Takashi HARAGUCHI

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Reflective mask blank and reflective mask, and methods for manufact...
- Patent number 9,448,468
- Issue date Sep 20, 2016
- Toppan Printing Co., Ltd.
- Masahito Tanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Light pattern exposure method, photomask, and photomask blank
- Patent number 8,753,787
- Issue date Jun 17, 2014
- Shin-Etsu Chemical Co., Ltd.
- Hiroki Yoshikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Light pattern exposure method, halftone phase shift mask, and halft...
- Patent number 8,753,786
- Issue date Jun 17, 2014
- Shin-Etsu Chemical Co., Ltd.
- Hiroki Yoshikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask blank and making method, photomask, light pattern exposur...
- Patent number 8,475,978
- Issue date Jul 2, 2013
- Shin-Etsu Chemical Co., Ltd.
- Hiroki Yoshikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask blank and photomask
- Patent number 8,012,654
- Issue date Sep 6, 2011
- Shin-Etsu Chemical Co., Ltd.
- Hiroki Yoshikawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photomask blank and photomask
- Patent number 8,007,964
- Issue date Aug 30, 2011
- Shin-Etsu Chemical Co., Ltd.
- Hiroki Yoshikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask blank and photomask
- Patent number 8,003,284
- Issue date Aug 23, 2011
- Shin-Etsu Chemical Co., Ltd.
- Hiroki Yoshikawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photomask blank and photomask making method
- Patent number 7,989,124
- Issue date Aug 2, 2011
- Toppan Printing Co., Ltd.
- Hiroki Yoshikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Photomask blank
- Patent number 7,790,339
- Issue date Sep 7, 2010
- Shin-Etsu Chemical Co., Ltd.
- Hiroki Yoshikawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photomask blank, photomask and fabrication method thereof
- Patent number 7,771,893
- Issue date Aug 10, 2010
- Shin-Etsu Chemical Co., Ltd.
- Hiroki Yoshikawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photomask blank and photomask making method
- Patent number 7,767,367
- Issue date Aug 3, 2010
- Toppan Printing Co., Ltd.
- Hiroki Yoshikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Photomask blank and photomask
- Patent number 7,767,366
- Issue date Aug 3, 2010
- Shin-Etsu Chemical Co., Ltd.
- Hiroki Yoshikawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photomask blank and photomask
- Patent number 7,691,546
- Issue date Apr 6, 2010
- Shin-Etsu Chemical Co., Ltd.
- Hiroki Yoshikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask blank, photomask and fabrication method thereof
- Patent number 7,625,676
- Issue date Dec 1, 2009
- Shin-Etsu Chemical Co., Ltd.
- Hiroki Yoshikawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photomask blank, photomask and method for producing those
- Patent number 7,618,753
- Issue date Nov 17, 2009
- Shin-Etsu Chemical Co., Ltd.
- Hiroki Yoshikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film-depositing target and preparation of phase shift mask blank
- Patent number 7,598,004
- Issue date Oct 6, 2009
- Shin-Etsu Chemical Co., Ltd.
- Hiroki Yoshikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Halftone phase shift mask blank, halftone phase shift mask, and pat...
- Patent number 7,556,892
- Issue date Jul 7, 2009
- Shin-Etsu Chemical Co., Ltd.
- Kimihiro Okada
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Phase shift mask blank, phase shift mask, and pattern transfer method
- Patent number 7,351,505
- Issue date Apr 1, 2008
- Shin-Etsu Chemical Co., Ltd.
- Hiroki Yoshikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Halftone phase shift mask, blank for the same, and methods of manuf...
- Patent number 5,935,735
- Issue date Aug 10, 1999
- Toppan Printing Co., Ltd.
- Kinji Okubo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
REFLECTIVE MASK BLANK AND REFLECTIVE MASK, AND METHODS FOR MANUFACT...
- Publication number 20140212795
- Publication date Jul 31, 2014
- Toppan Printing Co., Ltd.
- Masahito TANABE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LIGHT PATTERN EXPOSURE METHOD, HALFTONE PHASE SHIFT MASK, AND HALFT...
- Publication number 20130130159
- Publication date May 23, 2013
- Toppan Printing Co., Ltd.
- Hiroki YOSHIKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LIGHT PATTERN EXPOSURE METHOD, PHOTOMASK, AND PHOTOMASK BLANK
- Publication number 20130130160
- Publication date May 23, 2013
- Toppan Printing Co., Ltd.
- Hiroki YOSHIKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK BLANK AND MAKING METHOD, PHOTOMASK, LIGHT PATTERN EXPOSUR...
- Publication number 20120064438
- Publication date Mar 15, 2012
- Hiroki YOSHIKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK BLANK AND PHOTOMASK MAKING METHOD
- Publication number 20100261099
- Publication date Oct 14, 2010
- Hiroki Yoshikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PHOTOMASK BLANK AND PHOTOMASK
- Publication number 20100261100
- Publication date Oct 14, 2010
- Hiroki YOSHIKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK BLANK AND PHOTOMASK
- Publication number 20100261101
- Publication date Oct 14, 2010
- Hiroki YOSHIKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK BLANK AND PHOTOMASK
- Publication number 20100143831
- Publication date Jun 10, 2010
- Hiroki Yoshikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FILM-DEPOSITING TARGET AND PREPARATION OF PHASE SHIFT MASK BLANK
- Publication number 20090057143
- Publication date Mar 5, 2009
- Hiroki YOSHIKAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Photomask Blank and Photomask
- Publication number 20080063950
- Publication date Mar 13, 2008
- Hiroki Yoshikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photomask Blank, Photomask and Method for Producing Those
- Publication number 20070259276
- Publication date Nov 8, 2007
- Hiroki Yoshikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Photomask blank
- Publication number 20070248897
- Publication date Oct 25, 2007
- Shin-Etsu Chemical Co., Ltd. & Toppan Printing Co. , Ltd.
- Hiroki Yoshikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photomask blank and photomask
- Publication number 20070212618
- Publication date Sep 13, 2007
- Shin-Etsu Chemical Co., Ltd.
- Hiroki Yoshikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photomask blank and photomask making method
- Publication number 20070212619
- Publication date Sep 13, 2007
- Shin-Etsu Chemical Co., Ltd.
- Hiroki YOSHIKAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Photomask blank, photomask and fabrication method thereof
- Publication number 20070020534
- Publication date Jan 25, 2007
- Hiroki Yoshikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photomask blank, photomask and fabrication method thereof
- Publication number 20060088774
- Publication date Apr 27, 2006
- Hiroki Yoshikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Halftone phase shift mask blank, halftone phase shift mask, and pat...
- Publication number 20050244722
- Publication date Nov 3, 2005
- Shin-Etsu Chemical Co., Ltd.
- Kimihiro Okada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Film-depositing target and preparation of phase shift mask blank
- Publication number 20050217988
- Publication date Oct 6, 2005
- Shin-Etsu Chemical Co., Ltd.
- Hiroki Yoshikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Phase shift mask blank, phase shift mask, and pattern transfer method
- Publication number 20050112477
- Publication date May 26, 2005
- Shin-Etsu Chemical Co., Ltd.
- Hiroki Yoshikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Takashi HARAGUCHI

Person

Patents Grantslast 30 patents

Reflective mask blank and reflective mask, and methods for manufact...

Light pattern exposure method, photomask, and photomask blank

Light pattern exposure method, halftone phase shift mask, and halft...

Photomask blank and making method, photomask, light pattern exposur...

Photomask blank and photomask

Photomask blank and photomask

Photomask blank and photomask

Photomask blank and photomask making method

Photomask blank

Photomask blank, photomask and fabrication method thereof

Photomask blank and photomask making method

Photomask blank and photomask

Photomask blank and photomask

Photomask blank, photomask and fabrication method thereof

Photomask blank, photomask and method for producing those

Film-depositing target and preparation of phase shift mask blank

Halftone phase shift mask blank, halftone phase shift mask, and pat...

Phase shift mask blank, phase shift mask, and pattern transfer method

Halftone phase shift mask, blank for the same, and methods of manuf...

Patents Applicationslast 30 patents

REFLECTIVE MASK BLANK AND REFLECTIVE MASK, AND METHODS FOR MANUFACT...

LIGHT PATTERN EXPOSURE METHOD, HALFTONE PHASE SHIFT MASK, AND HALFT...

LIGHT PATTERN EXPOSURE METHOD, PHOTOMASK, AND PHOTOMASK BLANK

PHOTOMASK BLANK AND MAKING METHOD, PHOTOMASK, LIGHT PATTERN EXPOSUR...

PHOTOMASK BLANK AND PHOTOMASK MAKING METHOD

PHOTOMASK BLANK AND PHOTOMASK

PHOTOMASK BLANK AND PHOTOMASK

PHOTOMASK BLANK AND PHOTOMASK

FILM-DEPOSITING TARGET AND PREPARATION OF PHASE SHIFT MASK BLANK

Photomask Blank and Photomask

Photomask Blank, Photomask and Method for Producing Those

Photomask blank

Photomask blank and photomask

Photomask blank and photomask making method

Photomask blank, photomask and fabrication method thereof

Photomask blank, photomask and fabrication method thereof

Halftone phase shift mask blank, halftone phase shift mask, and pat...

Film-depositing target and preparation of phase shift mask blank

Phase shift mask blank, phase shift mask, and pattern transfer method