Takashi MAKINOSHIMA

Person

Kanagawa, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Compound, resin, composition, resist pattern formation method, circ...
- Patent number 12,134,596
- Issue date Nov 5, 2024
- Mitsubishi Gas Chemical Company, Inc.
- Takashi Makinoshima
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Compound, resin, composition, resist pattern formation method, circ...
- Patent number 11,747,728
- Issue date Sep 5, 2023
- Mitsubishi Gas Chemical Company, Inc.
- Junya Horiuchi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Compound, resin, resist composition or radiation-sensitive composit...
- Patent number 11,572,430
- Issue date Feb 7, 2023
- Mitsubishi Gas Chemical Company, Inc.
- Takumi Toida
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Compound, resin, resist composition or radiation-sensitive composit...
- Patent number 11,243,467
- Issue date Feb 8, 2022
- Mitsubishi Gas Chemical Company, Inc.
- Takumi Toida
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Material for forming underlayer film for lithography, composition f...
- Patent number 11,143,962
- Issue date Oct 12, 2021
- Mitsubishi Gas Chemical Company, Inc.
- Takumi Toida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Material for forming underlayer film for lithography, composition f...
- Patent number 11,137,686
- Issue date Oct 5, 2021
- Mitsubishi Gas Chemical Company, Inc.
- Takumi Toida
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Compound, resin, resist composition or radiation-sensitive composit...
- Patent number 10,816,898
- Issue date Oct 27, 2020
- Mitsubishi Gas Chemical Company, Inc.
- Takumi Toida
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compound, resin, and purification method thereof, material for form...
- Patent number 10,747,112
- Issue date Aug 18, 2020
- Mitsubishi Gas Chemical Company, Inc.
- Takumi Toida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Compound, resin, material for forming underlayer film for lithograp...
- Patent number 10,745,372
- Issue date Aug 18, 2020
- Mitsubishi Gas Chemical Company, Inc.
- Takumi Toida
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Compound, resin, material for forming underlayer film for lithograp...
- Patent number 10,577,323
- Issue date Mar 3, 2020
- Mitsubishi Gas Chemical Company, Inc.
- Kana Okada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Compound, resin, material for forming underlayer film for lithograp...
- Patent number 10,494,358
- Issue date Dec 3, 2019
- Mitsubishi Gas Chemical Company, Inc.
- Takumi Toida
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Compound, resin, material for forming underlayer film for lithograp...
- Patent number 10,364,314
- Issue date Jul 30, 2019
- Mitsubishi Gas Chemical Company, Inc.
- Kana Okada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Material for forming underlayer film for lithography, composition f...
- Patent number 10,359,701
- Issue date Jul 23, 2019
- Mitsubishi Gas Chemical Company, Inc.
- Kana Okada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composition for forming underlayer film for lithography, underlayer...
- Patent number 10,338,471
- Issue date Jul 2, 2019
- Mitsubishi Gas Chemical Company, Inc.
- Kana Okada
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Material for forming film for lithography, composition for forming...
- Patent number 10,310,377
- Issue date Jun 4, 2019
- Mitsubishi Gas Chemical Company, Inc.
- Takashi Makinoshima
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Compound, resin, material for forming underlayer film for lithograp...
- Patent number 10,294,183
- Issue date May 21, 2019
- Mitsubishi Gas Chemical Company, Inc.
- Takashi Makinoshima
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method for purifying compound or resin
- Patent number 9,920,024
- Issue date Mar 20, 2018
- Mitsubishi Gas Chemical Company, Inc.
- Masatoshi Echigo
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Compound, material for forming underlayer film for lithography, und...
- Patent number 9,828,355
- Issue date Nov 28, 2017
- Mitsubishi Gas Chemical Company, Inc.
- Masatoshi Echigo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compound, material for forming underlayer film for lithography, und...
- Patent number 9,809,601
- Issue date Nov 7, 2017
- Mitsubishi Gas Chemical Company, Inc.
- Masatoshi Echigo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for producing polyimide film
- Patent number 7,871,554
- Issue date Jan 18, 2011
- Mitsubishi Gas Chemical Company, Inc.
- Jitsuo Oishi
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Low water-absorptive polyimide resin and method for producing same
- Patent number 7,659,360
- Issue date Feb 9, 2010
- Mitsubishi Gas Chemical Company, Inc.
- Takashi Makinoshima
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
CARBON DIOXIDE ABSORBENT, METHOD FOR RECOVERING CARBON DIOXIDE, AND...
- Publication number 20240367098
- Publication date Nov 7, 2024
- Mitsubishi Gas Chemical Company, Inc.
- Kazuki KOUNO
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
COMPOSITION FOR FILM FORMATION, RESIST COMPOSITION, RADIATION-SENSI...
- Publication number 20240117101
- Publication date Apr 11, 2024
- Mitsubishi Gas Chemical Company, Inc.
- Hiroaki YAMAMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD, CIRCUIT PATTER...
- Publication number 20240109997
- Publication date Apr 4, 2024
- Mitsubishi Gas Chemical Company, Inc.
- Junya HORIUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMING COMPOSITION FOR LITHOGRAPHY, RESIST PATTERN FORMATION...
- Publication number 20230333469
- Publication date Oct 19, 2023
- Mitsubishi Gas Chemical Company, Inc.
- Takashi SATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
UNDERLAYER FILM FORMING COMPOSITION FOR LITHOGRAPHY, UNDERLAYER FIL...
- Publication number 20230324801
- Publication date Oct 12, 2023
- Mitsubishi Gas Chemical Company, Inc.
- Hiroaki YAMAMOTO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLYCYCLIC POLYPHENOLIC RESIN, COMPOSITION, METHOD FOR PRODUCING PO...
- Publication number 20230314942
- Publication date Oct 5, 2023
- Mitsubishi Gas Chemical Company, Inc.
- Kodai MATSUURA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLYMER, COMPOSITION, METHOD FOR PRODUCING POLYMER, COMPOSITION, CO...
- Publication number 20230296982
- Publication date Sep 21, 2023
- Mitsubishi Gas Chemical Company, Inc.
- Junya HORIUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOUND, POLYMER, COMPOSITION, COMPOSITION FOR FILM FORMATION, PAT...
- Publication number 20220348698
- Publication date Nov 3, 2022
- Mitsubishi Gas Chemical Company, Inc.
- Tadashi OMATSU
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
UNDERLAYER FILM FORMING COMPOSITION FOR LITHOGRAPHY, UNDERLAYER FIL...
- Publication number 20220260910
- Publication date Aug 18, 2022
- Mitsubishi Gas Chemical Company, Inc.
- Hiroaki YAMAMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FILM FORMATI...
- Publication number 20220155682
- Publication date May 19, 2022
- Mitsubishi Gas Chemical Company, Inc.
- Junya HORIUCHI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD, CIRC...
- Publication number 20220144738
- Publication date May 12, 2022
- Mitsubishi Gas Chemical Company, Inc.
- Takashi MAKINOSHIMA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLYCYCLIC POLYPHENOLIC RESIN AND METHOD FOR PRODUCING POLYCYCLIC P...
- Publication number 20220089810
- Publication date Mar 24, 2022
- Mitsubishi Gas Chemical Company, Inc.
- Tadashi OMATSU
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOSITION FOR FILM FORMATION, RESIST COMPOSITION, RADIATION-SENSI...
- Publication number 20220089811
- Publication date Mar 24, 2022
- Mitsubishi Gas Chemical Company, Inc.
- Tadashi OMATSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD, CIRC...
- Publication number 20220064137
- Publication date Mar 3, 2022
- Mitsubishi Gas Chemical Company, Inc.
- Takashi SATO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FILM FORMATI...
- Publication number 20220019146
- Publication date Jan 20, 2022
- Mitsubishi Gas Chemical Company, Inc.
- Masahiro YAMANE
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FILM FORMATI...
- Publication number 20220010072
- Publication date Jan 13, 2022
- Mitsubishi Gas Chemical Company, Inc.
- Kouichi YAMADA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FILM FORMATI...
- Publication number 20210405529
- Publication date Dec 30, 2021
- Mitsubishi Gas Chemical Company, Inc.
- Junya HORIUCHI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOUND, COMPOSITION CONTAINING THE SAME, METHOD FOR FORMING RESIS...
- Publication number 20210331994
- Publication date Oct 28, 2021
- Mitsubishi Gas Chemical Company, Inc.
- Takashi SATO
- C07 - ORGANIC CHEMISTRY
Information Patent Application
COMPOSITION FOR FORMING OPTICAL COMPONENT, OPTICAL COMPONENT, COMPO...
- Publication number 20210309595
- Publication date Oct 7, 2021
- Mitsubishi Gas Chemical Company, Inc.
- Yu OKADA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
UNDERLAYER FILM FORMING COMPOSITION
- Publication number 20210294214
- Publication date Sep 23, 2021
- Mitsubishi Gas Chemical Company, Inc.
- Yu OKADA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FILM FORMATI...
- Publication number 20210278767
- Publication date Sep 9, 2021
- Mitsubishi Gas Chemical Company, Inc.
- Masayoshi UENO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOUND, COMPOSITION CONTAINING THE SAME, METHOD FOR FORMING RESIS...
- Publication number 20210206901
- Publication date Jul 8, 2021
- Mitsubishi Gas Chemical Company, Inc.
- Takashi SATO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FILM FORMATI...
- Publication number 20210165327
- Publication date Jun 3, 2021
- Mitsubishi Gas Chemical Company, Inc.
- Junya HORIUCHI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, UNDERLAYER FILM F...
- Publication number 20210116813
- Publication date Apr 22, 2021
- Mitsubishi Gas Chemical Company, Inc.
- Takashi SATO
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD, CIRC...
- Publication number 20210109448
- Publication date Apr 15, 2021
- Mitsubishi Gas Chemical Company, Inc.
- Junya HORIUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOUND, RESIN, COMPOSITION AND PATTERN FORMATION METHOD
- Publication number 20210047457
- Publication date Feb 18, 2021
- Mitsubishi Gas Chemical Company, Inc.
- Masatoshi ECHIGO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION AND PATTERN FORMAT...
- Publication number 20210018841
- Publication date Jan 21, 2021
- Mitsubishi Gas Chemical Company, Inc.
- Takashi SATO
- C07 - ORGANIC CHEMISTRY
Information Patent Application
COMPOUND, RESIN, COMPOSITION, AND FILM FORMING MATERIAL FOR LITHOGR...
- Publication number 20210003921
- Publication date Jan 7, 2021
- Mitsubishi Gas Chemical Company, Inc.
- Masatoshi ECHIGO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOUND, RESIN, RESIST COMPOSITION OR RADIATION-SENSITIVE COMPOSIT...
- Publication number 20200409261
- Publication date Dec 31, 2020
- Mitsubishi Gas Chemical Company, Inc.
- Takumi TOIDA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD, CIRC...
- Publication number 20200361843
- Publication date Nov 19, 2020
- Mitsubishi Gas Chemical Company, Inc.
- Takashi MAKINOSHIMA
- C07 - ORGANIC CHEMISTRY

Takashi MAKINOSHIMA

Person

Patents Grantslast 30 patents

Compound, resin, composition, resist pattern formation method, circ...

Compound, resin, composition, resist pattern formation method, circ...

Compound, resin, resist composition or radiation-sensitive composit...

Compound, resin, resist composition or radiation-sensitive composit...

Material for forming underlayer film for lithography, composition f...

Material for forming underlayer film for lithography, composition f...

Compound, resin, resist composition or radiation-sensitive composit...

Compound, resin, and purification method thereof, material for form...

Compound, resin, material for forming underlayer film for lithograp...

Compound, resin, material for forming underlayer film for lithograp...

Compound, resin, material for forming underlayer film for lithograp...

Compound, resin, material for forming underlayer film for lithograp...

Material for forming underlayer film for lithography, composition f...

Composition for forming underlayer film for lithography, underlayer...

Material for forming film for lithography, composition for forming...

Compound, resin, material for forming underlayer film for lithograp...

Method for purifying compound or resin

Compound, material for forming underlayer film for lithography, und...

Compound, material for forming underlayer film for lithography, und...

Process for producing polyimide film

Low water-absorptive polyimide resin and method for producing same

Patents Applicationslast 30 patents

CARBON DIOXIDE ABSORBENT, METHOD FOR RECOVERING CARBON DIOXIDE, AND...

COMPOSITION FOR FILM FORMATION, RESIST COMPOSITION, RADIATION-SENSI...

RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD, CIRCUIT PATTER...

FILM FORMING COMPOSITION FOR LITHOGRAPHY, RESIST PATTERN FORMATION...

UNDERLAYER FILM FORMING COMPOSITION FOR LITHOGRAPHY, UNDERLAYER FIL...

POLYCYCLIC POLYPHENOLIC RESIN, COMPOSITION, METHOD FOR PRODUCING PO...

POLYMER, COMPOSITION, METHOD FOR PRODUCING POLYMER, COMPOSITION, CO...

COMPOUND, POLYMER, COMPOSITION, COMPOSITION FOR FILM FORMATION, PAT...

UNDERLAYER FILM FORMING COMPOSITION FOR LITHOGRAPHY, UNDERLAYER FIL...

FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FILM FORMATI...

COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD, CIRC...

POLYCYCLIC POLYPHENOLIC RESIN AND METHOD FOR PRODUCING POLYCYCLIC P...

COMPOSITION FOR FILM FORMATION, RESIST COMPOSITION, RADIATION-SENSI...

COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD, CIRC...

FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FILM FORMATI...

FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FILM FORMATI...

FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FILM FORMATI...

COMPOUND, COMPOSITION CONTAINING THE SAME, METHOD FOR FORMING RESIS...

COMPOSITION FOR FORMING OPTICAL COMPONENT, OPTICAL COMPONENT, COMPO...

UNDERLAYER FILM FORMING COMPOSITION

FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FILM FORMATI...

COMPOUND, COMPOSITION CONTAINING THE SAME, METHOD FOR FORMING RESIS...

FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FILM FORMATI...

COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, UNDERLAYER FILM F...

COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD, CIRC...

COMPOUND, RESIN, COMPOSITION AND PATTERN FORMATION METHOD

COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION AND PATTERN FORMAT...

COMPOUND, RESIN, COMPOSITION, AND FILM FORMING MATERIAL FOR LITHOGR...

COMPOUND, RESIN, RESIST COMPOSITION OR RADIATION-SENSITIVE COMPOSIT...

COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD, CIRC...