Takanori Yamagishi

Person

Ichihara-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Copolymer and composition for semiconductor lithography and process...
- Patent number 8,859,180
- Issue date Oct 14, 2014
- Maruzen Petrochemical Co., LTD
- Tomo Oikawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Copolymer for positive type lithography, polymerization initiator u...
- Patent number 8,709,698
- Issue date Apr 29, 2014
- Maruzen Petrochemical Co., LTD
- Minoru Iijima
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method for producing a copolymer solution with a uniform concentrat...
- Patent number 8,377,625
- Issue date Feb 19, 2013
- Maruzen Petrochemical Co., Ltd.
- Takanori Yamagishi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Copolymer for immersion lithography and compositions
- Patent number 8,211,615
- Issue date Jul 3, 2012
- Maruzen Petrochemical Co., LTD
- Takanori Yamagishi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist polymer and method for producing the polymer
- Patent number 8,163,852
- Issue date Apr 24, 2012
- Maruzen Petrochemical Co., LTD
- Takanori Yamagishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist polymer solution and process for producing the same
- Patent number 8,119,321
- Issue date Feb 21, 2012
- Maruzen Petrochemical Co., LTD
- Takanori Yamagishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Copolymer for positive type lithography, polymerization initiator u...
- Patent number 8,067,516
- Issue date Nov 29, 2011
- Maruzen Petrochemical Co., LTD
- Minoru Iijima
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Process for producing polymer for semiconductor lithography
- Patent number 8,030,419
- Issue date Oct 4, 2011
- Maruzen Petrochemical Co., LTD
- Takanori Yamagishi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive resist composition and method of forming resist pattern
- Patent number 7,972,762
- Issue date Jul 5, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Masaaki Muroi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Copolymer for semiconductor lithography and process for producing t...
- Patent number 7,960,494
- Issue date Jun 14, 2011
- Maruzen Petrochemical Co., LTD
- Takanori Yamagishi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Copolymer for semiconductor lithography and producing method thereo...
- Patent number 7,910,282
- Issue date Mar 22, 2011
- Maruzen Petrochemical Co., LTD
- Takanori Yamagishi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Production process of copolymer for semiconductor lithography
- Patent number 7,838,606
- Issue date Nov 23, 2010
- Maruzen Petrochemical Co., LTD
- Takanori Yamagishi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Copolymer for semiconductor lithography and process for production...
- Patent number 7,695,889
- Issue date Apr 13, 2010
- Maruzen Petrochemical Co., LTD
- Takanori Yamagishi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Thiol compound, copolymer and method for producing the copolymer
- Patent number 7,411,097
- Issue date Aug 12, 2008
- Maruzen Petrochemical Co. Ltd.
- Takanori Yamagishi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method for prevention of increase in particles in copolymer for sem...
- Patent number 7,342,087
- Issue date Mar 11, 2008
- Maruzen Petrochemical Co. Ltd.
- Takanori Yamagishi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Thiol compound, copolymer and method for producing the copolymer
- Patent number 7,220,808
- Issue date May 22, 2007
- Maruzen Petrochemical Co. Ltd.
- Takanori Yamagishi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Preparation process of copolymer for semiconductor lithography and...
- Patent number 7,045,582
- Issue date May 16, 2006
- Maruzen Petrochemical Co. Ltd.
- Takanori Yamagishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for the preparation of p-ethylphenol
- Patent number 4,927,979
- Issue date May 22, 1990
- Maruzen Petrochemical Co., Ltd.
- Takanori Yamagishi
- C07 - ORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
Copolymer for positive type lithography, polymerization initiator u...
- Publication number 20120071638
- Publication date Mar 22, 2012
- Maruzen Petrochemical Co., Ltd.
- Minoru Iijima
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COPOLYMER FOR SEMICONDUCTOR LITHOGRAPHY AND PRODUCING METHOD THEREO...
- Publication number 20100324245
- Publication date Dec 23, 2010
- MARUZEN PETROCHEMICAL CO., LTD.
- Takanori YAMAGISHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PRODUCING A COPOLYMER SOLUTION WITH A UNIFORM CONCENTRAT...
- Publication number 20100143842
- Publication date Jun 10, 2010
- MARUZEN PETROCHEMICAL CO., LTD.
- Takanori YAMAGISHI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Copolymer and composition for semiconductor lithography and process...
- Publication number 20100062371
- Publication date Mar 11, 2010
- Tomo Oikawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PROCESS FOR PRODUCING POLYMER FOR SEMICONDUCTOR LITHOGRAPHY
- Publication number 20100048848
- Publication date Feb 25, 2010
- MARUZEN PETROCHEMICAL CO., LTD.
- Takanori Yamagishi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COPOLYMER FOR IMMERSION LITHOGRAPHY AND COMPOSITIONS
- Publication number 20100047710
- Publication date Feb 25, 2010
- MARUZEN PETROCHEMICAL CO., LTD.
- Takanori Yamagishi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COPOLYMER FOR SEMICONDUCTOR LITHOGRAPHY AND PROCESS FOR PRODUCING T...
- Publication number 20090306328
- Publication date Dec 10, 2009
- MARUZEN PETROCHEMICAL CO., LTD.
- Takanori Yamagishi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20090233220
- Publication date Sep 17, 2009
- Masaaki Muroi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Resist polymer and method for producing the polymer
- Publication number 20090123868
- Publication date May 14, 2009
- Takanori Yamagishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Copolymer For Semiconductor Lithography And Producing Method Thereo...
- Publication number 20080114139
- Publication date May 15, 2008
- MARUZEN PETROCHEMICAL CO., LTD.
- Takanori Yamagishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Copolymer for positive type lithography, polymerization initiator u...
- Publication number 20070269741
- Publication date Nov 22, 2007
- Minoru Iijima
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Novel thiol compound, copolymer and method for producing the copolymer
- Publication number 20070161764
- Publication date Jul 12, 2007
- Takanori Yamagishi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Resist polymer solution and process for producing the same
- Publication number 20070111137
- Publication date May 17, 2007
- Takanori Yamagishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Copolymer for semiconductor lithography, composition and thiol comp...
- Publication number 20060287469
- Publication date Dec 21, 2006
- Minoru Iijima
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Copolymer for semiconductor lithography and process for production...
- Publication number 20060257784
- Publication date Nov 16, 2006
- Takanori Yamagishi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Method for prevention of increase in particles in copolymer for sem...
- Publication number 20060058433
- Publication date Mar 16, 2006
- Takanori Yamagishi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Resist polymer and method for producing the polymer
- Publication number 20050287474
- Publication date Dec 29, 2005
- Takanori Yamagishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Preparation process of copolymer for semiconductor lithography and...
- Publication number 20050131184
- Publication date Jun 16, 2005
- Takanori Yamagishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Production process of copolymer for semiconductor lithography
- Publication number 20050096447
- Publication date May 5, 2005
- MARUZEN PETROCHEMICAL CO., LTD.
- Takanori Yamagishi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Novel thiol compound, copolymer and method for producing the copolymer
- Publication number 20040181023
- Publication date Sep 16, 2004
- Takanori Yamagishi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Resist polymer and method for producing the polymer
- Publication number 20040167298
- Publication date Aug 26, 2004
- Takanori Yamagishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Takanori Yamagishi

Person

Patents Grantslast 30 patents

Copolymer and composition for semiconductor lithography and process...

Copolymer for positive type lithography, polymerization initiator u...

Method for producing a copolymer solution with a uniform concentrat...

Copolymer for immersion lithography and compositions

Resist polymer and method for producing the polymer

Resist polymer solution and process for producing the same

Copolymer for positive type lithography, polymerization initiator u...

Process for producing polymer for semiconductor lithography

Positive resist composition and method of forming resist pattern

Copolymer for semiconductor lithography and process for producing t...

Copolymer for semiconductor lithography and producing method thereo...

Production process of copolymer for semiconductor lithography

Copolymer for semiconductor lithography and process for production...

Thiol compound, copolymer and method for producing the copolymer

Method for prevention of increase in particles in copolymer for sem...

Thiol compound, copolymer and method for producing the copolymer

Preparation process of copolymer for semiconductor lithography and...

Process for the preparation of p-ethylphenol

Patents Applicationslast 30 patents

Copolymer for positive type lithography, polymerization initiator u...

COPOLYMER FOR SEMICONDUCTOR LITHOGRAPHY AND PRODUCING METHOD THEREO...

METHOD FOR PRODUCING A COPOLYMER SOLUTION WITH A UNIFORM CONCENTRAT...

Copolymer and composition for semiconductor lithography and process...

PROCESS FOR PRODUCING POLYMER FOR SEMICONDUCTOR LITHOGRAPHY

COPOLYMER FOR IMMERSION LITHOGRAPHY AND COMPOSITIONS

COPOLYMER FOR SEMICONDUCTOR LITHOGRAPHY AND PROCESS FOR PRODUCING T...

POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

Resist polymer and method for producing the polymer

Copolymer For Semiconductor Lithography And Producing Method Thereo...

Copolymer for positive type lithography, polymerization initiator u...

Novel thiol compound, copolymer and method for producing the copolymer

Resist polymer solution and process for producing the same

Copolymer for semiconductor lithography, composition and thiol comp...

Copolymer for semiconductor lithography and process for production...

Method for prevention of increase in particles in copolymer for sem...

Resist polymer and method for producing the polymer

Preparation process of copolymer for semiconductor lithography and...

Production process of copolymer for semiconductor lithography

Novel thiol compound, copolymer and method for producing the copolymer

Resist polymer and method for producing the polymer