Takashi Dokan

Person

Sendai City, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Maintenance device, vacuum processing system, and maintenance method
- Patent number 12,198,962
- Issue date Jan 14, 2025
- Tokyo Electron Limited
- Takashi Dokan
- B08 - CLEANING
Information Patent Grant
Control method and plasma processing apparatus
- Patent number 12,165,842
- Issue date Dec 10, 2024
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 11,871,503
- Issue date Jan 9, 2024
- Tokyo Electron Limited
- Takashi Dokan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control method and plasma processing apparatus
- Patent number 11,764,082
- Issue date Sep 19, 2023
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control method and plasma processing apparatus
- Patent number 11,742,181
- Issue date Aug 29, 2023
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control method and plasma processing apparatus
- Patent number 11,742,182
- Issue date Aug 29, 2023
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control method and plasma processing apparatus
- Patent number 11,476,089
- Issue date Oct 18, 2022
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 11,337,297
- Issue date May 17, 2022
- Tokyo Electron Limited
- Takashi Dokan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 11,282,701
- Issue date Mar 22, 2022
- Tokyo Electron Limited
- Takashi Dokan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma etching method and plasma etching apparatus
- Patent number 11,170,979
- Issue date Nov 9, 2021
- Tokyo Electron Limited
- Koichi Nagami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radio frequency power source and plasma processing apparatus
- Patent number 11,087,960
- Issue date Aug 10, 2021
- Tokyo Electron Limited
- Shinji Kubota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus, impedance matching method, and plasma...
- Patent number 11,017,985
- Issue date May 25, 2021
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 10,622,197
- Issue date Apr 14, 2020
- Tokyo Electron Limited
- Shinji Kubota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 10,553,407
- Issue date Feb 4, 2020
- Tokyo Electron Limited
- Koichi Nagami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of producing processing condition of plasma processing appar...
- Patent number 9,870,901
- Issue date Jan 16, 2018
- Tokyo Electron Limited
- Takashi Dokan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method and device
- Patent number 9,218,983
- Issue date Dec 22, 2015
- Tokyo Electron Limited
- Takashi Dokan
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING SYSTEM AND MAINTENANCE METHOD
- Publication number 20240105478
- Publication date Mar 28, 2024
- TOKYO ELECTRON LIMITED
- Takashi DOKAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20230377843
- Publication date Nov 23, 2023
- TOKYO ELECTRON LIMITED
- Chishio KOSHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MAINTENANCE DEVICE, VACUUM PROCESSING SYSTEM, AND MAINTENANCE METHOD
- Publication number 20230330715
- Publication date Oct 19, 2023
- TOKYO ELECTRON LIMITED
- Takashi DOKAN
- B08 - CLEANING
Information Patent Application
CONTROL METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20220216036
- Publication date Jul 7, 2022
- TOKYO ELECTRON LIMITED
- Chishio KOSHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20220159820
- Publication date May 19, 2022
- TOKYO ELECTRON LIMITED
- Takashi Dokan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20220028665
- Publication date Jan 27, 2022
- TOKYO ELECTRON LIMITED
- Koichi Nagami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20210327681
- Publication date Oct 21, 2021
- TOKYO ELECTRON LIMITED
- Chishio KOSHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20210051792
- Publication date Feb 18, 2021
- TOKYO ELECTRON LIMITED
- Takashi Dokan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20210043472
- Publication date Feb 11, 2021
- TOKYO ELECTRON LIMITED
- Chishio KOSHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20200411286
- Publication date Dec 31, 2020
- TOKYO ELECTRON LIMITED
- Chishio KOSHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RADIO FREQUENCY POWER SOURCE AND PLASMA PROCESSING APPARATUS
- Publication number 20200251308
- Publication date Aug 6, 2020
- TOKYO ELECTRON LIMITED
- Shinji KUBOTA
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Application
PLASMA PROCESSING APPARATUS, IMPEDANCE MATCHING METHOD, AND PLASMA...
- Publication number 20200203129
- Publication date Jun 25, 2020
- TOKYO ELECTRON LIMITED
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING METHOD AND PLASMA ETCHING APPARATUS
- Publication number 20200126770
- Publication date Apr 23, 2020
- TOKYO ELECTRON LIMITED
- Koichi Nagami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20200118814
- Publication date Apr 16, 2020
- TOKYO ELECTRON LIMITED
- Takashi DOKAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20190057845
- Publication date Feb 21, 2019
- TOKYO ELECTRON LIMITED
- Koichi Nagami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20180211818
- Publication date Jul 26, 2018
- TOKYO ELECTRON LIMITED
- Shinji Kubota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PRODUCING PROCESSING CONDITION OF PLASMA PROCESSING APPAR...
- Publication number 20160329194
- Publication date Nov 10, 2016
- TOKYO ELECTRON LIMITED
- Takashi DOKAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND DEVICE
- Publication number 20140308815
- Publication date Oct 16, 2014
- TOKYO ELECTRON LIMITED
- Takashi Dokan
- H01 - BASIC ELECTRIC ELEMENTS

Takashi Dokan

Person

Patents Grantslast 30 patents

Maintenance device, vacuum processing system, and maintenance method

Control method and plasma processing apparatus

Plasma processing method and plasma processing apparatus

Control method and plasma processing apparatus

Control method and plasma processing apparatus

Control method and plasma processing apparatus

Control method and plasma processing apparatus

Plasma processing method and plasma processing apparatus

Plasma processing method and plasma processing apparatus

Plasma etching method and plasma etching apparatus

Radio frequency power source and plasma processing apparatus

Plasma processing apparatus, impedance matching method, and plasma...

Plasma processing apparatus and plasma processing method

Plasma processing method and plasma processing apparatus

Method of producing processing condition of plasma processing appar...

Etching method and device

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING SYSTEM AND MAINTENANCE METHOD

CONTROL METHOD AND PLASMA PROCESSING APPARATUS

MAINTENANCE DEVICE, VACUUM PROCESSING SYSTEM, AND MAINTENANCE METHOD

CONTROL METHOD AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

CONTROL METHOD AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

CONTROL METHOD AND PLASMA PROCESSING APPARATUS

CONTROL METHOD AND PLASMA PROCESSING APPARATUS

RADIO FREQUENCY POWER SOURCE AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS, IMPEDANCE MATCHING METHOD, AND PLASMA...

PLASMA ETCHING METHOD AND PLASMA ETCHING APPARATUS

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

METHOD OF PRODUCING PROCESSING CONDITION OF PLASMA PROCESSING APPAR...

ETCHING METHOD AND DEVICE