Takashi SEKITO

Person

Shizouka, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Ethynyl derived composite, a composition comprising thereof, a meth...
- Patent number 11,914,296
- Issue date Feb 27, 2024
- Merck Patent GmbH
- Shigemasa Nakasugi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Spin-on compositions comprising an inorganic oxide component and an...
- Patent number 11,767,398
- Issue date Sep 26, 2023
- Merck Patent GmbH
- M. Dalil Rahman
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Ethynyl derived composite, a composition comprising thereof, a meth...
- Patent number 11,609,498
- Issue date Mar 21, 2023
- Merck Patent GmbH
- Shigemasa Nakasugi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Compound, semiconductor material, and methods for manufacturing coa...
- Patent number 11,450,805
- Issue date Sep 20, 2022
- Merck Patent GmbH
- Shigemasa Nakasugi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Allyloxy derivative, resist underlayer forming composition using th...
- Patent number 11,366,389
- Issue date Jun 21, 2022
- Merck Patent GmbH
- Shigemasa Nakasugi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Fine resist pattern-forming composition and pattern forming method...
- Patent number 9,921,481
- Issue date Mar 20, 2018
- AZ Electronic Materials (Luxembourg) S.à r.l.
- Kazuma Yamamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for forming fine resist pattern and pattern forming met...
- Patent number 9,448,485
- Issue date Sep 20, 2016
- Merck Patent GmbH
- Tetsuo Okayasu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Composition for forming fine resist pattern, and pattern formation...
- Patent number 9,411,232
- Issue date Aug 9, 2016
- AZ Electronic Materials (Luxembourg) S.A.R.L.
- Tatsuro Nagahara
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Composition for forming fine resist pattern and pattern formation m...
- Patent number 9,360,756
- Issue date Jun 7, 2016
- AZ Electronic Materials (Luxembourg) S.A.R.L.
- Kazuma Yamamoto
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Photosensitive siloxane resin composition
- Patent number 9,091,920
- Issue date Jul 28, 2015
- Merck Patent GmbH
- Takashi Sekito
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive photosensitive siloxane composition
- Patent number 8,993,214
- Issue date Mar 31, 2015
- AZ Electronic Materials USA Corp.
- Daishi Yokoyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Coating composition containing siloxane resin
- Patent number 8,906,993
- Issue date Dec 9, 2014
- AZ Electronic Materials USA Corp.
- Takashi Sekito
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Positive photosensitive siloxane composition
- Patent number 8,883,397
- Issue date Nov 11, 2014
- AZ Electronic Materials USA Corp.
- Daishi Yokoyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
THICK FILM-FORMING COMPOSITION AND METHOD FOR MANUFACTURING CURED F...
- Publication number 20240337945
- Publication date Oct 10, 2024
- Merck Patent GmbH
- YOSHIO NOJIMA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SUBSTRATE TREATING SOLUTION, AND USING THE SAME, METHOD FOR MANUFAC...
- Publication number 20240166947
- Publication date May 23, 2024
- Merck Patent GmbH
- Takashi SEKITO
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
A SPIN COATING COMPOSITION COMPRISING A CARBON MATERIAL, A METAL OR...
- Publication number 20230236509
- Publication date Jul 27, 2023
- Merch Patent GmbH
- Takashi SEKITO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ETHYNYL DERIVED COMPOSITE, A COMPOSITION COMPRISING THEREOF, A METH...
- Publication number 20230194989
- Publication date Jun 22, 2023
- Merck Patent GmbH
- Shigemasa NAKASUGI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
METHOD FOR MANUFACTURING CURED FILM AND USE OF THE SAME
- Publication number 20220221794
- Publication date Jul 14, 2022
- Merck Patent GmbH
- Takashi SEKITO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SPIN-ON COMPOSITIONS COMPRISING AN INORGANIC OXIDE COMPONENT AND AN...
- Publication number 20220025109
- Publication date Jan 27, 2022
- Merck Patent GmbH
- M. Dalil RAHMAN
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
ALLYLOXY DERIVATIVE, RESIST UNDERLAYER FORMING COMPOSITION USING TH...
- Publication number 20210181636
- Publication date Jun 17, 2021
- Merck Patent GmbH
- Shigemasa NAKASUGI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
AN ETHYNYL DERIVED COMPOSITE, A COMPOSITION COMPRISING THEREOF, A M...
- Publication number 20200401046
- Publication date Dec 24, 2020
- Merck Patent GmbH
- Shigemasa NAKASUGI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NOVEL COMPOUND, SEMICONDUCTOR MATERIAL, AND METHODS FOR MANUFACTURI...
- Publication number 20200044158
- Publication date Feb 6, 2020
- Merck Patent GmbH
- Shigemasa NAKASUGI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
COMPOSITION FOR FORMING FINE RESIST PATTERN AND PATTERN FORMING MET...
- Publication number 20160327867
- Publication date Nov 10, 2016
- Merk Patent GmbH
- Tetsuo OKAYASU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR FORMING FINE RESIST PATTERN, AND PATTERN FORMATION...
- Publication number 20160011508
- Publication date Jan 14, 2016
- Tatsuro NAGAHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FINE RESIST PATTERN-FORMING COMPOSITION AND PATTERN FORMING METHOD...
- Publication number 20160002494
- Publication date Jan 7, 2016
- AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
- Kazuma YAMAMOTO
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOSITION FOR FORMING FINE RESIST PATTERN AND PATTERN FORMATION M...
- Publication number 20150253669
- Publication date Sep 10, 2015
- AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
- Kazuma Yamamoto
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOSITION FOR FORMING FINE RESIST PATTERN AND PATTERN FORMING MET...
- Publication number 20150017587
- Publication date Jan 15, 2015
- AZ Electronic Materials USA Corp.
- Tetsuo Okayasu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE SILOXANE RESIN COMPOSITION
- Publication number 20140335448
- Publication date Nov 13, 2014
- AZ Electronic Materials USA Corp.
- Takashi Sekito
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POSITIVE PHOTOSENSITIVE SILOXANE COMPOSITION
- Publication number 20140335452
- Publication date Nov 13, 2014
- AZ Electronic Materials USA Corp.
- Daishi Yokoyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COATING COMPOSITION CONTAINING SILOXANE RESIN
- Publication number 20140024758
- Publication date Jan 23, 2014
- AZ Electronic Materials USA Corp.
- Takashi Sekito
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POSITIVE PHOTOSENSITIVE SILOXANE COMPOSITION
- Publication number 20130216952
- Publication date Aug 22, 2013
- AZ Electronic Materials USA Corp.
- Daishi Yokoyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Takashi SEKITO

Person

Patents Grantslast 30 patents

Ethynyl derived composite, a composition comprising thereof, a meth...

Spin-on compositions comprising an inorganic oxide component and an...

Ethynyl derived composite, a composition comprising thereof, a meth...

Compound, semiconductor material, and methods for manufacturing coa...

Allyloxy derivative, resist underlayer forming composition using th...

Fine resist pattern-forming composition and pattern forming method...

Composition for forming fine resist pattern and pattern forming met...

Composition for forming fine resist pattern, and pattern formation...

Composition for forming fine resist pattern and pattern formation m...

Photosensitive siloxane resin composition

Positive photosensitive siloxane composition

Coating composition containing siloxane resin

Positive photosensitive siloxane composition

Patents Applicationslast 30 patents

THICK FILM-FORMING COMPOSITION AND METHOD FOR MANUFACTURING CURED F...

SUBSTRATE TREATING SOLUTION, AND USING THE SAME, METHOD FOR MANUFAC...

A SPIN COATING COMPOSITION COMPRISING A CARBON MATERIAL, A METAL OR...

ETHYNYL DERIVED COMPOSITE, A COMPOSITION COMPRISING THEREOF, A METH...

METHOD FOR MANUFACTURING CURED FILM AND USE OF THE SAME

SPIN-ON COMPOSITIONS COMPRISING AN INORGANIC OXIDE COMPONENT AND AN...

ALLYLOXY DERIVATIVE, RESIST UNDERLAYER FORMING COMPOSITION USING TH...

AN ETHYNYL DERIVED COMPOSITE, A COMPOSITION COMPRISING THEREOF, A M...

NOVEL COMPOUND, SEMICONDUCTOR MATERIAL, AND METHODS FOR MANUFACTURI...

COMPOSITION FOR FORMING FINE RESIST PATTERN AND PATTERN FORMING MET...

COMPOSITION FOR FORMING FINE RESIST PATTERN, AND PATTERN FORMATION...

FINE RESIST PATTERN-FORMING COMPOSITION AND PATTERN FORMING METHOD...

COMPOSITION FOR FORMING FINE RESIST PATTERN AND PATTERN FORMATION M...

COMPOSITION FOR FORMING FINE RESIST PATTERN AND PATTERN FORMING MET...

PHOTOSENSITIVE SILOXANE RESIN COMPOSITION

POSITIVE PHOTOSENSITIVE SILOXANE COMPOSITION

COATING COMPOSITION CONTAINING SILOXANE RESIN

POSITIVE PHOTOSENSITIVE SILOXANE COMPOSITION