Takanori Kawakami

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Photoresist composition, compound, and production method thereof
- Patent number 9,720,322
- Issue date Aug 1, 2017
- JSR Corporation
- Hayato Namai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive resin composition, polymer and method for formi...
- Patent number 9,598,520
- Issue date Mar 21, 2017
- JSR Corporation
- Yuko Kiridoshi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive resin composition, method for forming resist pa...
- Patent number 9,513,548
- Issue date Dec 6, 2016
- JSR Corporation
- Yuusuke Asano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist composition, compound, and production method thereof
- Patent number 9,477,149
- Issue date Oct 25, 2016
- JSR Corporation
- Hayato Namai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive resin composition
- Patent number 9,104,102
- Issue date Aug 11, 2015
- JSR Corporation
- Yasuhiko Matsuda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive resin composition, polymer, and method for form...
- Patent number 8,815,490
- Issue date Aug 26, 2014
- JSR Corporation
- Yasuhiko Matsuda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Radiation-sensitive resin composition
- Patent number 8,802,348
- Issue date Aug 12, 2014
- JSR Corporation
- Noboru Otsuka
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Radiation-sensitive resin composition, method for forming resist pa...
- Patent number 8,728,706
- Issue date May 20, 2014
- JSR Corporation
- Yuusuke Asano
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Radiation-sensitive resin composition, method for forming a resist...
- Patent number 8,535,871
- Issue date Sep 17, 2013
- JSR Corporation
- Yuusuke Asano
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Radiation-sensitive resin composition
- Patent number 8,084,188
- Issue date Dec 27, 2011
- JSR Corporation
- Noboru Otsuka
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Sulfonium compound
- Patent number 7,897,821
- Issue date Mar 1, 2011
- JSR Corporation
- Tomoki Nagai
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Compound, polymer, and radiation-sensitive composition
- Patent number 7,812,105
- Issue date Oct 12, 2010
- JSR Corporation
- Tomoki Nagai
- C07 - ORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
PHOTORESIST COMPOSITION, COMPOUND, AND PRODUCTION METHOD THEREOF
- Publication number 20160370700
- Publication date Dec 22, 2016
- JSR Corporation
- Hayato NAMAI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PA...
- Publication number 20160179003
- Publication date Jun 23, 2016
- JSR Corporation
- Yuusuke ASANO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITION, COMPOUND, AND PRODUCTION METHOD THEREOF
- Publication number 20150004545
- Publication date Jan 1, 2015
- JSR Corporation
- Hayato NAMAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PA...
- Publication number 20140212813
- Publication date Jul 31, 2014
- JSR Corporation
- Yuusuke ASANO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PA...
- Publication number 20130244185
- Publication date Sep 19, 2013
- JSR Corporation
- Yasuhiko MATSUDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PA...
- Publication number 20130065186
- Publication date Mar 14, 2013
- JSR Corporation
- Yasuhiko MATSUDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION
- Publication number 20120295198
- Publication date Nov 22, 2012
- JSR Corporation
- Yasuhiko MATSUDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER AND METHOD FOR FORMI...
- Publication number 20120295197
- Publication date Nov 22, 2012
- JSR Corporation
- Yuko KIRIDOSHI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PA...
- Publication number 20120237875
- Publication date Sep 20, 2012
- JSR Corporation
- Yuusuke ASANO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING A RESIST...
- Publication number 20120156612
- Publication date Jun 21, 2012
- JSR Corporation
- Yuusuke ASANO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER, AND METHOD FOR FORM...
- Publication number 20120094234
- Publication date Apr 19, 2012
- JSR Corporation
- Yasuhiko MATSUDA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOUND
- Publication number 20100324329
- Publication date Dec 23, 2010
- JSR Corporation
- Tomoki Nagai
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION
- Publication number 20100203447
- Publication date Aug 12, 2010
- JSR Corporation
- Noboru Otsuka
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION
- Publication number 20100068647
- Publication date Mar 18, 2010
- JSR Corporation
- Noboru Otsuka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Novel Compound, Polymer, and Radiation-Sensitive Composition
- Publication number 20090069521
- Publication date Mar 12, 2009
- JSR Corporation
- Tomoki Nagai
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Takanori Kawakami

Person

Patents Grantslast 30 patents

Photoresist composition, compound, and production method thereof

Radiation-sensitive resin composition, polymer and method for formi...

Radiation-sensitive resin composition, method for forming resist pa...

Photoresist composition, compound, and production method thereof

Radiation-sensitive resin composition

Radiation-sensitive resin composition, polymer, and method for form...

Radiation-sensitive resin composition

Radiation-sensitive resin composition, method for forming resist pa...

Radiation-sensitive resin composition, method for forming a resist...

Radiation-sensitive resin composition

Sulfonium compound

Compound, polymer, and radiation-sensitive composition

Patents Applicationslast 30 patents

PHOTORESIST COMPOSITION, COMPOUND, AND PRODUCTION METHOD THEREOF

RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PA...

PHOTORESIST COMPOSITION, COMPOUND, AND PRODUCTION METHOD THEREOF

RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PA...

RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PA...

RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PA...

RADIATION-SENSITIVE RESIN COMPOSITION

RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER AND METHOD FOR FORMI...

RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PA...

RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING A RESIST...

RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER, AND METHOD FOR FORM...

COMPOUND

RADIATION-SENSITIVE RESIN COMPOSITION

RADIATION-SENSITIVE RESIN COMPOSITION

Novel Compound, Polymer, and Radiation-Sensitive Composition