Takashi KAMO

Person

Yokohama, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Exposure mask and manufacturing method of same
- Patent number 11,249,391
- Issue date Feb 15, 2022
- Kioxia Corporation
- Takashi Kamo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask and method for manufacturing reflective mask
- Patent number 9,977,323
- Issue date May 22, 2018
- TOSHIBA MEMORY CORPORATION
- Takashi Kamo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective photomask, method for manufacturing same and program for...
- Patent number 9,841,667
- Issue date Dec 12, 2017
- TOSHIBA MEMORY CORPORATION
- Takashi Kamo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Electrostatic chuck cleaner, cleaning method, and exposure apparatus
- Patent number 9,599,909
- Issue date Mar 21, 2017
- Kabushiki Kaisha Toshiba
- Takashi Kamo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of correcting defects in a reflection-type mask and mask-def...
- Patent number 9,164,371
- Issue date Oct 20, 2015
- Kabushiki Kaisha Toshiba
- Takashi Kamo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure method and exposure mask
- Patent number 8,603,707
- Issue date Dec 10, 2013
- Kabushiki Kaisha Toshiba
- Takashi Kamo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective exposure mask, method of fabricating reflective exposure...
- Patent number 8,535,854
- Issue date Sep 17, 2013
- Kabushiki Kaisha Toshiba
- Takashi Kamo
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Reflection-type exposure mask and method of manufacturing a semicon...
- Patent number 8,173,332
- Issue date May 8, 2012
- Kabushiki Kaisha Toshiba
- Takashi Kamo
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Reflective-type mask
- Patent number 7,960,076
- Issue date Jun 14, 2011
- Kabushiki Kaisha Toshiba
- Takashi Kamo
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Exposure mask and method and apparatus for manufacturing the same
- Patent number 5,907,393
- Issue date May 25, 1999
- Kabushiki Kaisha Toshiba
- Kenji Kawano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure mask and method and apparatus for manufacturing the same
- Patent number 5,728,494
- Issue date Mar 17, 1998
- Kabushiki Kaisha Toshiba
- Kenji Kawano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure mask and method and apparatus for manufacturing the same
- Patent number 5,629,115
- Issue date May 13, 1997
- Kabushiki Kaisha Toshiba
- Kenji Kawano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
EXPOSURE MASK AND MANUFACTURING METHOD OF SAME
- Publication number 20190086792
- Publication date Mar 21, 2019
- Toshiba Memory Corporation
- Takashi KAMO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK AND METHOD FOR MANUFACTURING REFLECTIVE MASK
- Publication number 20170075209
- Publication date Mar 16, 2017
- Kabushiki Kaisha Toshiba
- Takashi KAMO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE PHOTOMASK, METHOD FOR MANUFACTURING SAME AND PROGRAM FOR...
- Publication number 20160274452
- Publication date Sep 22, 2016
- Kabushiki Kaisha Toshiba
- Takashi KAMO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ELECTROSTATIC CHUCK CLEANER, CLEANING METHOD, AND EXPOSURE APPARATUS
- Publication number 20150261104
- Publication date Sep 17, 2015
- Kabushiki Kaisha Toshiba
- TAKASHI KAMO
- B08 - CLEANING

Takashi KAMO

Person

Patents Grantslast 30 patents

Exposure mask and manufacturing method of same

Reflective mask and method for manufacturing reflective mask

Reflective photomask, method for manufacturing same and program for...

Electrostatic chuck cleaner, cleaning method, and exposure apparatus

Method of correcting defects in a reflection-type mask and mask-def...

Exposure method and exposure mask

Reflective exposure mask, method of fabricating reflective exposure...

Reflection-type exposure mask and method of manufacturing a semicon...

Reflective-type mask

Exposure mask and method and apparatus for manufacturing the same

Exposure mask and method and apparatus for manufacturing the same

Exposure mask and method and apparatus for manufacturing the same

Patents Applicationslast 30 patents

EXPOSURE MASK AND MANUFACTURING METHOD OF SAME

REFLECTIVE MASK AND METHOD FOR MANUFACTURING REFLECTIVE MASK

REFLECTIVE PHOTOMASK, METHOD FOR MANUFACTURING SAME AND PROGRAM FOR...

ELECTROSTATIC CHUCK CLEANER, CLEANING METHOD, AND EXPOSURE APPARATUS