Takashi Kamikubo

Person

Kawasaki, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Charged-particle beam writing apparatus and charged-particle beam w...
- Patent number 10,699,877
- Issue date Jun 30, 2020
- NuFlare Technology, Inc.
- Haruyuki Nomura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of producing aperture member
- Patent number 9,343,323
- Issue date May 17, 2016
- NuFlare Technology, Inc.
- Takashi Kamikubo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi charged particle beam writing method, and multi charged parti...
- Patent number 9,159,535
- Issue date Oct 13, 2015
- NuFlare Technology, Inc.
- Takashi Kamikubo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam writing apparatus and charged particle beam w...
- Patent number 8,859,997
- Issue date Oct 14, 2014
- Nuflare Technology, Inc.
- Takashi Kamikubo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Drift correction method and pattern writing data generation method
- Patent number 8,835,881
- Issue date Sep 16, 2014
- Nuflare Technology, Inc.
- Takashi Kamikubo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask blank and method of manufacturing mask
- Patent number 8,367,276
- Issue date Feb 5, 2013
- Hoya Corporation
- Yasushi Okubo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Charged particle beam writing apparatus, write data creation method...
- Patent number 8,301,291
- Issue date Oct 30, 2012
- Nuflare Technology, Inc.
- Takashi Kamikubo
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle beam drawing apparatus and proximity effect correc...
- Patent number 8,207,514
- Issue date Jun 26, 2012
- Nuflare Technology, Inc.
- Shigehiro Hara
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Correcting substrate for charged particle beam lithography apparatus
- Patent number 8,183,544
- Issue date May 22, 2012
- Nuflare Technology, Inc.
- Kaoru Tsuruta
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged-particle beam writing method
- Patent number 7,705,322
- Issue date Apr 27, 2010
- Nuflare Technology, Inc.
- Rieko Nishimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of calculating deflection aberration correcting voltage and...
- Patent number 7,679,068
- Issue date Mar 16, 2010
- Nuflare Technology, Inc.
- Takashi Kamikubo
- G01 - MEASURING TESTING
Information Patent Grant
Writing method of charged particle beam, support apparatus of charg...
- Patent number 7,495,243
- Issue date Feb 24, 2009
- Nuflare Technology, Inc.
- Takashi Kamikubo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern writing method
- Patent number 6,346,354
- Issue date Feb 12, 2002
- Kabushiki Kaisha Toshiba
- Takayuki Abe
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged beam lithography system
- Patent number 6,313,476
- Issue date Nov 6, 2001
- Kabushiki Kaisha Toshiba
- Mitsuko Shimizu
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle beam writing method for determining optimal exposu...
- Patent number 5,863,682
- Issue date Jan 26, 1999
- Kabushiki Kaisha Toshiba
- Takayuki Abe
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
CHARGED-PARTICLE BEAM WRITING APPARATUS AND CHARGED-PARTICLE BEAM W...
- Publication number 20190355553
- Publication date Nov 21, 2019
- NuFlare Technology, Inc.
- Haruyuki NOMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PRODUCING APERTURE MEMBER
- Publication number 20160056046
- Publication date Feb 25, 2016
- NuFlare Technology, Inc.
- Takashi KAMIKUBO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI CHARGED PARTICLE BEAM WRITING METHOD, AND MULTI CHARGED PARTI...
- Publication number 20150041672
- Publication date Feb 12, 2015
- NuFlare Technology, Inc.
- Takashi KAMIKUBO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRIFT CORRECTION METHOD AND PATTERN WRITING DATA GENERATION METHOD
- Publication number 20130334442
- Publication date Dec 19, 2013
- Takashi KAMIKUBO
- B82 - NANO-TECHNOLOGY
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...
- Publication number 20120211676
- Publication date Aug 23, 2012
- NuFlare Technology, Inc.
- Takashi KAMIKUBO
- B82 - NANO-TECHNOLOGY
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS, WRITE DATA CREATION METHOD...
- Publication number 20110286319
- Publication date Nov 24, 2011
- NuFlare Technology, Inc.
- Takashi KAMIKUBO
- B82 - NANO-TECHNOLOGY
Information Patent Application
CHARGED PARTICLE BEAM DRAWING APPARATUS AND PROXIMITY EFFECT CORREC...
- Publication number 20110068281
- Publication date Mar 24, 2011
- NuFlare Technology, Inc.
- Shigehiro HARA
- B82 - NANO-TECHNOLOGY
Information Patent Application
Lithography method of electron beam
- Publication number 20100178611
- Publication date Jul 15, 2010
- NuFlare Technology, Inc.
- Hirohito Anze
- B82 - NANO-TECHNOLOGY
Information Patent Application
CORRECTING SUBSTRATE FOR CHARGED PARTICLE BEAM LITHOGRAPHY APPARATUS
- Publication number 20090242807
- Publication date Oct 1, 2009
- NuFlare Technology, Inc.
- Kaoru TSURUTA
- B82 - NANO-TECHNOLOGY
Information Patent Application
MASK BLANK AND METHOD OF MANUFACTURING MASK
- Publication number 20090075185
- Publication date Mar 19, 2009
- HOYA CORPORATION
- Yasushi OKUBO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHARGED-PARTICLE BEAM WRITING METHOD
- Publication number 20090014663
- Publication date Jan 15, 2009
- NuFlare Technology, Inc.
- Rieko NISHIMURA
- B82 - NANO-TECHNOLOGY
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS AND METHOD
- Publication number 20080265174
- Publication date Oct 30, 2008
- NuFlare Technology, Inc.
- Makoto HIRAMOTO
- B82 - NANO-TECHNOLOGY
Information Patent Application
WRITING METHOD OF CHARGED PARTICLE BEAM, SUPPORT APPARATUS OF CHARG...
- Publication number 20080073574
- Publication date Mar 27, 2008
- NuFlare Technology, Inc.
- Takashi Kamikubo
- B82 - NANO-TECHNOLOGY
Information Patent Application
FORMING METHOD OF RESIST PATTERN AND WRITING METHOD OF CHARGED PART...
- Publication number 20070243487
- Publication date Oct 18, 2007
- NuFlare Technology, Inc.
- Hirohito Anze
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF CALCULATING DEFLECTION ABERRATION CORRECTING VOLTAGE AND...
- Publication number 20070158576
- Publication date Jul 12, 2007
- NuFlare Technology, Inc.
- Takashi Kamikubo
- G01 - MEASURING TESTING

Takashi Kamikubo

Person

Patents Grantslast 30 patents

Charged-particle beam writing apparatus and charged-particle beam w...

Method of producing aperture member

Multi charged particle beam writing method, and multi charged parti...

Charged particle beam writing apparatus and charged particle beam w...

Drift correction method and pattern writing data generation method

Mask blank and method of manufacturing mask

Charged particle beam writing apparatus, write data creation method...

Charged particle beam drawing apparatus and proximity effect correc...

Correcting substrate for charged particle beam lithography apparatus

Charged-particle beam writing method

Method of calculating deflection aberration correcting voltage and...

Writing method of charged particle beam, support apparatus of charg...

Pattern writing method

Charged beam lithography system

Charged particle beam writing method for determining optimal exposu...

Patents Applicationslast 30 patents

CHARGED-PARTICLE BEAM WRITING APPARATUS AND CHARGED-PARTICLE BEAM W...

METHOD OF PRODUCING APERTURE MEMBER

MULTI CHARGED PARTICLE BEAM WRITING METHOD, AND MULTI CHARGED PARTI...

DRIFT CORRECTION METHOD AND PATTERN WRITING DATA GENERATION METHOD

CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...

CHARGED PARTICLE BEAM WRITING APPARATUS, WRITE DATA CREATION METHOD...

CHARGED PARTICLE BEAM DRAWING APPARATUS AND PROXIMITY EFFECT CORREC...

Lithography method of electron beam

CORRECTING SUBSTRATE FOR CHARGED PARTICLE BEAM LITHOGRAPHY APPARATUS

MASK BLANK AND METHOD OF MANUFACTURING MASK

CHARGED-PARTICLE BEAM WRITING METHOD

CHARGED PARTICLE BEAM WRITING APPARATUS AND METHOD

WRITING METHOD OF CHARGED PARTICLE BEAM, SUPPORT APPARATUS OF CHARG...

FORMING METHOD OF RESIST PATTERN AND WRITING METHOD OF CHARGED PART...

METHOD OF CALCULATING DEFLECTION ABERRATION CORRECTING VOLTAGE AND...