Takashi Shimada

Person

Kanagawa-ken, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 10,636,708
- Issue date Apr 28, 2020
- Fuji Electric Co., Ltd.
- Takashi Shimada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of recovering a cleaning agent
- Patent number 7,297,315
- Issue date Nov 20, 2007
- Japan Pionics Co., Ltd.
- Kenji Otsuka
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Grant
MEMS element, GLV device, and laser display
- Patent number 7,016,099
- Issue date Mar 21, 2006
- Sony Corporation
- Koichi Ikeda
- G02 - OPTICS
Information Patent Grant
Method of recovering a cleaning agent
- Patent number 6,716,403
- Issue date Apr 6, 2004
- Japan Pionics Co., Ltd.
- Kenji Otsuka
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Grant
Process and apparatus for cleaning exhaust gas
- Patent number 6,331,281
- Issue date Dec 18, 2001
- Japan Pionics Co., Ltd.
- Suehachi Teru
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Detecting agent
- Patent number 5,833,882
- Issue date Nov 10, 1998
- Japan Pionics Co., Ltd.
- Takashi Shimada
- G01 - MEASURING TESTING
Information Patent Grant
Detecting agent
- Patent number 5,665,313
- Issue date Sep 9, 1997
- Japan Pionics Co., Ltd.
- Takashi Shimada
- G01 - MEASURING TESTING
Information Patent Grant
Process for cleaning harmful gas
- Patent number 5,662,872
- Issue date Sep 2, 1997
- Japan Pionics Co., Ltd.
- Takashi Shimada
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Process for cleaning harmful gas
- Patent number 5,597,540
- Issue date Jan 28, 1997
- Japan Pionics Co., Ltd.
- Noboru Akita
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Vacuum melting-pressure pouring induction furnace
- Patent number 5,559,827
- Issue date Sep 24, 1996
- Nippon Mining & Metals Co., Ltd.
- Takashi Shimada
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Process for cleaning harmful gas
- Patent number 5,512,262
- Issue date Apr 30, 1996
- Japan Pionics Co., Ltd.
- Takashi Shimada
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Process for purification of gaseous organometallic compound
- Patent number 5,470,555
- Issue date Nov 28, 1995
- Japan Pionics Co., Ltd.
- Takashi Shimada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Process for cleaning harmful gas
- Patent number 5,378,444
- Issue date Jan 3, 1995
- Japan Pionics Co., Ltd.
- Noboru Akita
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Method for purifying gaseous hydrides
- Patent number 5,019,364
- Issue date May 28, 1991
- Japan Pionics Co., Ltd.
- Koichi Kitahara
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Method for cleaning exhaust gases
- Patent number 4,996,030
- Issue date Feb 26, 1991
- Japan Pionics, Ltd.
- Koichi Kitahara
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Method for purifying gaseous hydrides
- Patent number 4,976,942
- Issue date Dec 11, 1990
- Japan Pionics, Ltd.
- Koichi Kitahara
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Method for cleaning gas containing toxic component
- Patent number 4,910,001
- Issue date Mar 20, 1990
- Japan Pionics, Ltd.
- Koichi Kitahara
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Method for cleaning exhaust gases
- Patent number 4,743,435
- Issue date May 10, 1988
- Japan Pionics., Ltd.
- Koichi Kitahara
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Method for detecting gaseous hydrides
- Patent number 4,731,333
- Issue date Mar 15, 1988
- Japan Pionics., Ltd.
- Koichi Kitahara
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20190287856
- Publication date Sep 19, 2019
- Fuji Electric Co., Ltd.
- Takashi SHIMADA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Processing method of exhaust gas and processing apparatus of exhaus...
- Publication number 20060075895
- Publication date Apr 13, 2006
- Takashi Shimada
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
Processing method of gas and processing apparatus of gas
- Publication number 20060018814
- Publication date Jan 26, 2006
- Takashi Shimada
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
Ingredient and process for producing copper (I) chloride, adsorbent...
- Publication number 20050217483
- Publication date Oct 6, 2005
- Takashi Shimada
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
Method of recovering a cleaning agent
- Publication number 20040151644
- Publication date Aug 5, 2004
- Kenji Otsuka
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
MEMS element, GLV device, and laser display
- Publication number 20040004592
- Publication date Jan 8, 2004
- Koichi Ikeda
- G02 - OPTICS
Information Patent Application
Method fo recovering a cleaning agent
- Publication number 20020084220
- Publication date Jul 4, 2002
- Kenji Otsuka
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
Harmful gas purifying column and method
- Publication number 20020044900
- Publication date Apr 18, 2002
- Japan Pionics Co., Ltd.
- Kenji Otsuka
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL

Takashi Shimada

Person

Patents Grantslast 30 patents

Method of manufacturing semiconductor device

Method of recovering a cleaning agent

MEMS element, GLV device, and laser display

Method of recovering a cleaning agent

Process and apparatus for cleaning exhaust gas

Detecting agent

Detecting agent

Process for cleaning harmful gas

Process for cleaning harmful gas

Vacuum melting-pressure pouring induction furnace

Process for cleaning harmful gas

Process for purification of gaseous organometallic compound

Process for cleaning harmful gas

Method for purifying gaseous hydrides

Method for cleaning exhaust gases

Method for purifying gaseous hydrides

Method for cleaning gas containing toxic component

Method for cleaning exhaust gases

Method for detecting gaseous hydrides

Patents Applicationslast 30 patents

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

Processing method of exhaust gas and processing apparatus of exhaus...

Processing method of gas and processing apparatus of gas

Ingredient and process for producing copper (I) chloride, adsorbent...

Method of recovering a cleaning agent

MEMS element, GLV device, and laser display

Method fo recovering a cleaning agent

Harmful gas purifying column and method