Publication number 20030175624
- Publication date Sep 18, 2003
- FUJITSU LIMITED
- Koji Nozaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist pattern thickening material, resist pattern and forming proc...
- Publication number 20030157801
- Publication date Aug 21, 2003
- Miwa Kozawa
- G11 - INFORMATION STORAGE
Information Patent Application
Resist pattern thickness reducing material, resist pattern and proc...
- Publication number 20030143490
- Publication date Jul 31, 2003
- FUJITSU LIMITED
- Miwa Kozawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Negative resist composition, method for the formation of resist pat...
- Publication number 20030143482
- Publication date Jul 31, 2003
- FUJITSU LIMITED
- Koji Nozaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Negative resist composition, method for the formation of resist pat...
- Publication number 20030138726
- Publication date Jul 24, 2003
- FUJITSU LIMITED
- Koji Nozaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Negative resist composition, method for the formation of resist pat...
- Publication number 20030138724
- Publication date Jul 24, 2003
- FUJITSU LIMITED
- Koji Nozaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Negative resist composition, method for the formation of resist pat...
- Publication number 20030138725
- Publication date Jul 24, 2003
- FUJITSU LIMITED
- Koji Nozaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist pattern thickening material, resist pattern and forming meth...
- Publication number 20030102285
- Publication date Jun 5, 2003
- Koji Nozaki
- G11 - INFORMATION STORAGE
Information Patent Application
Chemical amplification resist compositions and process for the form...
- Publication number 20030073027
- Publication date Apr 17, 2003
- FUJITSU LIMITED
- Takahisa Namiki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR MANUFACTURING MAGNETORESISTANCE HEAD
- Publication number 20020110756
- Publication date Aug 15, 2002
- KEIJI WATANABE
- G11 - INFORMATION STORAGE
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20010006752
- Publication date Jul 5, 2001
- FUJITSU LIMITED
- KEIJI WATANABE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Chemically amplified resist compositions and process for the format...
- Publication number 20010003640
- Publication date Jun 14, 2001
- FUJITSU LIMITED
- Satoshi Takechi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Takahisa Namiki

Person

Patents Grantslast 30 patents

Manufacturing process of semiconductor device

Resist pattern swelling material, and method for patterning using same

Resist pattern thickening material and process for forming resist p...

Resist cover film forming material, resist pattern forming method,...

Resist pattern thickening material and process for forming resist p...

Resist pattern thickening material and process for forming resist p...

Resist pattern thickening material, resist pattern and forming proc...

Semiconductor device having a pillar structure

Resist pattern thickening material and process for forming resist p...

Resist pattern thickening material and process for forming resist p...

Resist composition, method of forming resist pattern, semiconductor...

Resist pattern thickening material, process for forming resist patt...

Resist pattern thickening material and process for forming the same...

Resist pattern thickness reducing material, resist pattern and proc...

Biodegradable resin composition, filler therefor and molded article...

Resist pattern thickening material, resist pattern and forming proc...

Negative resist composition, method for the formation of resist pat...

Negative resist composition, method for the formation of resist pat...

Negative resist composition, method for the formation of resist pat...

Negative resist composition, method for the formation of resist pat...

Method for manufacturing magnetoresistance head

Chemical amplification resist compositions and process for the form...

Negative resist composition, method for the formation of resist pat...

Resist composition and pattern forming process

Chemically amplified resist compositions and process for the format...

Chemically amplified resist compositions and process for the format...

Chemical amplification resist compositions and process for the form...

Method for manufacturing magnetoresistance head

Chemically amplified resist compositions and process for the format...

Chemically amplified resist compositions and process for the format...

Patents Applicationslast 30 patents

RESIST PATTERN THICKENING MATERIAL AND PROCESS FOR FORMING RESIST P...

MANUFACTURING PROCESS OF SEMICONDUCTOR DEVICE

Resist pattern thickening material and process for forming resist p...

Resist pattern swelling material, and method for patterning using same

RESIST COVER FILM FORMING MATERIAL, RESIST PATTERN FORMING METHOD,...

Resist pattern thickening material, resist pattern and forming proc...

Resist composition, method for forming resist pattern, semiconducto...

Resist pattern thickening material and process for forming resist p...

Resist composition, method of forming resist pattern, semiconductor...

Resist pattern thickening material and process for forming resist p...

Resist pattern thickening material and process for forming resist p...

Resist pattern thickening material and process for forming the same...

Semiconductor device having a pillar structure

Resist pattern thickening material, process for forming resist patt...

Biodegradable resin composition, filler therefor and molded article...

Resist pattern swelling material, and method for patterning using same

Resist pattern thickening material, resist pattern and forming proc...

Resist pattern thickness reducing material, resist pattern and proc...

Negative resist composition, method for the formation of resist pat...

Negative resist composition, method for the formation of resist pat...

Negative resist composition, method for the formation of resist pat...

Negative resist composition, method for the formation of resist pat...

Resist pattern thickening material, resist pattern and forming meth...

Chemical amplification resist compositions and process for the form...

METHOD FOR MANUFACTURING MAGNETORESISTANCE HEAD

RESIST COMPOSITION AND PATTERN FORMING PROCESS

Chemically amplified resist compositions and process for the format...