Takayoshi Abe

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Filler for affinity chromatography
- Patent number 9,162,161
- Issue date Oct 20, 2015
- JSR Corporation
- Kouji Tamori
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Filler for affinity chromatography
- Patent number 9,090,665
- Issue date Jul 28, 2015
- JSR Corporation
- Kouji Tamori
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Filler for affinity chromatography and method for isolating immunog...
- Patent number 9,051,355
- Issue date Jun 9, 2015
- JSR Corporation
- Kouji Tamori
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Packing material for affinity chromatography
- Patent number 8,846,877
- Issue date Sep 30, 2014
- JSR Corporation
- Kouji Tamori
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resin composition for forming fine pattern and method for forming f...
- Patent number 8,715,901
- Issue date May 6, 2014
- JSR Corporation
- Hirokazu Sakakibara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for pattern formation and resin composition for use in the m...
- Patent number 8,211,624
- Issue date Jul 3, 2012
- JSR Corporation
- Atsushi Nakamura
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resist pattern-forming method and resist pattern miniaturizing resi...
- Patent number 8,206,894
- Issue date Jun 26, 2012
- Takayoshi Abe
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR SUBSTRATE MANUFACTURING METHOD AND COMPOSITION
- Publication number 20240105451
- Publication date Mar 28, 2024
- JSR Corporation
- Eiji YONEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AND COMPOSITION
- Publication number 20240030030
- Publication date Jan 25, 2024
- JSR Corporation
- Ken MARUYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AND COMPOSITION
- Publication number 20240021429
- Publication date Jan 18, 2024
- JSR Corporation
- Ken MARUYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN-FORMING METHOD
- Publication number 20140363773
- Publication date Dec 11, 2014
- JSR Corporation
- Atsushi Nakamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILLER FOR AFFINITY CHROMATOGRAPHY
- Publication number 20130085199
- Publication date Apr 4, 2013
- JSR Corporation
- Kouji Tamori
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
FILLER FOR AFFINITY CHROMATOGRAPHY AND METHOD FOR ISOLATING IMMUNOG...
- Publication number 20130041135
- Publication date Feb 14, 2013
- JSR Corporation
- Kouji Tamori
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
FILLER FOR AFFINITY CHROMATOGRAPHY
- Publication number 20130023650
- Publication date Jan 24, 2013
- JSR Corporation
- Kouji Tamori
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
RESIST PATTERN FORMATION METHOD
- Publication number 20120244478
- Publication date Sep 27, 2012
- JSR Corporation
- Atsushi Nakamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION
- Publication number 20120156621
- Publication date Jun 21, 2012
- JSR Corporation
- Atsushi Nakamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PACKING MATERIAL FOR AFFINITY CHROMATOGRAPHY
- Publication number 20110262748
- Publication date Oct 27, 2011
- JSR Corporation
- Kouji Tamori
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST PATTERN FORMATION METHOD, AND RESIN COMPOSITION CAPABLE OF I...
- Publication number 20100323292
- Publication date Dec 23, 2010
- JSR Corporation
- Atsushi Nakamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST PATTERN-FORMING METHOD AND RESIST PATTERN MINIATURIZING RESI...
- Publication number 20100310988
- Publication date Dec 9, 2010
- JSR Corporation
- Takayoshi ABE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PATTERN FORMATION AND RESIN COMPOSITION FOR USE IN THE M...
- Publication number 20100190104
- Publication date Jul 29, 2010
- JSR Corporation
- Atsushi Nakamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIN COMPOSITION FOR MICROPATTERN FORMATION AND METHOD OF MICROPAT...
- Publication number 20100009292
- Publication date Jan 14, 2010
- JSR Corporation
- Tomoki Nagai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resin Composition for Forming Fine Pattern and Method for Forming F...
- Publication number 20070259287
- Publication date Nov 8, 2007
- Hirokazu Sakakibara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Takayoshi Abe

Person

Patents Grantslast 30 patents

Filler for affinity chromatography

Filler for affinity chromatography

Filler for affinity chromatography and method for isolating immunog...

Packing material for affinity chromatography

Resin composition for forming fine pattern and method for forming f...

Method for pattern formation and resin composition for use in the m...

Resist pattern-forming method and resist pattern miniaturizing resi...

Patents Applicationslast 30 patents

SEMICONDUCTOR SUBSTRATE MANUFACTURING METHOD AND COMPOSITION

METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AND COMPOSITION

METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AND COMPOSITION

PATTERN-FORMING METHOD

FILLER FOR AFFINITY CHROMATOGRAPHY

FILLER FOR AFFINITY CHROMATOGRAPHY AND METHOD FOR ISOLATING IMMUNOG...

FILLER FOR AFFINITY CHROMATOGRAPHY

RESIST PATTERN FORMATION METHOD

RADIATION-SENSITIVE RESIN COMPOSITION

PACKING MATERIAL FOR AFFINITY CHROMATOGRAPHY

RESIST PATTERN FORMATION METHOD, AND RESIN COMPOSITION CAPABLE OF I...

RESIST PATTERN-FORMING METHOD AND RESIST PATTERN MINIATURIZING RESI...

METHOD FOR PATTERN FORMATION AND RESIN COMPOSITION FOR USE IN THE M...

RESIN COMPOSITION FOR MICROPATTERN FORMATION AND METHOD OF MICROPAT...

Resin Composition for Forming Fine Pattern and Method for Forming F...