Takao Funakubo

Person

Miyagi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing method
- Patent number 10,923,332
- Issue date Feb 16, 2021
- Tokyo Electron Limited
- Ryuichi Asako
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for etching organic region
- Patent number 10,903,085
- Issue date Jan 26, 2021
- Tokyo Electron Limited
- Ryuichi Asako
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 10,861,675
- Issue date Dec 8, 2020
- Tokyo Electron Limited
- Takao Funakubo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for cleaning components of plasma processing apparatus
- Patent number 10,734,204
- Issue date Aug 4, 2020
- Tokyo Electron Limited
- Takao Funakubo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for cleaning components of plasma processing apparatus
- Patent number 10,626,497
- Issue date Apr 21, 2020
- Tokyo Electron Limited
- Takao Funakubo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 10,204,763
- Issue date Feb 12, 2019
- Tokyo Electron Limited
- Takao Funakubo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method
- Patent number 9,779,962
- Issue date Oct 3, 2017
- Tokyo Electron Limited
- Takao Funakubo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 9,653,317
- Issue date May 16, 2017
- Tokyo Electron Limited
- Masaru Nishino
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
FILM FORMING METHOD AND FILM FORMING APPARATUS
- Publication number 20210140044
- Publication date May 13, 2021
- Hiroshi Nagaike
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMING APPARATUS AND FILM FORMING METHOD
- Publication number 20210130955
- Publication date May 6, 2021
- TOKYO ELECTRON LIMITED
- Hiroshi NAGAIKE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR ETCHING ORGANIC REGION
- Publication number 20190326106
- Publication date Oct 24, 2019
- TOKYO ELECTRON LIMITED
- Ryuichi ASAKO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20190326104
- Publication date Oct 24, 2019
- TOKYO ELECTRON LIMITED
- Ryuichi ASAKO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR CLEANING COMPONENTS OF PLASMA PROCESSING APPARATUS
- Publication number 20190221406
- Publication date Jul 18, 2019
- TOKYO ELECTRON LIMITED
- Takao FUNAKUBO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR CLEANING COMPONENTS OF PLASMA PROCESSING APPARATUS
- Publication number 20190218663
- Publication date Jul 18, 2019
- TOKYO ELECTRON LIMITED
- Takao FUNAKUBO
- B08 - CLEANING
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20190139744
- Publication date May 9, 2019
- TOKYO ELECTRON LIMITED
- Takao FUNAKUBO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20170221684
- Publication date Aug 3, 2017
- TOKYO ELECTRON LIMITED
- Masaru NISHINO
- B08 - CLEANING
Information Patent Application
PLASMA ETCHING METHOD
- Publication number 20160163554
- Publication date Jun 9, 2016
- TOKYO ELECTRON LIMITED
- Takao FUNAKUBO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20150380282
- Publication date Dec 31, 2015
- TOKYO ELECTRON LIMITED
- Takao FUNAKUBO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20150118859
- Publication date Apr 30, 2015
- TOKYO ELECTRON LIMITED
- Masaru NISHINO
- H01 - BASIC ELECTRIC ELEMENTS

Takao Funakubo

Person

Patents Grantslast 30 patents

Plasma processing method

Method for etching organic region

Plasma processing apparatus and plasma processing method

Method for cleaning components of plasma processing apparatus

Method for cleaning components of plasma processing apparatus

Plasma processing apparatus and plasma processing method

Plasma etching method

Plasma processing method and plasma processing apparatus

Patents Applicationslast 30 patents

FILM FORMING METHOD AND FILM FORMING APPARATUS

FILM FORMING APPARATUS AND FILM FORMING METHOD

METHOD FOR ETCHING ORGANIC REGION

PLASMA PROCESSING METHOD

METHOD FOR CLEANING COMPONENTS OF PLASMA PROCESSING APPARATUS

METHOD FOR CLEANING COMPONENTS OF PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING METHOD

PLASMA ETCHING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS