Takamitsu Furukawa

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Photomask and method for forming a resist pattern
- Patent number 7,972,752
- Issue date Jul 5, 2011
- Oki Semiconductor Co., Ltd.
- Takamitsu Furukawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask for forming a resist pattern and manufacturing method the...
- Patent number 7,771,897
- Issue date Aug 10, 2010
- Oki Semiconductor Co., Ltd.
- Takamitsu Furukawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming resist pattern, and exposure device
- Patent number 6,956,641
- Issue date Oct 18, 2005
- Oki Electric Industry, Co., Ltd.
- Takamitsu Furukawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for performing baking treatment to semiconduct...
- Patent number 6,838,643
- Issue date Jan 4, 2005
- Oki Electric Industry Co., Ltd.
- Shouzou Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming resist pattern, and exposure device
- Patent number 6,511,794
- Issue date Jan 28, 2003
- Oki Electric Industry Co., Ltd.
- Takamitsu Furukawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fabrication method for a semiconductor device
- Patent number 6,455,438
- Issue date Sep 24, 2002
- Oki Electric Industry Co., Ltd.
- Azusa Yanagisawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
PHOTOMASK AND METHOD FOR FORMING A RESIST PATTERN
- Publication number 20090004576
- Publication date Jan 1, 2009
- Takamitsu Furukawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photomask for forming a resist pattern and manufacturing method the...
- Publication number 20070224521
- Publication date Sep 27, 2007
- Takamitsu Furukawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of forming resist pattern, and exposure device
- Publication number 20030117608
- Publication date Jun 26, 2003
- Takamitsu Furukawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and apparatus for performing baking treatment to semiconduct...
- Publication number 20030057198
- Publication date Mar 27, 2003
- Shouzou Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS

Takamitsu Furukawa

Person

Patents Grantslast 30 patents

Photomask and method for forming a resist pattern

Photomask for forming a resist pattern and manufacturing method the...

Method of forming resist pattern, and exposure device

Method and apparatus for performing baking treatment to semiconduct...

Method of forming resist pattern, and exposure device

Fabrication method for a semiconductor device

Patents Applicationslast 30 patents

PHOTOMASK AND METHOD FOR FORMING A RESIST PATTERN

Photomask for forming a resist pattern and manufacturing method the...

Method of forming resist pattern, and exposure device

Method and apparatus for performing baking treatment to semiconduct...