Takamitsu Tomiga

Person

Shizuoka, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method for producing radiation-sensitive resin composition and patt...
- Patent number 12,061,415
- Issue date Aug 13, 2024
- FUJIFILM Corporation
- Takumi Tanaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, act...
- Patent number 11,009,791
- Issue date May 18, 2021
- FUJIFILM Corporation
- Takamitsu Tomiga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polishing liquid for metal and polishing method using the same
- Patent number 9,202,709
- Issue date Dec 1, 2015
- FUJIFILM Corporation
- Takamitsu Tomiga
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, and...
- Patent number 8,795,945
- Issue date Aug 5, 2014
- FUJIFILM Corporation
- Kana Fujii
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition and...
- Patent number 8,349,535
- Issue date Jan 8, 2013
- FUJIFILM Corporation
- Kana Fujii
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Metal-polishing liquid and polishing method
- Patent number 8,083,964
- Issue date Dec 27, 2011
- FUJIFILM Corporation
- Toru Yamada
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Patents Applicationslast 30 patents

Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20240353753
- Publication date Oct 24, 2024
- FUJIFILM CORPORATION
- Asahi TAKAKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20240329531
- Publication date Oct 3, 2024
- FUJIFILM CORPORATION
- Takamitsu TOMIGA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20240053679
- Publication date Feb 15, 2024
- FUJIFILM CORPORATION
- Takamitsu TOMIGA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PRODUCING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE R...
- Publication number 20230213861
- Publication date Jul 6, 2023
- FUJIFILM CORPORATION
- Takamitsu TOMIGA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20230161253
- Publication date May 25, 2023
- FUJIFILM CORPORATION
- Fumihiro YOSHINO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD FOR PRODUCING RADIATION-SENSITIVE RESIN COMPOSITION AND PATT...
- Publication number 20230099422
- Publication date Mar 30, 2023
- FUJIFILM CORPORATION
- Takumi TANAKA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PRODUCING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE R...
- Publication number 20230028463
- Publication date Jan 26, 2023
- FUJIFILM CORPORATION
- Takamitsu Tomiga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20220146937
- Publication date May 12, 2022
- FUJIFILM CORPORATION
- Naoya HATAKEYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20220137512
- Publication date May 5, 2022
- FUJIFILM CORPORATION
- Naoya HATAKEYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20190137875
- Publication date May 9, 2019
- FUJIFILM CORPORATION
- Naoya HATAKEYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20180299777
- Publication date Oct 18, 2018
- FUJIFILM CORPORATION
- Takamitsu TOMIGA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSI...
- Publication number 20180217497
- Publication date Aug 2, 2018
- FUJIFILM CORPORATION
- Fumihiro YOSHINO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD, COMPOUND USED THEREIN, ACTINIC RAY-SENSITIV...
- Publication number 20150331314
- Publication date Nov 19, 2015
- FUJIFILM CORPORATION
- Shuhei YAMAGUCHI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, CHE...
- Publication number 20110269071
- Publication date Nov 3, 2011
- FUJIFILM CORPORATION
- Toru FUJIMORI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND...
- Publication number 20110081612
- Publication date Apr 7, 2011
- FUJIFILM CORPORATION
- Kana FUJII
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Metal polishing slurry and chemical mechanical polishing method
- Publication number 20100075500
- Publication date Mar 25, 2010
- FUJIFILM CORPORATION
- Masaru Yoshikawa
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING LIQUID FOR METAL AND POLISHING METHOD USING THE SAME
- Publication number 20090239380
- Publication date Sep 24, 2009
- FUJIFILM CORPORATION
- Takamitsu TOMIGA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
METAL POLISHING SLURRY AND CHEMICAL MECHANICAL POLISHING METHOD
- Publication number 20090203215
- Publication date Aug 13, 2009
- FUJIFILM CORPORATION
- Masaru YOSHIKAWA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
METAL-POLISHING LIQUID AND POLISHING METHOD
- Publication number 20080242091
- Publication date Oct 2, 2008
- FUJIFILM CORPORATION
- Tomoo KATO
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
METAL-POLISHING LIQUID AND POLISHING METHOD
- Publication number 20080242090
- Publication date Oct 2, 2008
- FUJIFILM CORPORATION
- Toru YAMADA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
METAL-POLISHING LIQUID AND POLISHING METHOD THEREWITH
- Publication number 20080206995
- Publication date Aug 28, 2008
- FUJIFILM CORPORATION
- Takamitsu TOMIGA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
METAL-POLISHING COMPOSITION AND CHEMICAL MECHANICAL POLISHING METHO...
- Publication number 20080188079
- Publication date Aug 7, 2008
- FUJIFILM CORPORATION
- Tomoo KATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Takamitsu Tomiga

Person

Patents Grantslast 30 patents

Method for producing radiation-sensitive resin composition and patt...

Actinic ray-sensitive or radiation-sensitive resin composition, act...

Polishing liquid for metal and polishing method using the same

Actinic ray-sensitive or radiation-sensitive resin composition, and...

Actinic ray-sensitive or radiation-sensitive resin composition and...

Metal-polishing liquid and polishing method

Patents Applicationslast 30 patents

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...

METHOD FOR PRODUCING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE R...

ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

METHOD FOR PRODUCING RADIATION-SENSITIVE RESIN COMPOSITION AND PATT...

METHOD FOR PRODUCING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE R...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...

PATTERN FORMING METHOD AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSI...

PATTERN FORMING METHOD, COMPOUND USED THEREIN, ACTINIC RAY-SENSITIV...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, CHE...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND...

Metal polishing slurry and chemical mechanical polishing method

POLISHING LIQUID FOR METAL AND POLISHING METHOD USING THE SAME

METAL POLISHING SLURRY AND CHEMICAL MECHANICAL POLISHING METHOD

METAL-POLISHING LIQUID AND POLISHING METHOD

METAL-POLISHING LIQUID AND POLISHING METHOD

METAL-POLISHING LIQUID AND POLISHING METHOD THEREWITH

METAL-POLISHING COMPOSITION AND CHEMICAL MECHANICAL POLISHING METHO...