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Takanori Yoshimura
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Tokyo, JP
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last 30 patents
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Patent Grant
Method of processing a substrate and apparatus for the method
Patent number
6,059,985
Issue date
May 9, 2000
Anelva Corporation
Takanori Yoshimura
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Electrode unit for in-situ cleaning in thermal CVD apparatus
Patent number
5,893,962
Issue date
Apr 13, 1999
Anelva Corporation
Shigeru Mizuno
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Heater for CVD apparatus
Patent number
5,766,363
Issue date
Jun 16, 1998
Anelva Corporation
Shigeru Mizuno
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Process for preventing deposition on inner surfaces of CVD reactor
Patent number
5,728,629
Issue date
Mar 17, 1998
Anelva Corporation
Shigeru Mizuno
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
CVD apparatus
Patent number
5,676,758
Issue date
Oct 14, 1997
Anelva Corporation
Shinya Hasegawa
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...