Takamitsu Nagai

Person

Yokohama-Shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Inspection system by charged particle beam and method of manufactur...
- Patent number 9,368,314
- Issue date Jun 14, 2016
- Ebara Corporation
- Mamoru Nakasuji
- G01 - MEASURING TESTING
Information Patent Grant
Inspection system by charged particle beam and method of manufactur...
- Patent number 8,803,103
- Issue date Aug 12, 2014
- Ebara Corporation
- Mamoru Nakasuji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inspection system by charged particle beam and method of manufactur...
- Patent number 8,368,031
- Issue date Feb 5, 2013
- Ebara Corporation
- Mamoru Nakasuji
- G01 - MEASURING TESTING
Information Patent Grant
Inspection system by charged particle beam and method of manufactur...
- Patent number 8,053,726
- Issue date Nov 8, 2011
- Ebara Corporation
- Mamoru Nakasuji
- G01 - MEASURING TESTING
Information Patent Grant
Semiconductor substrate, substrate inspection method, semiconductor...
- Patent number 7,973,281
- Issue date Jul 5, 2011
- Kabushiki Kaisha Toshiba
- Hiroyuki Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate inspection apparatus, substrate inspection method and met...
- Patent number 7,847,250
- Issue date Dec 7, 2010
- Kabushiki Kaisha Toshiba
- Ichirota Nagahama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor substrate, substrate inspection method, semiconductor...
- Patent number 7,573,066
- Issue date Aug 11, 2009
- Kabushiki Kaisha Toshiba
- Hiroyuki Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam inspection system and inspection method and method of...
- Patent number 7,569,838
- Issue date Aug 4, 2009
- Ebara Corporation
- Kenji Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate inspection apparatus, substrate inspection method and met...
- Patent number 7,462,829
- Issue date Dec 9, 2008
- Kabushiki Kaisha Toshiba
- Ichirota Nagahama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inspection system by charged particle beam and method of manufactur...
- Patent number 7,411,191
- Issue date Aug 12, 2008
- Ebara Corporation
- Mamoru Nakasuji
- G01 - MEASURING TESTING
Information Patent Grant
Electron beam inspection system and inspection method and method of...
- Patent number 7,351,969
- Issue date Apr 1, 2008
- Ebara Corporation
- Kenji Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for determining defect detection sensitivity d...
- Patent number 7,302,091
- Issue date Nov 27, 2007
- Kabushiki Kaisha Toshiba
- Akira Hamaguchi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Inspection system by charged particle beam and method of manufactur...
- Patent number 7,241,993
- Issue date Jul 10, 2007
- Ebara Corporation
- Mamoru Nakasuji
- G01 - MEASURING TESTING
Information Patent Grant
Substrate inspection apparatus, substrate inspection method and met...
- Patent number 7,211,796
- Issue date May 1, 2007
- Kabushiki Kaisha Toshiba
- Ichirota Nagahama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam inspection system and inspection method and method of...
- Patent number 6,992,290
- Issue date Jan 31, 2006
- Ebara Corporation
- Kenji Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate inspecting system using electron beam and substrate inspe...
- Patent number 6,563,114
- Issue date May 13, 2003
- Kabushiki Kaisha Toshiba
- Ichirota Nagahama
- G01 - MEASURING TESTING
Information Patent Grant
Inspection method and apparatus using electron beam
- Patent number 6,265,719
- Issue date Jul 24, 2001
- Kabushiki Kaisha Toshiba
- Yuichiro Yamazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam inspection method and apparatus
- Patent number 6,259,094
- Issue date Jul 10, 2001
- Kabushiki Kaisha Toshiba
- Takamitsu Nagai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for producing an electrostatic lens
- Patent number 5,535,508
- Issue date Jul 16, 1996
- Kabushiki Kaisha Toshiba
- Takamitsu Nagai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic lens and method for producing the same
- Patent number 5,444,256
- Issue date Aug 22, 1995
- Kabushiki Kaisha Toshiba
- Takamitsu Nagai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Magnetic immersion field emission electron gun systems capable of r...
- Patent number 5,371,371
- Issue date Dec 6, 1994
- Kabushiki Kaisha Toshiba
- Yuichiro Yamazaki
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
INSPECTION SYSTEM BY CHARGED PARTICLE BEAM AND METHOD OF MANUFACTUR...
- Publication number 20140319346
- Publication date Oct 30, 2014
- EBARA CORPORATION
- Mamoru Nakasuji
- G01 - MEASURING TESTING
Information Patent Application
INSPECTION SYSTEM BY CHARGED PARTICLE BEAM AND METHOD OF MANUFACTUR...
- Publication number 20140034831
- Publication date Feb 6, 2014
- KABUSHIKI KAISHA TOSHIBA
- Mamoru Nakasuji
- G01 - MEASURING TESTING
Information Patent Application
INSPECTION SYSTEM BY CHARGED PARTICLE BEAM AND METHOD OF MANUFACTUR...
- Publication number 20120032079
- Publication date Feb 9, 2012
- KABUSHIKI KAISHA TOSHIBA
- Mamoru Nakasuji
- G01 - MEASURING TESTING
Information Patent Application
Semiconductor substrate, substrate inspection method, semiconductor...
- Publication number 20090272901
- Publication date Nov 5, 2009
- Kabushiki Kaisha Toshiba
- Hiroyuki Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate inspection apparatus, substrate inspection method and met...
- Publication number 20090072139
- Publication date Mar 19, 2009
- Kabushiki Kaisha Toshiba
- Ichirota Nagahama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Inspection system by charged particle beam and method of manufactur...
- Publication number 20090032708
- Publication date Feb 5, 2009
- EBARA CORPORATION
- Mamoru Nakasuji
- G01 - MEASURING TESTING
Information Patent Application
Electron beam inspection system and inspection method and method of...
- Publication number 20080173814
- Publication date Jul 24, 2008
- EBARA CORPORATION
- Kenji Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor substrate, substrate inspection method, semiconductor...
- Publication number 20080011947
- Publication date Jan 17, 2008
- Hiroyuki Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Inspection system by charged particle beam and method of manufactur...
- Publication number 20070235644
- Publication date Oct 11, 2007
- EBARA CORPORATION
- Mamoru Nakasuji
- G01 - MEASURING TESTING
Information Patent Application
Substrate inspection apparatus, substrate inspection method and met...
- Publication number 20070187600
- Publication date Aug 16, 2007
- Kabushiki Kaisha Toshiba
- Ichirota Nagahama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electron beam inspection system and inspection method and method of...
- Publication number 20060118719
- Publication date Jun 8, 2006
- EBARA CORPORATION
- Kenji Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate inspection apparatus, substrate inspection method and met...
- Publication number 20050029451
- Publication date Feb 10, 2005
- Ichirota Nagahama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for determining defect detection sensitivity d...
- Publication number 20040151362
- Publication date Aug 5, 2004
- Akira Hamaguchi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Electron beam inspection system and inspection method and method of...
- Publication number 20020088940
- Publication date Jul 11, 2002
- Kenji Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Inspection system by charged particle beam and method of manufactur...
- Publication number 20020028399
- Publication date Mar 7, 2002
- Mamoru Nakasuji
- G01 - MEASURING TESTING

Takamitsu Nagai

Person

Patents Grantslast 30 patents

Inspection system by charged particle beam and method of manufactur...

Inspection system by charged particle beam and method of manufactur...

Inspection system by charged particle beam and method of manufactur...

Inspection system by charged particle beam and method of manufactur...

Semiconductor substrate, substrate inspection method, semiconductor...

Substrate inspection apparatus, substrate inspection method and met...

Semiconductor substrate, substrate inspection method, semiconductor...

Electron beam inspection system and inspection method and method of...

Substrate inspection apparatus, substrate inspection method and met...

Inspection system by charged particle beam and method of manufactur...

Electron beam inspection system and inspection method and method of...

Method and apparatus for determining defect detection sensitivity d...

Inspection system by charged particle beam and method of manufactur...

Substrate inspection apparatus, substrate inspection method and met...

Electron beam inspection system and inspection method and method of...

Substrate inspecting system using electron beam and substrate inspe...

Inspection method and apparatus using electron beam

Electron beam inspection method and apparatus

Method for producing an electrostatic lens

Electrostatic lens and method for producing the same

Magnetic immersion field emission electron gun systems capable of r...

Patents Applicationslast 30 patents

INSPECTION SYSTEM BY CHARGED PARTICLE BEAM AND METHOD OF MANUFACTUR...

INSPECTION SYSTEM BY CHARGED PARTICLE BEAM AND METHOD OF MANUFACTUR...

INSPECTION SYSTEM BY CHARGED PARTICLE BEAM AND METHOD OF MANUFACTUR...

Semiconductor substrate, substrate inspection method, semiconductor...

Substrate inspection apparatus, substrate inspection method and met...

Inspection system by charged particle beam and method of manufactur...

Electron beam inspection system and inspection method and method of...

Semiconductor substrate, substrate inspection method, semiconductor...

Inspection system by charged particle beam and method of manufactur...

Substrate inspection apparatus, substrate inspection method and met...

Electron beam inspection system and inspection method and method of...

Substrate inspection apparatus, substrate inspection method and met...

Method and apparatus for determining defect detection sensitivity d...

Electron beam inspection system and inspection method and method of...

Inspection system by charged particle beam and method of manufactur...