Takamasa Satoh

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Electron gun, electron beam exposure apparatus, and exposure method
- Patent number 7,919,750
- Issue date Apr 5, 2011
- Advantest Corporation
- Hiroshi Yasuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam exposure apparatus involving the position and velocit...
- Patent number 7,777,202
- Issue date Aug 17, 2010
- Advantest Corp.
- Takamasa Satoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
D/A conversion device and method and charged particle beam exposure...
- Patent number 7,557,357
- Issue date Jul 7, 2009
- Advantest Corporation
- Takamasa Satoh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Electron beam generating apparatus and electron beam exposure appar...
- Patent number 6,727,658
- Issue date Apr 27, 2004
- Advantest Corporation
- Yoshihisa Ooae
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam exposure system and method
- Patent number 6,646,275
- Issue date Nov 11, 2003
- Fujitsu Limited
- Yoshihisa Oae
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam exposure system and method
- Patent number 6,486,479
- Issue date Nov 26, 2002
- Fujitsu Limited
- Yoshihisa Oae
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron gun used in an electron beam exposure apparatus
- Patent number 6,252,344
- Issue date Jun 26, 2001
- Advantest Corporation
- Yoshihisa Ooae
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged-particle-beam exposure device and charged-particle-beam exp...
- Patent number 6,242,751
- Issue date Jun 5, 2001
- Fujitsu Limited
- Akio Takemoto
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle beam exposure apparatus
- Patent number 6,188,074
- Issue date Feb 13, 2001
- Advantest Corporation
- Takamasa Satoh
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method and system for exposing an exposure pattern on an object by...
- Patent number 6,118,129
- Issue date Sep 12, 2000
- Fujitsu Limited
- Yoshihisa Oae
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of and system for exposing pattern on object by charged part...
- Patent number 6,057,907
- Issue date May 2, 2000
- Fujitsu Limited
- Takamasa Satoh
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle beam exposure system and method
- Patent number 5,977,548
- Issue date Nov 2, 1999
- Fujitsu Limited
- Yoshihisa Oae
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged-particle-beam exposure device and charged-particle-beam exp...
- Patent number 5,969,365
- Issue date Oct 19, 1999
- Fujitsu Limited
- Akio Takemoto
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of providing changed particle beam exposure in which represe...
- Patent number 5,965,895
- Issue date Oct 12, 1999
- Fujitsu Limited
- Takamasa Satoh
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle beam exposure system
- Patent number 5,920,077
- Issue date Jul 6, 1999
- Fujitsu Limited
- Yoshihisa Oae
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of and system for exposing pattern on object by charged part...
- Patent number 5,866,300
- Issue date Feb 2, 1999
- Fujitsu Limited
- Takamasa Satoh
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of and system for exposing pattern on object by charged part...
- Patent number 5,841,145
- Issue date Nov 24, 1998
- Fujitsu Limited
- Takamasa Satoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged-particle-beam exposure device and charged-particle-beam exp...
- Patent number 5,757,015
- Issue date May 26, 1998
- Fujitsu Limited
- Akio Takemoto
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method and system for exposing pattern on object by charged particl...
- Patent number 5,744,810
- Issue date Apr 28, 1998
- Fujitsu Ltd.
- Takamasa Satoh
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of and system for charged particle beam exposure
- Patent number 5,721,432
- Issue date Feb 24, 1998
- Fujitsu Limited
- Takamasa Satoh
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of and system for charged particle beam exposure
- Patent number 5,719,402
- Issue date Feb 17, 1998
- Fujitsu Limited
- Takamasa Satoh
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electron-beam exposure system for reduced distortion of electron be...
- Patent number 5,631,113
- Issue date May 20, 1997
- Fujitsu Limited
- Takamasa Satoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam exposure system and method
- Patent number 5,614,725
- Issue date Mar 25, 1997
- Fujitsu Limited
- Yoshihisa Oae
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of and system for charged particle beam exposure
- Patent number 5,546,319
- Issue date Aug 13, 1996
- Fujitsu Limited
- Takamasa Satoh
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle beam exposure system and method
- Patent number 5,528,048
- Issue date Jun 18, 1996
- Fujitsu Limited
- Yoshihisa Oae
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electron-beam exposure system for reduced distortion of electron be...
- Patent number 5,444,257
- Issue date Aug 22, 1995
- Fujitsu Limited
- Takamasa Satoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam exposure apparatus and method of cleaning the...
- Patent number 5,401,974
- Issue date Mar 28, 1995
- Fujitsu Limited
- Yoshihisa Oae
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
Electron gun, electron beam exposure apparatus, and exposure method
- Publication number 20080315089
- Publication date Dec 25, 2008
- Hiroshi Yasuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electron beam exposure apparatus
- Publication number 20080277598
- Publication date Nov 13, 2008
- Takamasa Satoh
- B82 - NANO-TECHNOLOGY
Information Patent Application
D/A conversion device and method and charged particle beam exposure...
- Publication number 20080054185
- Publication date Mar 6, 2008
- Takamasa Satoh
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Application
Electron beam generating apparatus and electron beam exposure appar...
- Publication number 20030155522
- Publication date Aug 21, 2003
- Advantest Corporation
- Yoshihisa Ooae
- B82 - NANO-TECHNOLOGY
Information Patent Application
Electron beam exposing method and exposure apparatus
- Publication number 20030071231
- Publication date Apr 17, 2003
- Takeshi Haraguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged particle beam exposure system and method
- Publication number 20030025088
- Publication date Feb 6, 2003
- FUJITSU LIMITED
- Yoshihisa Oae
- B82 - NANO-TECHNOLOGY
Information Patent Application
Charged-particle-beam exposure device and charged-particle-beam exp...
- Publication number 20010013581
- Publication date Aug 16, 2001
- Akio Takemoto
- B82 - NANO-TECHNOLOGY

Takamasa Satoh

Person

Patents Grantslast 30 patents

Electron gun, electron beam exposure apparatus, and exposure method

Electron beam exposure apparatus involving the position and velocit...

D/A conversion device and method and charged particle beam exposure...

Electron beam generating apparatus and electron beam exposure appar...

Charged particle beam exposure system and method

Charged particle beam exposure system and method

Electron gun used in an electron beam exposure apparatus

Charged-particle-beam exposure device and charged-particle-beam exp...

Charged particle beam exposure apparatus

Method and system for exposing an exposure pattern on an object by...

Method of and system for exposing pattern on object by charged part...

Charged particle beam exposure system and method

Charged-particle-beam exposure device and charged-particle-beam exp...

Method of providing changed particle beam exposure in which represe...

Charged particle beam exposure system

Method of and system for exposing pattern on object by charged part...

Method of and system for exposing pattern on object by charged part...

Charged-particle-beam exposure device and charged-particle-beam exp...

Method and system for exposing pattern on object by charged particl...

Method of and system for charged particle beam exposure

Method of and system for charged particle beam exposure

Electron-beam exposure system for reduced distortion of electron be...

Charged particle beam exposure system and method

Method of and system for charged particle beam exposure

Charged particle beam exposure system and method

Electron-beam exposure system for reduced distortion of electron be...

Charged particle beam exposure apparatus and method of cleaning the...

Patents Applicationslast 30 patents

Electron gun, electron beam exposure apparatus, and exposure method

Electron beam exposure apparatus

D/A conversion device and method and charged particle beam exposure...

Electron beam generating apparatus and electron beam exposure appar...

Electron beam exposing method and exposure apparatus

Charged particle beam exposure system and method

Charged-particle-beam exposure device and charged-particle-beam exp...