Takashi Kitazawa

Person

Nirasaki, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Processing method and processing apparatus
- Patent number 10,676,823
- Issue date Jun 9, 2020
- Tokyo Electron Limited
- Ryota Sakane
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Supporting member and substrate processing apparatus
- Patent number 10,553,408
- Issue date Feb 4, 2020
- Tokyo Electron Limited
- Akihiro Yoshimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 10,249,478
- Issue date Apr 2, 2019
- Tokyo Electron Limited
- Nobutaka Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 8,858,754
- Issue date Oct 14, 2014
- Tokyo Electron Limited
- Masato Horiguchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate mounting table of substrate processing apparatus
- Patent number 8,687,343
- Issue date Apr 1, 2014
- Tokyo Electron Limited
- Tetsuji Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of setting thickness of dielectric and substrate processing...
- Patent number 8,426,318
- Issue date Apr 23, 2013
- Tokyo Electron Limited
- Jun Oyabu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum apparatus
- Patent number 7,472,581
- Issue date Jan 6, 2009
- Tokyo Electron Limited
- Takashi Kitazawa
- G01 - MEASURING TESTING
Information Patent Grant
Relative pressure control system and relative flow control system
- Patent number 7,353,841
- Issue date Apr 8, 2008
- CKD Corporation
- Tetsujiro Kono
- G05 - CONTROLLING REGULATING
Information Patent Grant
Vacuum processing apparatus and substrate transfer method
- Patent number 7,201,851
- Issue date Apr 10, 2007
- Tokyo Electron Limited
- Toshihiko Kitoku
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum processing apparatus and substrate transfer method
- Patent number 6,990,747
- Issue date Jan 31, 2006
- Tokyo Electron Limited
- Toshihiko Kitoku
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum processing apparatus and control method thereof
- Patent number 6,896,764
- Issue date May 24, 2005
- Tokyo Electron Limited
- Takashi Kitazawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Exhaust ring for manufacturing semiconductors
- Patent number D494552
- Issue date Aug 17, 2004
- Tokyo Electron Limited
- Kazuyuki Tezuka
- D13 - Equipment for production, distribution, or transformation of energy

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20230317422
- Publication date Oct 5, 2023
- TOKYO ELECTRON LIMITED
- Norinao TAKASU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
UPPER ELECTRODE AND PLASMA PROCESSING APPARATUS
- Publication number 20230298864
- Publication date Sep 21, 2023
- TOKYO ELECTRON LIMITED
- Shinya YAMANAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HEAT MEDIUM CIRCULATION SYSTEM AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20210074519
- Publication date Mar 11, 2021
- TOKYO ELECTRON LIMITED
- Masaru ISAGO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING METHOD AND PROCESSING APPARATUS
- Publication number 20180148838
- Publication date May 31, 2018
- TOKYO ELECTRON LIMITED
- Ryota Sakane
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20150179415
- Publication date Jun 25, 2015
- TOKYO ELECTRON LIMITED
- Nobutaka SASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUPPORTING MEMBER AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20150013938
- Publication date Jan 15, 2015
- TOKYO ELECTRON LIMITED
- Akihiro YOSHIMURA
- F28 - HEAT EXCHANGE IN GENERAL
Information Patent Application
METHOD OF SETTING THICKNESS OF DIELECTRIC AND SUBSTRATE PROCESSING...
- Publication number 20110318935
- Publication date Dec 29, 2011
- TOKYO ELECTRON LIMITED
- Jun OYABU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20110290419
- Publication date Dec 1, 2011
- TOKYO ELECTRON LIMITED
- Masato Horiguchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE MOUNTING TABLE OF SUBSTRATE PROCESSING APPARATUS
- Publication number 20110116207
- Publication date May 19, 2011
- TOKYO ELECTRON LIMITED
- Tetsuji SATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Vacuum apparatus, method for measuring a leak rate thereof, program...
- Publication number 20060207314
- Publication date Sep 21, 2006
- TOKYO ELECTRON LIMITED
- Takashi Kitazawa
- G01 - MEASURING TESTING
Information Patent Application
Relative pressure control system and relative flow control system
- Publication number 20060097644
- Publication date May 11, 2006
- CKD CORPORATION
- Tetsujiro Kono
- G05 - CONTROLLING REGULATING
Information Patent Application
Vacuum processing apparatus and substrate transfer method
- Publication number 20060032074
- Publication date Feb 16, 2006
- TOKYO ELECTRON LIMITED
- Toshihiko Kitoku
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Vacuum processing apparatus and control method therefor
- Publication number 20050167049
- Publication date Aug 4, 2005
- TOKYO ELECTRON LIMITED
- Takashi Kitazawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Vacuum processing apparatus and control method therefor
- Publication number 20050167398
- Publication date Aug 4, 2005
- TOKYO ELECTRON LIMITED
- Takashi Kitazawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Vacuum processing apparatus and substrate transfer method
- Publication number 20040255485
- Publication date Dec 23, 2004
- TOKYO ELECTRON LIMITED
- Toshihiko Kitoku
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Exhaust ring mechanism and plasma processing apparatus using the same
- Publication number 20040129218
- Publication date Jul 8, 2004
- Toshiki Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Vacuum processing apparatus and control method therefor
- Publication number 20030097985
- Publication date May 29, 2003
- TOKYO ELECTRON LIMITED
- Takashi Kitazawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Takashi Kitazawa

Person

Patents Grantslast 30 patents

Processing method and processing apparatus

Supporting member and substrate processing apparatus

Substrate processing apparatus

Plasma processing apparatus

Substrate mounting table of substrate processing apparatus

Method of setting thickness of dielectric and substrate processing...

Vacuum apparatus

Relative pressure control system and relative flow control system

Vacuum processing apparatus and substrate transfer method

Vacuum processing apparatus and substrate transfer method

Vacuum processing apparatus and control method thereof

Exhaust ring for manufacturing semiconductors

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING APPARATUS

UPPER ELECTRODE AND PLASMA PROCESSING APPARATUS

HEAT MEDIUM CIRCULATION SYSTEM AND SUBSTRATE PROCESSING APPARATUS

PROCESSING METHOD AND PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS

SUPPORTING MEMBER AND SUBSTRATE PROCESSING APPARATUS

METHOD OF SETTING THICKNESS OF DIELECTRIC AND SUBSTRATE PROCESSING...

PLASMA PROCESSING APPARATUS

SUBSTRATE MOUNTING TABLE OF SUBSTRATE PROCESSING APPARATUS

Vacuum apparatus, method for measuring a leak rate thereof, program...

Relative pressure control system and relative flow control system

Vacuum processing apparatus and substrate transfer method

Vacuum processing apparatus and control method therefor

Vacuum processing apparatus and control method therefor

Vacuum processing apparatus and substrate transfer method

Exhaust ring mechanism and plasma processing apparatus using the same

Vacuum processing apparatus and control method therefor