Takashi Hiraoka

Person

Osaka, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Photoresist composition
- Patent number 9,726,976
- Issue date Aug 8, 2017
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and method for producing resist pattern
- Patent number 9,671,693
- Issue date Jun 6, 2017
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and method for producing resist pattern
- Patent number 9,429,841
- Issue date Aug 30, 2016
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Salt, acid generator and resist composition
- Patent number 9,405,187
- Issue date Aug 2, 2016
- Sumitomo Chemical Company, Limited
- Takashi Hiraoka
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Chemically amplified photoresist composition and method for forming...
- Patent number 8,916,330
- Issue date Dec 23, 2014
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Chemically amplified photoresist composition and method for forming...
- Patent number 8,883,394
- Issue date Nov 11, 2014
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and method for producing resist pattern
- Patent number 8,709,699
- Issue date Apr 29, 2014
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and method for producing resist pattern
- Patent number 8,663,899
- Issue date Mar 4, 2014
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and method for producing resist pattern
- Patent number 8,652,754
- Issue date Feb 18, 2014
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Salt and photoresist composition comprising the same
- Patent number 8,431,326
- Issue date Apr 30, 2013
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Imide compound and chemically amplified resist composition containi...
- Patent number 8,329,377
- Issue date Dec 11, 2012
- Sumitomo Chemical Company, Limited
- Ichiki Takemoto
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Oxime compound and resist composition containing the same
- Patent number 8,173,350
- Issue date May 8, 2012
- Sumitomo Chemical Company, Limited
- Tatsuro Masuyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Chemically amplified positive resist composition
- Patent number 7,998,656
- Issue date Aug 16, 2011
- Sumitomo Chemical Company, Limited
- Masahiko Shimada
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Memory card installer
- Patent number 6,808,424
- Issue date Oct 26, 2004
- Matsushita Electric Industrial Co., Ltd.
- Tetsuya Kaneshiro
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20130022916
- Publication date Jan 24, 2013
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20130022923
- Publication date Jan 24, 2013
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20130022925
- Publication date Jan 24, 2013
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20130022918
- Publication date Jan 24, 2013
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20120156620
- Publication date Jun 21, 2012
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME
- Publication number 20120088190
- Publication date Apr 12, 2012
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SALT, ACID GENERATOR AND RESIST COMPOSITION
- Publication number 20110318688
- Publication date Dec 29, 2011
- Takashi HIRAOKA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PHOTORESIST COMPOSITION
- Publication number 20110091808
- Publication date Apr 21, 2011
- Sumitomo Chemical Company, Limited
- Tatsuro MASUYAMA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST PROCESSING METHOD
- Publication number 20110091820
- Publication date Apr 21, 2011
- Mitsuhiro Hata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITION
- Publication number 20110065041
- Publication date Mar 17, 2011
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED PHOTORESIST COMPOSITION AND METHOD FOR FORMING...
- Publication number 20100330497
- Publication date Dec 30, 2010
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION
- Publication number 20100035180
- Publication date Feb 11, 2010
- Sumitomo Chemical Company, Limited
- Masahiko Shimada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Imide Compound and Chemically Amplified Resist Composition Containi...
- Publication number 20100028807
- Publication date Feb 4, 2010
- Sumitomo Chemical Company, Ltd.
- Ichiki TAKEMOTO
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Oxime Compound and Resist Composition Containing the Same
- Publication number 20100021847
- Publication date Jan 28, 2010
- Sumitomo Chemical Company, Ltd.
- Tatsuro MASUYAMA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Memory card installer
- Publication number 20030109179
- Publication date Jun 12, 2003
- Tetsuya Kaneshiro
- G06 - COMPUTING CALCULATING COUNTING

Takashi Hiraoka

Person

Patents Grantslast 30 patents

Photoresist composition

Resist composition and method for producing resist pattern

Resist composition and method for producing resist pattern

Salt, acid generator and resist composition

Chemically amplified photoresist composition and method for forming...

Chemically amplified photoresist composition and method for forming...

Resist composition and method for producing resist pattern

Resist composition and method for producing resist pattern

Resist composition and method for producing resist pattern

Salt and photoresist composition comprising the same

Imide compound and chemically amplified resist composition containi...

Oxime compound and resist composition containing the same

Chemically amplified positive resist composition

Memory card installer

Patents Applicationslast 30 patents

RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME

SALT, ACID GENERATOR AND RESIST COMPOSITION

PHOTORESIST COMPOSITION

RESIST PROCESSING METHOD

PHOTORESIST COMPOSITION

CHEMICALLY AMPLIFIED PHOTORESIST COMPOSITION AND METHOD FOR FORMING...

CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION

Imide Compound and Chemically Amplified Resist Composition Containi...

Oxime Compound and Resist Composition Containing the Same

Memory card installer