Takao Yoshihara

Person

Niigata, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method for forming silicon-containing resist underlayer film
- Patent number 9,091,925
- Issue date Jul 28, 2015
- Shin-Etsu Chemical Co., Ltd.
- Takao Yoshihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fluorinated monomer, fluorinated polymer, resist composition, and p...
- Patent number 8,945,809
- Issue date Feb 3, 2015
- Shin-Etsu Chemical Co., Ltd.
- Koji Hasegawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Patterning process
- Patent number 8,741,548
- Issue date Jun 3, 2014
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Patterning process
- Patent number 8,192,921
- Issue date Jun 5, 2012
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Patterning process
- Patent number 8,105,764
- Issue date Jan 31, 2012
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Resist composition and patterning process
- Patent number 7,771,914
- Issue date Aug 10, 2010
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Patterning process and resist composition
- Patent number 7,741,015
- Issue date Jun 22, 2010
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Polymer, resist composition and patterning process
- Patent number 7,666,571
- Issue date Feb 23, 2010
- Shin-Etsu Chemical Co., Ltd.
- Takeru Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polymer, resist composition, and patterning process
- Patent number 7,537,880
- Issue date May 26, 2009
- Shin-Etsu Chemical Co., Ltd.
- Yuji Harada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Chemical amplification type photoresist composition, method for pro...
- Patent number 6,800,551
- Issue date Oct 5, 2004
- NEC Electronics Corporation
- Seiji Nagahara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sulfonyldiazomethanes, photoacid generators, resist compositions, a...
- Patent number 6,713,612
- Issue date Mar 30, 2004
- Shin-Etsu Chemical Co., Ltd.
- Katsuhiro Kobayashi
- C07 - ORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM
- Publication number 20130337168
- Publication date Dec 19, 2013
- Shin-Etsu Chemical Co., Ltd.
- Takao YOSHIHARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FLUORINATED MONOMER, FLUORINATED POLYMER, RESIST COMPOSITION, AND P...
- Publication number 20110151381
- Publication date Jun 23, 2011
- Koji HASEGAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PATTERNING PROCESS
- Publication number 20100178618
- Publication date Jul 15, 2010
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERNING PROCESS
- Publication number 20090081595
- Publication date Mar 26, 2009
- Shin-Etsu Chemical Co., Ltd.
- Jun HATAKEYAMA
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
PATTERNING PROCESS
- Publication number 20090053651
- Publication date Feb 26, 2009
- Shin-Etsu Chemical Co., Ltd.
- Jun HATAKEYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERNING PROCESS AND RESIST COMPOSITION
- Publication number 20080199806
- Publication date Aug 21, 2008
- Shin-Etsu Chemical Co., Ltd.
- Jun HATAKEYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Polymer, resist composition, and patterning process
- Publication number 20080118860
- Publication date May 22, 2008
- Shin-Etsu Chemical Co., Ltd.
- Yuji Harada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Resist composition and patterning process
- Publication number 20080096131
- Publication date Apr 24, 2008
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20080090172
- Publication date Apr 17, 2008
- Shin-Etsu Chemical Co., Ltd.
- Jun HATAKEYAMA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Polymer, resist composition and patterning process
- Publication number 20070099114
- Publication date May 3, 2007
- Shin-Etsu Chemical Co., Ltd.
- Takeru Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist polymer, resist composition and patterning process
- Publication number 20050031988
- Publication date Feb 10, 2005
- Takeru Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist material and method for pattern formation
- Publication number 20050019692
- Publication date Jan 27, 2005
- Hiroshi Kubota
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Novel sulfonyldiazomethanes, photoacid generators, resist compositi...
- Publication number 20030224298
- Publication date Dec 4, 2003
- Katsuhiro Kobayashi
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Chemical amplification type photoresist composition, method for pro...
- Publication number 20030157806
- Publication date Aug 21, 2003
- NEC ELECTRONICS CORPORATION
- Seiji Nagahara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist material and method for pattern formation
- Publication number 20010055727
- Publication date Dec 27, 2001
- Hiroshi Kubota
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Takao Yoshihara

Person

Patents Grantslast 30 patents

Method for forming silicon-containing resist underlayer film

Fluorinated monomer, fluorinated polymer, resist composition, and p...

Patterning process

Patterning process

Patterning process

Resist composition and patterning process

Patterning process and resist composition

Polymer, resist composition and patterning process

Polymer, resist composition, and patterning process

Chemical amplification type photoresist composition, method for pro...

Sulfonyldiazomethanes, photoacid generators, resist compositions, a...

Patents Applicationslast 30 patents

METHOD FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM

FLUORINATED MONOMER, FLUORINATED POLYMER, RESIST COMPOSITION, AND P...

PATTERNING PROCESS

PATTERNING PROCESS

PATTERNING PROCESS

PATTERNING PROCESS AND RESIST COMPOSITION

Polymer, resist composition, and patterning process

Resist composition and patterning process

RESIST COMPOSITION AND PATTERNING PROCESS

Polymer, resist composition and patterning process

Resist polymer, resist composition and patterning process

Resist material and method for pattern formation

Novel sulfonyldiazomethanes, photoacid generators, resist compositi...

Chemical amplification type photoresist composition, method for pro...

Resist material and method for pattern formation