Takakazu KIMOTO

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Tokyo, JP

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Patents Grantslast 30 patents

Information Patent Grant
Radiation-sensitive resin composition, resist pattern-forming metho...
- Patent number 9,523,911
- Issue date Dec 20, 2016
- JSR Corporation
- Hiroshi Tomioka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive resin composition, polymer, and resist pattern-...
- Patent number 8,980,529
- Issue date Mar 17, 2015
- JSR Corporation
- Yasuhiko Matsuda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Radiation sensitive resin composition, method for forming a pattern...
- Patent number 8,765,355
- Issue date Jul 1, 2014
- JSR Corporation
- Takakazu Kimoto
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHO...
- Publication number 20170038679
- Publication date Feb 9, 2017
- JSR Corporation
- Hiroshi TOMIOKA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHO...
- Publication number 20140342288
- Publication date Nov 20, 2014
- JSR Corporation
- Hiroshi TOMIOKA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER, AND RESIST PATTERN-...
- Publication number 20130203000
- Publication date Aug 8, 2013
- JSR Corporation
- Yasuhiko MATSUDA
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
RADIATION SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING A PATTERN...
- Publication number 20120276482
- Publication date Nov 1, 2012
- JSR Corporation
- Takakazu Kimoto
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...