Takashi Kumaki

Person

Hitachi-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Photosensitive element, method for formation of resist pattern, and...
- Patent number 8,501,392
- Issue date Aug 6, 2013
- Hitachi Chemical Company, Ltd.
- Manabu Saitou
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive resin composition, photosensitive element, method fo...
- Patent number 8,198,008
- Issue date Jun 12, 2012
- Hitachi Chemical Company, Ltd.
- Masahiro Miyasaka
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photosensitive resin composition, photosensitive element, method fo...
- Patent number 8,192,916
- Issue date Jun 5, 2012
- Hitachi Chemical Company, Ltd.
- Masahiro Miyasaka
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photosensitive resin composition, and, photosensitive element, meth...
- Patent number 8,105,759
- Issue date Jan 31, 2012
- Hitachi Chemical Company, Ltd.
- Masahiro Miyasaka
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photosensitive resin composition, photosensitive element, method fo...
- Patent number 7,993,809
- Issue date Aug 9, 2011
- Hitachi Chemical Company, Ltd.
- Masahiro Miyasaka
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photosensitive element, resist pattern formation method and printed...
- Patent number 7,622,243
- Issue date Nov 24, 2009
- Hitachi Chemical Company, Ltd.
- Takashi Kumaki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Sulfur-containing phenolic resin, process for preparing the same, p...
- Patent number 7,504,471
- Issue date Mar 17, 2009
- Hitachi Chemical Co., Ltd.
- Haruaki Sue
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Disulfide-containing phenolic resin as curing agent for epoxy resin
- Patent number 7,491,789
- Issue date Feb 17, 2009
- Hitachi Chemical Company, Ltd.
- Haruaki Sue
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FO...
- Publication number 20100285408
- Publication date Nov 11, 2010
- Masahiro MIYASAKA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FO...
- Publication number 20100279229
- Publication date Nov 4, 2010
- Masahiro MIYASAKA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN...
- Publication number 20100233627
- Publication date Sep 16, 2010
- HITACHI CHEMICAL CO., Ltd.
- Takashi Kumaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE ELEMENT, METHOD FOR FORMATION OF RESIST PATTERN, AND...
- Publication number 20090297982
- Publication date Dec 3, 2009
- Manabu Saitou
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, AND, PHOTOSENSITIVE ELEMENT, METH...
- Publication number 20090202944
- Publication date Aug 13, 2009
- Hitachi Chemical Company, Ltd.
- Masahiro Miyasaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photosensitive Resin Composition, Photosensitive Element, Method fo...
- Publication number 20090029289
- Publication date Jan 29, 2009
- Masahiro Miyasaka
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
NOVEL SULFUR-CONTAINING PHENOLIC RESIN, PROCESS FOR PREPARING THE S...
- Publication number 20080051550
- Publication date Feb 28, 2008
- Hitachi Chemical Company, Ltd.
- Haruaki SUE
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Photosensitive element, resist pattern formation method and printed...
- Publication number 20070105036
- Publication date May 10, 2007
- Takashi Kumaki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Novel sulfurized phenolic resin, process for producing the same, ph...
- Publication number 20050222369
- Publication date Oct 6, 2005
- Hitachi Chemical Co., Ltd.
- Haruaki Sue
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Takashi Kumaki

Person

Patents Grantslast 30 patents

Photosensitive element, method for formation of resist pattern, and...

Photosensitive resin composition, photosensitive element, method fo...

Photosensitive resin composition, photosensitive element, method fo...

Photosensitive resin composition, and, photosensitive element, meth...

Photosensitive resin composition, photosensitive element, method fo...

Photosensitive element, resist pattern formation method and printed...

Sulfur-containing phenolic resin, process for preparing the same, p...

Disulfide-containing phenolic resin as curing agent for epoxy resin

Patents Applicationslast 30 patents

PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FO...

PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FO...

PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN...

PHOTOSENSITIVE ELEMENT, METHOD FOR FORMATION OF RESIST PATTERN, AND...

PHOTOSENSITIVE RESIN COMPOSITION, AND, PHOTOSENSITIVE ELEMENT, METH...

Photosensitive Resin Composition, Photosensitive Element, Method fo...

NOVEL SULFUR-CONTAINING PHENOLIC RESIN, PROCESS FOR PREPARING THE S...

Photosensitive element, resist pattern formation method and printed...

Novel sulfurized phenolic resin, process for producing the same, ph...