Takao Iwayanagi

Person

Nerima, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Lithium secondary battery, its electrolyte, and electric apparatus...
- Patent number 6,475,680
- Issue date Nov 5, 2002
- Hitachi, Ltd.
- Juichi Arai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Light-emitting elements
- Patent number 5,554,911
- Issue date Sep 10, 1996
- Hitachi, Ltd.
- Takahiro Nakayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radiation sensitive materials
- Patent number 5,061,599
- Issue date Oct 29, 1991
- Hitachi, Ltd.
- Tetsuichi Kudo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation imaging process for forming pattern without alkali-solubl...
- Patent number 4,985,344
- Issue date Jan 15, 1991
- Hitachi, Ltd.
- Shoichi Uchino
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation imaging process for formation of contrast enhanced patter...
- Patent number 4,983,500
- Issue date Jan 8, 1991
- Hitachi, Ltd.
- Shouichi Uchino
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist pattern forming process with dry etching
- Patent number 4,835,089
- Issue date May 30, 1989
- Hitachi, Ltd.
- Takao Iwayanagi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive composition with azide or bisazide compound with oxa...
- Patent number 4,728,594
- Issue date Mar 1, 1988
- Hitachi Chemical Co., Ltd.
- Saburo Nonogaki
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Mask for X-ray lithography and process for producing the same
- Patent number 4,719,161
- Issue date Jan 12, 1988
- Hitachi, Ltd.
- Takeshi Kimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming a microscopic pattern with far UV pattern exposur...
- Patent number 4,614,706
- Issue date Sep 30, 1986
- Hitachi, Ltd.
- Toshiharu Matsuzawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming a microscopic pattern
- Patent number 4,536,421
- Issue date Aug 20, 1985
- Hitachi, Ltd.
- Toshiharu Matsuzawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern formation method utilizing deep UV radiation and bisazide c...
- Patent number 4,469,778
- Issue date Sep 4, 1984
- Hitachi, Ltd.
- Takao Iwayanagi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern-formation method with iodine containing azide and oxygen pl...
- Patent number 4,465,768
- Issue date Aug 14, 1984
- Hitachi, Ltd.
- Takumi Ueno
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Selective etching method of polyimide type resin film
- Patent number 4,436,583
- Issue date Mar 13, 1984
- Hitachi, Ltd.
- Atsushi Saiki
- H01 - BASIC ELECTRIC ELEMENTS

Takao Iwayanagi

Person

Patents Grantslast 30 patents

Lithium secondary battery, its electrolyte, and electric apparatus...

Light-emitting elements

Radiation sensitive materials

Radiation imaging process for forming pattern without alkali-solubl...

Radiation imaging process for formation of contrast enhanced patter...

Resist pattern forming process with dry etching

Photosensitive composition with azide or bisazide compound with oxa...

Mask for X-ray lithography and process for producing the same

Method of forming a microscopic pattern with far UV pattern exposur...

Method of forming a microscopic pattern

Pattern formation method utilizing deep UV radiation and bisazide c...

Pattern-formation method with iodine containing azide and oxygen pl...

Selective etching method of polyimide type resin film