Takayasu Nihira

Person

Chiba, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Positive photosensitive polyimide resin composition
- Patent number 7,026,080
- Issue date Apr 11, 2006
- Nissan Chemical Industries, Ltd.
- Tomonari Nakayama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positively photosensitive resin composition and method of pattern f...
- Patent number 7,001,705
- Issue date Feb 21, 2006
- Nissan Chemical Industries, Ltd.
- Tadashi Hatanaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polyamic acid resin composition
- Patent number 6,927,012
- Issue date Aug 9, 2005
- Nissan Chemical Industries, Ltd.
- Tadashi Hatanaka
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive photosensitive polyimide resin composition
- Patent number 6,875,554
- Issue date Apr 5, 2005
- Nissan Chemical Industries, Ltd.
- Tadashi Hatanaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Liquid crystal alignment agent and liquid crystal device using the...
- Patent number 6,808,766
- Issue date Oct 26, 2004
- Nissan Chemical Industries, Ltd.
- Yukihiro Miyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Diaminobenzene derivative, polyimide obtained therefrom, and liquid...
- Patent number 6,740,371
- Issue date May 25, 2004
- Nissan Chemical Industries, Ltd.
- Kazuyoshi Hosaka
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive type photosensitive polyimide resin composition
- Patent number 6,677,099
- Issue date Jan 13, 2004
- Nissan Chemical Industries, Ltd.
- Kazuhisa Ishii
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polyimide precursors and polyimides
- Patent number 6,489,431
- Issue date Dec 3, 2002
- Nissan Chemical Industries, Ltd.
- Kazuhisa Ishii
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Alicyclic compound and curable resin composition
- Patent number 6,365,771
- Issue date Apr 2, 2002
- Nissan Chemical Industries, Ltd.
- Hideo Suzuki
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Liquid crystal aligning agent
- Patent number 6,294,639
- Issue date Sep 25, 2001
- Nissan Chemical Industries, Ltd.
- Kiyoshi Sawahata
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Aligning agent for liquid crystal
- Patent number 6,274,695
- Issue date Aug 14, 2001
- Nissan Chemical Industries, Ltd.
- Hideyuki Endou
- G02 - OPTICS
Information Patent Grant
Diaminobenzene derivatives, polyimides prepared therefrom, and alig...
- Patent number 6,111,059
- Issue date Aug 29, 2000
- Nissan Chemical Industries, Ltd.
- Takayasu Nihira
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Diaminobenzene derivatives and polyimides prepared therefrom
- Patent number 5,861,534
- Issue date Jan 19, 1999
- Nissan Chemical Industries, Ltd.
- Takayasu Nihira
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Diaminobenzene derivatives and polyimides prepared therefrom
- Patent number 5,665,856
- Issue date Sep 9, 1997
- Nissan Chemical Industries, Ltd.
- Takayasu Nihira
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Liquid crystal alignment film
- Patent number 5,608,033
- Issue date Mar 4, 1997
- Nissan Chemical Industries, Ltd.
- Takayasu Nihira
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
Positively photosensitive resin composition and method of pattern f...
- Publication number 20050147914
- Publication date Jul 7, 2005
- Nissan Chemical Industries, Ltd.
- Tadashi Hatanaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive photosensitive polyimide resin composition
- Publication number 20040197699
- Publication date Oct 7, 2004
- Tomonari Nakayama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Polyamic acid resin composition
- Publication number 20040175646
- Publication date Sep 9, 2004
- Tadashi Hatanaka
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Positive photosensitive polyimide resin composition
- Publication number 20040048188
- Publication date Mar 11, 2004
- Tadashi Hatanaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Diaminobenzene derivative, polyimide precursor and polyimide employ...
- Publication number 20040048004
- Publication date Mar 11, 2004
- Kazuyoshi Hosaka
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Takayasu Nihira

Person

Patents Grantslast 30 patents

Positive photosensitive polyimide resin composition

Positively photosensitive resin composition and method of pattern f...

Polyamic acid resin composition

Positive photosensitive polyimide resin composition

Liquid crystal alignment agent and liquid crystal device using the...

Diaminobenzene derivative, polyimide obtained therefrom, and liquid...

Positive type photosensitive polyimide resin composition

Polyimide precursors and polyimides

Alicyclic compound and curable resin composition

Liquid crystal aligning agent

Aligning agent for liquid crystal

Diaminobenzene derivatives, polyimides prepared therefrom, and alig...

Diaminobenzene derivatives and polyimides prepared therefrom

Diaminobenzene derivatives and polyimides prepared therefrom

Liquid crystal alignment film

Patents Applicationslast 30 patents

Positively photosensitive resin composition and method of pattern f...

Positive photosensitive polyimide resin composition

Polyamic acid resin composition

Positive photosensitive polyimide resin composition

Diaminobenzene derivative, polyimide precursor and polyimide employ...