-
Water-soluble photoresist composition
-
Patent number 5,948,592
-
Issue date Sep 7, 1999
-
Fuji Chemicals Industrial Co., Ltd.
-
Hiroshi Umehara
-
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
-
-
-
Pattern-forming material
-
Patent number 4,845,143
-
Issue date Jul 4, 1989
-
Oki Electric Industry Co., Ltd.
-
Toshio Ito
-
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
-
Method of forming a photoresist pattern
-
Patent number 4,801,518
-
Issue date Jan 31, 1989
-
Oki Electric Industry, Co., Ltd.
-
Yoshio Yamashita
-
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY