Takanori BANSE

Person

Miyagi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 11,721,522
- Issue date Aug 8, 2023
- Tokyo Electron Limited
- Kosuke Ogasawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 11,404,249
- Issue date Aug 2, 2022
- Tokyo Electron Limited
- Shuichi Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 11,367,590
- Issue date Jun 21, 2022
- Tokyo Electron Limited
- Kosuke Ogasawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method
- Patent number 11,145,490
- Issue date Oct 12, 2021
- Tokyo Electron Limited
- Akihiro Yokota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for driving member and processing apparatus
- Patent number 10,825,662
- Issue date Nov 3, 2020
- Tokyo Electron Limited
- Rumiko Moriya
- G01 - MEASURING TESTING
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 10,770,268
- Issue date Sep 8, 2020
- Tokyo Electron Limited
- Shinya Morikita
- B08 - CLEANING
Information Patent Grant
Method of processing target object
- Patent number 10,707,088
- Issue date Jul 7, 2020
- Tokyo Electron Limited
- Shinya Morikita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for processing workpiece
- Patent number 10,692,726
- Issue date Jun 23, 2020
- Tokyo Electron Limited
- Shinya Morikita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method
- Patent number 10,546,723
- Issue date Jan 28, 2020
- Tokyo Electron Limited
- Akihiro Yokota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method
- Patent number 9,818,582
- Issue date Nov 14, 2017
- Tokyo Electron Limited
- Hiraku Murakami
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20240071728
- Publication date Feb 29, 2024
- TOKYO ELECTRON LIMITED
- Takanori BANSE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20220375724
- Publication date Nov 24, 2022
- TOKYO ELECTRON LIMITED
- Manabu OIE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20220301824
- Publication date Sep 22, 2022
- TOKYO ELECTRON LIMITED
- Kosuke OGASAWARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20210313148
- Publication date Oct 7, 2021
- TOKYO ELECTRON LIMITED
- Kosuke OGASAWARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20210020409
- Publication date Jan 21, 2021
- TOKYO ELECTRON LIMITED
- Kosuke OGASAWARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20210020416
- Publication date Jan 21, 2021
- TOKYO ELECTRON LIMITED
- Rumiko MORIYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20200126759
- Publication date Apr 23, 2020
- TOKYO ELECTRON LIMITED
- Akihiro YOKOTA
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
METHOD FOR DRIVING MEMBER AND PROCESSING APPARATUS
- Publication number 20190355557
- Publication date Nov 21, 2019
- TOKYO ELECTRON LIMITED
- Rumiko MORIYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20190326092
- Publication date Oct 24, 2019
- TOKYO ELECTRON LIMITED
- Kosuke OGASAWARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PROCESSING WORKPIECE
- Publication number 20190252198
- Publication date Aug 15, 2019
- TOKYO ELECTRON LIMITED
- Shinya MORIKITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20190096635
- Publication date Mar 28, 2019
- TOKYO ELECTRON LIMITED
- Akihiro YOKOTA
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20180277416
- Publication date Sep 27, 2018
- TOKYO ELECTRON LIMITED
- Shuichi TAKAHASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20180197720
- Publication date Jul 12, 2018
- TOKYO ELECTRON LIMITED
- Shinya MORIKITA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF PROCESSING TARGET OBJECT
- Publication number 20180047578
- Publication date Feb 15, 2018
- TOKYO ELECTRON LIMITED
- Shinya Morikita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20160372308
- Publication date Dec 22, 2016
- TOKYO ELECTRON LIMITED
- Hiraku MURAKAMI
- H01 - BASIC ELECTRIC ELEMENTS

Takanori BANSE

Person

Patents Grantslast 30 patents

Plasma processing method and plasma processing apparatus

Substrate processing apparatus

Plasma processing method and plasma processing apparatus

Plasma processing method

Method for driving member and processing apparatus

Plasma processing method and plasma processing apparatus

Method of processing target object

Method for processing workpiece

Plasma processing method

Plasma processing method

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

PLASMA ETCHING METHOD AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING METHOD

METHOD FOR DRIVING MEMBER AND PROCESSING APPARATUS

PLASMA ETCHING METHOD AND PLASMA PROCESSING APPARATUS

METHOD FOR PROCESSING WORKPIECE

PLASMA PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

METHOD OF PROCESSING TARGET OBJECT

PLASMA PROCESSING METHOD