Takashi OOTAGAKI

Person

Yokohama-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate processing apparatus
- Patent number 10,607,863
- Issue date Mar 31, 2020
- Shibaura Mechatronics Corporation
- Konosuke Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 10,325,787
- Issue date Jun 18, 2019
- Shibaura Mechatronics Corporation
- Konosuke Hayashi
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 10,281,210
- Issue date May 7, 2019
- Shibaura Mechatronics Corporation
- Kunihiro Miyazaki
- F26 - DRYING
Information Patent Grant
Substrate processing device and substrate processing method
- Patent number 10,276,406
- Issue date Apr 30, 2019
- SHIBAURA MECHATRONICS CORPORATION
- Konosuke Hayashi
- B08 - CLEANING
Information Patent Grant
Device and method for treating a substrate with hydrofluoric and ni...
- Patent number 9,972,513
- Issue date May 15, 2018
- Shibaura Mechatronics Corporation
- Yuki Saito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Liquid feeding device and substrate treating device
- Patent number 9,811,096
- Issue date Nov 7, 2017
- Shibaura Mechatronics Corporation
- Konosuke Hayashi
- G05 - CONTROLLING REGULATING
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 9,795,999
- Issue date Oct 24, 2017
- Shibaura Mechatronics Corporation
- Takashi Ootagaki
- B08 - CLEANING
Information Patent Grant
Substrate treatment apparatus and substrate treatment method
- Patent number 9,694,371
- Issue date Jul 4, 2017
- Shibaura Mechatronics Corporation
- Takashi Ootagaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing device and substrate processing method
- Patent number 9,607,865
- Issue date Mar 28, 2017
- Shibaura Mechatronics Corporation
- Konosuke Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing device and substrate processing method
- Patent number 9,553,003
- Issue date Jan 24, 2017
- Shibaura Mechatronics Corporation
- Konosuke Hayashi
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20200135505
- Publication date Apr 30, 2020
- SHIBAURA MECHATRONICS CORPORATION
- Konosuke HAYASHI
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20200135504
- Publication date Apr 30, 2020
- SHIBAURA MECHATRONICS CORPORATION
- Konosuke HAYASHI
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20170278729
- Publication date Sep 28, 2017
- SHIBAURA MECHATRONICS CORPORATION
- Konosuke HAYASHI
- B08 - CLEANING
Information Patent Application
SUBSTRATE TREATING DEVICE AND SUBSTRATE TREATING METHOD
- Publication number 20170256423
- Publication date Sep 7, 2017
- SHIBAURA MECHATRONICS CORPORATION
- Yuki SAITO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LIQUID FEEDING DEVICE AND SUBSTRATE TREATING DEVICE
- Publication number 20160062372
- Publication date Mar 3, 2016
- SHIBAURA MECHATRONICS CORPORATION
- Konosuke HAYASHI
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20160025409
- Publication date Jan 28, 2016
- SHIBAURA MECHATRONICS CORPORATION
- Kunihiro MIYAZAKI
- F26 - DRYING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20150273534
- Publication date Oct 1, 2015
- SHIBAURA MECHATRONICS CORPORATION
- Takashi OOTAGAKI
- B08 - CLEANING
Information Patent Application
SUBSTRATE TREATMENT APPARATUS AND SUBSTRATE TREATMENT METHOD
- Publication number 20150273491
- Publication date Oct 1, 2015
- SHIBAURA MECHATRONICS CORPORATION
- Takashi OOTAGAKI
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD
- Publication number 20140261549
- Publication date Sep 18, 2014
- SHIBAURA MECHATRONICS CORPORATION
- Konosuke HAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD
- Publication number 20140261554
- Publication date Sep 18, 2014
- SHIBAURA MECHATRONICS CORPORATION
- Konosuke HAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD
- Publication number 20140261566
- Publication date Sep 18, 2014
- SHIBAURA MECHATRONICS CORPORATION
- Konosuke HAYASHI
- B08 - CLEANING

Takashi OOTAGAKI

Person

Patents Grantslast 30 patents

Substrate processing apparatus

Substrate processing apparatus and substrate processing method

Substrate processing apparatus and substrate processing method

Substrate processing device and substrate processing method

Device and method for treating a substrate with hydrofluoric and ni...

Liquid feeding device and substrate treating device

Substrate processing apparatus and substrate processing method

Substrate treatment apparatus and substrate treatment method

Substrate processing device and substrate processing method

Substrate processing device and substrate processing method

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS

SUBSTRATE TREATING DEVICE AND SUBSTRATE TREATING METHOD

LIQUID FEEDING DEVICE AND SUBSTRATE TREATING DEVICE

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE TREATMENT APPARATUS AND SUBSTRATE TREATMENT METHOD

SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD