Takanori Kudo

Person

Bedminster, NJ, US

People

Patents Grantslast 30 patents

Information Patent Grant
Novolak/DNQ based, chemically amplified photoresist
- Patent number 12,276,909
- Issue date Apr 15, 2025
- Merck Patent GmbH
- Medhat A. Toukhy
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Antireflective coating compositions and processes thereof
- Patent number 9,274,426
- Issue date Mar 1, 2016
- AZ Electronic Materials (Luxembourg) S.A.R.L.
- M. Dalil Rahman
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Antireflective coating composition and process thereof
- Patent number 9,152,051
- Issue date Oct 6, 2015
- AZ ELECTRONICS MATERIALS (LUXEMBOURG) S.A.R.L.
- M. Dalil Rahman
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Bottom antireflective coating compositions and processes thereof
- Patent number 8,623,589
- Issue date Jan 7, 2014
- AZ Electronic Materials USA Corp.
- Takanori Kudo
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Photoresist compositions
- Patent number 8,252,503
- Issue date Aug 28, 2012
- AZ Electronic Materials USA Corp.
- Srinivasan Chakrapani
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoactive compounds
- Patent number 7,601,480
- Issue date Oct 13, 2009
- AZ Electronic Materials USA Corp.
- M. Dalil Rahman
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Composition for coating over a photoresist pattern
- Patent number 7,595,141
- Issue date Sep 29, 2009
- AZ Electronic Materials USA Corp.
- Takanori Kudo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist compositions
- Patent number 7,122,291
- Issue date Oct 17, 2006
- AZ Electronic Materials USA Corp.
- Munirathna Padmanaban
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photoresist composition for deep ultraviolet lithography comprising...
- Patent number 6,991,888
- Issue date Jan 31, 2006
- AZ Electronic Materials USA Corp.
- Munirathna Padmanaban
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Negative deep ultraviolet photoresist
- Patent number 6,800,416
- Issue date Oct 5, 2004
- Clariant Finance (BVI) Ltd
- Takanori Kudo
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photoresist composition for deep UV radiation containing an additive
- Patent number 6,723,488
- Issue date Apr 20, 2004
- Clariant Finance (BVI) Ltd
- Takanori Kudo
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Process for producing film forming resins for photoresist compositions
- Patent number 6,610,465
- Issue date Aug 26, 2003
- Clariant Finance (BVI) Limited
- M. Dalil Rahman
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
A METHOD OF MANUFACTURING SEGREGATED LAYERS ABOVE A SUBSTRATE, AND...
- Publication number 20230119980
- Publication date Apr 20, 2023
- Merck Patent GmbH
- Daniel HUDSON
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
PAG-FREE POSITIVE CHEMICALLY AMPLIFIED RESIST COMPOSITION AND METHO...
- Publication number 20220404702
- Publication date Dec 22, 2022
- Merck Patent GmbH
- Takanori KUDO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED PHOTORESIST
- Publication number 20220365432
- Publication date Nov 17, 2022
- Merck Patent GmbH
- Takanori KUDO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NOVOLAK/DNQ BASED, CHEMICALLY AMPLIFIED PHOTORESIST
- Publication number 20210382390
- Publication date Dec 9, 2021
- Merck Patent GmbH
- Medhat A. Toukhy
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ANTIREFLECTIVE COATING COMPOSITIONS AND PROCESSES THEREOF
- Publication number 20150309410
- Publication date Oct 29, 2015
- AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
- M. Dalil RAHMAN
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
ANTIREFLECTIVE COATING COMPOSITIONS AND PROCESSES THEREOF
- Publication number 20150309403
- Publication date Oct 29, 2015
- AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
- M. Dalil RAHMAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ANTIREFLECTIVE COATING COMPOSITION AND PROCESS THEREOF
- Publication number 20140370444
- Publication date Dec 18, 2014
- AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
- M. Dalil RAHMAN
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS AND PROCESSES THEREOF
- Publication number 20120308939
- Publication date Dec 6, 2012
- AZ Electronic Materials USA Corp.
- Takanori Kudo
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Underlayer Developable Coating Compositions and Processes Thereof
- Publication number 20120122029
- Publication date May 17, 2012
- Takanori Kudo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive-Working Photoimageable Bottom Antireflective Coating
- Publication number 20110086312
- Publication date Apr 14, 2011
- Ralph R. Dammel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITIONS
- Publication number 20090053652
- Publication date Feb 26, 2009
- Srinivasan Chakrapani
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Photoactive Compounds
- Publication number 20080153032
- Publication date Jun 26, 2008
- M. Dalil Rahman
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Composition for coating over a photoresist pattern
- Publication number 20060088788
- Publication date Apr 27, 2006
- Takanori Kudo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photoresist compositions
- Publication number 20060024610
- Publication date Feb 2, 2006
- Munirathna Padmanaban
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photoresist composition for deep ultraviolet lithography comprising...
- Publication number 20030235782
- Publication date Dec 25, 2003
- Munirathna Padmanaban
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photoresist composition for deep ultraviolet lithography comprising...
- Publication number 20030235775
- Publication date Dec 25, 2003
- Munirathna Padmanaban
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Negative deep ultraviolet photoresist
- Publication number 20030129527
- Publication date Jul 10, 2003
- Takanori Kudo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photoresist composition for deep UV radiation containing an additive
- Publication number 20030087180
- Publication date May 8, 2003
- Takanori Kudo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Process for producing film forming resins for photoresist compositions
- Publication number 20020197555
- Publication date Dec 26, 2002
- M. Dalil Rahman
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL

Takanori Kudo

Person

Patents Grantslast 30 patents

Novolak/DNQ based, chemically amplified photoresist

Antireflective coating compositions and processes thereof

Antireflective coating composition and process thereof

Bottom antireflective coating compositions and processes thereof

Photoresist compositions

Photoactive compounds

Composition for coating over a photoresist pattern

Photoresist compositions

Photoresist composition for deep ultraviolet lithography comprising...

Negative deep ultraviolet photoresist

Photoresist composition for deep UV radiation containing an additive

Process for producing film forming resins for photoresist compositions

Patents Applicationslast 30 patents

A METHOD OF MANUFACTURING SEGREGATED LAYERS ABOVE A SUBSTRATE, AND...

PAG-FREE POSITIVE CHEMICALLY AMPLIFIED RESIST COMPOSITION AND METHO...

CHEMICALLY AMPLIFIED PHOTORESIST

NOVOLAK/DNQ BASED, CHEMICALLY AMPLIFIED PHOTORESIST

ANTIREFLECTIVE COATING COMPOSITIONS AND PROCESSES THEREOF

ANTIREFLECTIVE COATING COMPOSITIONS AND PROCESSES THEREOF

ANTIREFLECTIVE COATING COMPOSITION AND PROCESS THEREOF

BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS AND PROCESSES THEREOF

Underlayer Developable Coating Compositions and Processes Thereof

Positive-Working Photoimageable Bottom Antireflective Coating

PHOTORESIST COMPOSITIONS

Photoactive Compounds

Composition for coating over a photoresist pattern

Photoresist compositions

Photoresist composition for deep ultraviolet lithography comprising...

Photoresist composition for deep ultraviolet lithography comprising...

Negative deep ultraviolet photoresist

Photoresist composition for deep UV radiation containing an additive

Process for producing film forming resins for photoresist compositions