Takanori Kudo

Person

Sayama, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Radiation absorbing polymer, composition for radiation absorbing co...
- Patent number 6,737,492
- Issue date May 18, 2004
- Clariant Finance (BVI) Limited
- Wen-Bing Kang
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Radiation absorbing polymer, composition for radiation absorbing co...
- Patent number 6,468,718
- Issue date Oct 22, 2002
- Clariant Finance (BVI) Limited
- Wen-Bing Kang
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photosensitive resin composition for color filter production
- Patent number 5,882,843
- Issue date Mar 16, 1999
- Hoechst Japan Limited
- Takanori Kudo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-working radiation-sensitive mixture
- Patent number 5,843,319
- Issue date Dec 1, 1998
- Hoechst Japan Limited
- Klaus Juergen Przybilla
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming material including photoacid and photobase generato...
- Patent number 5,691,100
- Issue date Nov 25, 1997
- Hoechst Japan Limited
- Takanori Kudo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive mixture comprising a basic iodonium compound
- Patent number 5,663,035
- Issue date Sep 2, 1997
- Hoechst Japan Limited
- Seiya Masuda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Colored, photosensitive resin composition
- Patent number 5,641,594
- Issue date Jun 24, 1997
- Hoechst Japan Limited
- Takanori Kudo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation sensitive composition
- Patent number 5,595,855
- Issue date Jan 21, 1997
- Hoechst Japan Limited
- Munirathna Padmanaban
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-working radiation-sensitive mixture
- Patent number 5,525,453
- Issue date Jun 11, 1996
- Hoechst Japan Limited
- Klaus J. Przybilla
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Radiation absorbing polymer, composition for radiation absorbing co...
- Publication number 20030065119
- Publication date Apr 3, 2003
- CLARIANT FINANCE (BVI) LIMITED
- Wen-Bing Kang
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Takanori Kudo

Person

Patents Grantslast 30 patents

Radiation absorbing polymer, composition for radiation absorbing co...

Radiation absorbing polymer, composition for radiation absorbing co...

Photosensitive resin composition for color filter production

Positive-working radiation-sensitive mixture

Pattern forming material including photoacid and photobase generato...

Radiation-sensitive mixture comprising a basic iodonium compound

Colored, photosensitive resin composition

Radiation sensitive composition

Positive-working radiation-sensitive mixture

Patents Applicationslast 30 patents

Radiation absorbing polymer, composition for radiation absorbing co...