Takashi Hino

Person

Yokohama-Shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Component for plasma processing apparatus and plasma processing app...
- Patent number 12,203,161
- Issue date Jan 21, 2025
- Kyocera Corporation
- Kazuhiro Ishikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Member for plasma processing device and plasma processing device pr...
- Patent number 12,065,727
- Issue date Aug 20, 2024
- Kyocera Corporation
- Kazuhiro Ishikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Component for plasma processing apparatus and plasma processing app...
- Patent number 11,948,779
- Issue date Apr 2, 2024
- Kyocera Corporation
- Kazuhiro Ishikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Component and apparatus of manufacturing semiconductor
- Patent number 11,873,553
- Issue date Jan 16, 2024
- Shibaura Institute of Technology
- Atsushi Yumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing device member, plasma processing device comprisin...
- Patent number 11,715,629
- Issue date Aug 1, 2023
- Kyocera Corporation
- Kazuhiro Ishikawa
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Grant
Aluminum nitride film, method of manufacturing aluminum nitride fil...
- Patent number 11,572,275
- Issue date Feb 7, 2023
- Shibaura Institute of Technology
- Atsushi Yumoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing device member and plasma processing device provid...
- Patent number 11,521,835
- Issue date Dec 6, 2022
- Kyocera Corporation
- Kazuhiro Ishikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Component and semiconductor manufacturing device
- Patent number 11,111,573
- Issue date Sep 7, 2021
- Kyocera Corporation
- Takashi Hino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Component for plasma apparatus and method of manufacturing the same
- Patent number 10,100,413
- Issue date Oct 16, 2018
- Kabushiki Kaisha Toshiba
- Michio Sato
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Component for plasma processing apparatus and method for manufactur...
- Patent number 9,988,702
- Issue date Jun 5, 2018
- Kabushiki Kaisha Toshiba
- Michio Sato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma etching apparatus component and manufacturing method for the...
- Patent number 9,355,855
- Issue date May 31, 2016
- Kabushiki Kaisha Toshiba
- Michio Sato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ceramic circuit board
- Patent number 5,672,848
- Issue date Sep 30, 1997
- Kabushiki Kaisha Toshiba
- Hiroshi Komorita
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
COMPONENT FOR PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING APP...
- Publication number 20220325399
- Publication date Oct 13, 2022
- KYOCERA CORPORATION
- Kazuhiro ISHIKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPONENT FOR PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING APP...
- Publication number 20220181123
- Publication date Jun 9, 2022
- KYOCERA CORPORATION
- Kazuhiro ISHIKAWA
- C01 - INORGANIC CHEMISTRY
Information Patent Application
MEMBER FOR PLASMA PROCESSING DEVICE AND PLASMA PROCESSING DEVICE PR...
- Publication number 20220042161
- Publication date Feb 10, 2022
- KYOCERA CORPORATION
- Kazuhiro ISHIKAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
COMPONENT AND SEMICONDUCTOR MANUFACTURING DEVICE
- Publication number 20210381094
- Publication date Dec 9, 2021
- Kyocera Corporation
- Takashi HINO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ALUMINUM NITRIDE FILM, METHOD OF MANUFACTURING ALUMINUM NITRIDE FIL...
- Publication number 20210284535
- Publication date Sep 16, 2021
- SHIBAURA INSTITUTE OF TECHNOLOGY
- Atsushi YUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING DEVICE MEMBER AND PLASMA PROCESSING DEVICE PROVID...
- Publication number 20210118686
- Publication date Apr 22, 2021
- KYOCERA CORPORATION
- Kazuhiro ISHIKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING DEVICE MEMBER, PLASMA PROCESSING DEVICE COMPRISIN...
- Publication number 20210020415
- Publication date Jan 21, 2021
- Kazuhiro ISHIKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEMBER FOR USE IN PLASMA PROCESSING DEVICE, AND PLASMA PROCESSING D...
- Publication number 20200402771
- Publication date Dec 24, 2020
- KYOCERA CORPORATION
- Kazuhiro ISHIKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEMBER FOR USE IN PLASMA PROCESSING DEVICE, AND PLASMA PROCESSING D...
- Publication number 20200402773
- Publication date Dec 24, 2020
- KYOCERA CORPORATION
- Kazuhiro ISHIKAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
COMPONENT AND APPARATUS OF MANUFACTURING SEMICONDUCTOR
- Publication number 20200208253
- Publication date Jul 2, 2020
- SHIBAURA INSTITUTE OF TECHNOLOGY
- Atsushi YUMOTO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
COMPONENT AND SEMICONDUCTOR MANUFACTURING DEVICE
- Publication number 20200165715
- Publication date May 28, 2020
- Kabushiki Kaisha Toshiba
- Takashi HINO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ALUMINUM NITRIDE FILM, METHOD OF MANUFACTURING ALUMINUM NITRIDE FIL...
- Publication number 20190002281
- Publication date Jan 3, 2019
- SHIBAURA INSTITUTE OF TECHNOLOGY
- Atsushi YUMOTO
- C01 - INORGANIC CHEMISTRY
Information Patent Application
Plasma-Resistant Component, Method For Manufacturing The Plasma-Res...
- Publication number 20170022595
- Publication date Jan 26, 2017
- Kabushiki Kaisha Toshiba
- Michio SATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
COMPONENT FOR PLASMA APPARATUS AND METHOD OF MANUFACTURING THE SAME
- Publication number 20170002470
- Publication date Jan 5, 2017
- Kabushiki Kaisha Toshiba
- Michio SATO
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
COMPONENT FOR PLASMA PROCESSING APPARATUS AND METHOD FOR MANUFACTUR...
- Publication number 20150152540
- Publication date Jun 4, 2015
- Kabushiki Kaisha Toshiba
- Michio Sato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA ETCHING APPARATUS COMPONENT AND MANUFACTURING METHOD FOR THE...
- Publication number 20130251949
- Publication date Sep 26, 2013
- Toshiba Materials Co., Ltd.
- Michio Sato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Takashi Hino

Person

Patents Grantslast 30 patents

Component for plasma processing apparatus and plasma processing app...

Member for plasma processing device and plasma processing device pr...

Component for plasma processing apparatus and plasma processing app...

Component and apparatus of manufacturing semiconductor

Plasma processing device member, plasma processing device comprisin...

Aluminum nitride film, method of manufacturing aluminum nitride fil...

Plasma processing device member and plasma processing device provid...

Component and semiconductor manufacturing device

Component for plasma apparatus and method of manufacturing the same

Component for plasma processing apparatus and method for manufactur...

Plasma etching apparatus component and manufacturing method for the...

Ceramic circuit board

Patents Applicationslast 30 patents

COMPONENT FOR PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING APP...

COMPONENT FOR PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING APP...

MEMBER FOR PLASMA PROCESSING DEVICE AND PLASMA PROCESSING DEVICE PR...

COMPONENT AND SEMICONDUCTOR MANUFACTURING DEVICE

ALUMINUM NITRIDE FILM, METHOD OF MANUFACTURING ALUMINUM NITRIDE FIL...

PLASMA PROCESSING DEVICE MEMBER AND PLASMA PROCESSING DEVICE PROVID...

PLASMA PROCESSING DEVICE MEMBER, PLASMA PROCESSING DEVICE COMPRISIN...

MEMBER FOR USE IN PLASMA PROCESSING DEVICE, AND PLASMA PROCESSING D...

MEMBER FOR USE IN PLASMA PROCESSING DEVICE, AND PLASMA PROCESSING D...

COMPONENT AND APPARATUS OF MANUFACTURING SEMICONDUCTOR

COMPONENT AND SEMICONDUCTOR MANUFACTURING DEVICE

ALUMINUM NITRIDE FILM, METHOD OF MANUFACTURING ALUMINUM NITRIDE FIL...

Plasma-Resistant Component, Method For Manufacturing The Plasma-Res...

COMPONENT FOR PLASMA APPARATUS AND METHOD OF MANUFACTURING THE SAME

COMPONENT FOR PLASMA PROCESSING APPARATUS AND METHOD FOR MANUFACTUR...

PLASMA ETCHING APPARATUS COMPONENT AND MANUFACTURING METHOD FOR THE...