Takashi Kobayashi

Person

Hyogo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method, device, and system for etching silicon oxide film
- Patent number 11,626,290
- Issue date Apr 11, 2023
- Tokyo Electron Limited
- Osamu Yokoyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and recording medium
- Patent number 10,242,878
- Issue date Mar 26, 2019
- Tokyo Electron Limited
- Tomonari Urano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Oxide film removing method, oxide film removing apparatus, contact...
- Patent number 9,984,892
- Issue date May 29, 2018
- Tokyo Electron Limited
- Takashi Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma oxidation processing method, plasma processing apparatus and...
- Patent number 8,372,761
- Issue date Feb 12, 2013
- Tokyo Electron Limited
- Yoshiro Kabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma oxidizing method, storage medium, and plasma processing appa...
- Patent number 8,043,979
- Issue date Oct 25, 2011
- Tokyo Electron Limited
- Takashi Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning method and plasma processing method
- Patent number 8,034,183
- Issue date Oct 11, 2011
- Tokyo Electron Limited
- Shingo Furui
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method for forming silicon oxide film, plasma processing apparatus...
- Patent number 8,003,484
- Issue date Aug 23, 2011
- Tokyo Electron Limited
- Yoshiro Kabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming silicon oxide film, plasma processing apparatus...
- Patent number 7,972,973
- Issue date Jul 5, 2011
- Tokyo Electron Limited
- Takashi Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Manufacturing method of fin-type field effect transistor
- Patent number 7,955,922
- Issue date Jun 7, 2011
- Tokyo Electron Limited
- Hajime Nakabayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device manufacturing method, semiconductor device, pl...
- Patent number 7,910,493
- Issue date Mar 22, 2011
- Tokyo Electron Limited
- Junichi Kitagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma oxidizing method, plasma processing apparatus, and storage m...
- Patent number 7,910,495
- Issue date Mar 22, 2011
- Tokyo Electron Limited
- Toshihiko Shiozawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method
- Patent number 7,875,322
- Issue date Jan 25, 2011
- Tokyo Electron Limited
- Takashi Kobayashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 6,620,739
- Issue date Sep 16, 2003
- Tokyo Electron Limited
- Hikaru Yoshitaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Monoclonal antibody, process for preparing same, reagent for detect...
- Patent number 4,959,320
- Issue date Sep 25, 1990
- Green Cross Corporation
- Yahiro Uemura
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE

Patents Applicationslast 30 patents

Information Patent Application
FILM FORMING APPARATUS AND FILM FORMING METHOD
- Publication number 20240337022
- Publication date Oct 10, 2024
- TOKYO ELECTRON LIMITED
- Kensaku NARUSHIMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING METHOD AND FILM FORMING SYSTEM
- Publication number 20230131213
- Publication date Apr 27, 2023
- TOKYO ELECTRON LIMITED
- Isao GUNJI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD, DEVICE, AND SYSTEM FOR ETCHING SILICON OXIDE FILM
- Publication number 20220051901
- Publication date Feb 17, 2022
- TOKYO ELECTRON LIMITED
- Osamu YOKOYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OXIDE FILM REMOVING METHOD, OXIDE FILM REMOVING APPARATUS, CONTACT...
- Publication number 20180261464
- Publication date Sep 13, 2018
- TOKYO ELECTRON LIMITED
- Takashi Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OXIDE FILM REMOVING METHOD, OXIDE FILM REMOVING APPARATUS, CONTACT...
- Publication number 20170338120
- Publication date Nov 23, 2017
- TOKYO ELECTRON LIMITED
- Takashi Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND RECORDING MEDIUM
- Publication number 20170250086
- Publication date Aug 31, 2017
- Tomonari URANO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20120252226
- Publication date Oct 4, 2012
- TOKYO ELECTRON LIMITED
- Yoshiro KABE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR MODIFYING INSULATING FILM WITH PLASMA
- Publication number 20110053381
- Publication date Mar 3, 2011
- TOKYO ELECTRON LIMITED
- Takashi KOBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MICROWAVE PLASMA PROCESSING APPARATUS, MICROWAVE PLASMA PROCESSING...
- Publication number 20100240225
- Publication date Sep 23, 2010
- TOKYO ELECTRON LIMITED
- Yoshihiro Sato
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
PLASMA OXIDATION PROCESSING METHOD, PLASMA PROCESSING APPARATUS AND...
- Publication number 20100136797
- Publication date Jun 3, 2010
- Yoshiro Kabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA OXIDIZING METHOD, STORAGE MEDIUM, AND PLASMA PROCESSING APPA...
- Publication number 20100105216
- Publication date Apr 29, 2010
- TOKYO ELECTRON LIMITED
- Takashi Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING SILICON OXIDE FILM, PLASMA PROCESSING APPARATUS...
- Publication number 20100093185
- Publication date Apr 15, 2010
- TOKYO ELECTRON LIMITED
- Yoshiro Kabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING SILICON OXIDE FILM, PLASMA PROCESSING APPARATUS...
- Publication number 20100093186
- Publication date Apr 15, 2010
- TOKYO ELECTRON LIMITED
- Takashi Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA OXIDIZING METHOD, PLASMA PROCESSING APPARATUS, AND STORAGE M...
- Publication number 20100029093
- Publication date Feb 4, 2010
- TOKYO ELECTRON LIMITED
- Toshihiko Shiozawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA OXIDIZING METHOD, PLASMA PROCESSING APPARATUS, AND STORAGE M...
- Publication number 20100015815
- Publication date Jan 21, 2010
- Tokyo Electron Limited
- Toshihiko Shiozawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILICON OXIDE FILM FORMING METHOD, SEMICONDUCTOR DEVICE MANUFACTURI...
- Publication number 20090053903
- Publication date Feb 26, 2009
- Tokyo Electron Limited
- Takashi Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE MANUFACTURING METHOD, SEMICONDUCTOR DEVICE, PL...
- Publication number 20090039406
- Publication date Feb 12, 2009
- Tokyo Electron Limited
- Junichi Kitagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing method
- Publication number 20090035484
- Publication date Feb 5, 2009
- TOKYO ELECTRON LIMITED
- Takashi Kobayashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Cleaning Method and Plasma Processing Method
- Publication number 20080317975
- Publication date Dec 25, 2008
- Shingo Furui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MANUFACTURING METHOD OF FIN-TYPE FIELD EFFECT TRANSISTOR
- Publication number 20080171407
- Publication date Jul 17, 2008
- TOKYO ELECTRON LIMITED
- Hajime Nakabayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Nitriding Tunnel Oxide Film, Method for Manufacturing No...
- Publication number 20080093658
- Publication date Apr 24, 2008
- TOKYO ELECTRON LIMITED
- Toshihiko Shiozawa
- H01 - BASIC ELECTRIC ELEMENTS

Takashi Kobayashi

Person

Patents Grantslast 30 patents

Method, device, and system for etching silicon oxide film

Substrate processing method and recording medium

Oxide film removing method, oxide film removing apparatus, contact...

Plasma oxidation processing method, plasma processing apparatus and...

Plasma oxidizing method, storage medium, and plasma processing appa...

Cleaning method and plasma processing method

Method for forming silicon oxide film, plasma processing apparatus...

Method for forming silicon oxide film, plasma processing apparatus...

Manufacturing method of fin-type field effect transistor

Semiconductor device manufacturing method, semiconductor device, pl...

Plasma oxidizing method, plasma processing apparatus, and storage m...

Plasma processing method

Method of manufacturing semiconductor device

Monoclonal antibody, process for preparing same, reagent for detect...

Patents Applicationslast 30 patents

FILM FORMING APPARATUS AND FILM FORMING METHOD

FILM FORMING METHOD AND FILM FORMING SYSTEM

METHOD, DEVICE, AND SYSTEM FOR ETCHING SILICON OXIDE FILM

OXIDE FILM REMOVING METHOD, OXIDE FILM REMOVING APPARATUS, CONTACT...

OXIDE FILM REMOVING METHOD, OXIDE FILM REMOVING APPARATUS, CONTACT...

SUBSTRATE PROCESSING METHOD AND RECORDING MEDIUM

PLASMA PROCESSING METHOD

METHOD FOR MODIFYING INSULATING FILM WITH PLASMA

MICROWAVE PLASMA PROCESSING APPARATUS, MICROWAVE PLASMA PROCESSING...

PLASMA OXIDATION PROCESSING METHOD, PLASMA PROCESSING APPARATUS AND...

PLASMA OXIDIZING METHOD, STORAGE MEDIUM, AND PLASMA PROCESSING APPA...

METHOD FOR FORMING SILICON OXIDE FILM, PLASMA PROCESSING APPARATUS...

METHOD FOR FORMING SILICON OXIDE FILM, PLASMA PROCESSING APPARATUS...

PLASMA OXIDIZING METHOD, PLASMA PROCESSING APPARATUS, AND STORAGE M...

PLASMA OXIDIZING METHOD, PLASMA PROCESSING APPARATUS, AND STORAGE M...

SILICON OXIDE FILM FORMING METHOD, SEMICONDUCTOR DEVICE MANUFACTURI...

SEMICONDUCTOR DEVICE MANUFACTURING METHOD, SEMICONDUCTOR DEVICE, PL...

Plasma processing method

Cleaning Method and Plasma Processing Method

MANUFACTURING METHOD OF FIN-TYPE FIELD EFFECT TRANSISTOR

Method for Nitriding Tunnel Oxide Film, Method for Manufacturing No...