Takayoshi MORI

Person

Kawasaki-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Resin composition for forming phase-separated structure, method for...
- Patent number 11,472,956
- Issue date Oct 18, 2022
- Tokyo Ohka Kogyo Co., Ltd.
- Teruaki Hayakawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method for forming resist pattern
- Patent number 10,503,068
- Issue date Dec 10, 2019
- Tokyo Ohka Kogyo Co., Ltd.
- Takayoshi Mori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist pattern forming method and developer for lithography
- Patent number 9,964,851
- Issue date May 8, 2018
- Tokyo Ohka Kogyo Co., Ltd.
- Kazufumi Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming resist pattern
- Patent number 9,846,364
- Issue date Dec 19, 2017
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoyuki Hirano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming resist pattern
- Patent number 9,696,625
- Issue date Jul 4, 2017
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoyuki Hirano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming resist pattern, resist pattern splitting agent,...
- Patent number 9,618,845
- Issue date Apr 11, 2017
- Tokyo Ohka Kogyo Co., Ltd.
- Yoichi Hori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming resist pattern and resist composition
- Patent number 9,405,190
- Issue date Aug 2, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Takayoshi Mori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition and method of forming resist pattern
- Patent number 9,244,349
- Issue date Jan 26, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Takayoshi Mori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-type photoresist composition, photoresist laminate, method...
- Patent number 9,091,916
- Issue date Jul 28, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Takahiro Shimizu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and resist pattern forming method
- Patent number 9,052,592
- Issue date Jun 9, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi Nakamura
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Sulfonium salt, method for producing the same, and photoacid generator
- Patent number 8,952,204
- Issue date Feb 10, 2015
- DSP Gokyo Food & Chemical Co., Ltd.
- Hironori Kinoshita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition for immersion exposure, method of forming resist...
- Patent number 8,742,038
- Issue date Jun 3, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Daiju Shiono
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition for immersion exposure, method of forming resist...
- Patent number 8,642,244
- Issue date Feb 4, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Daiju Shiono
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition for immersion exposure, method of forming resist...
- Patent number 8,501,387
- Issue date Aug 6, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Daiju Shiono
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition, method of forming resist pattern, polymeric com...
- Patent number 8,227,170
- Issue date Jul 24, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Takahiro Dazai
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Polymer compound, positive resist composition, and method of formin...
- Patent number 8,105,749
- Issue date Jan 31, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Takahiro Dazai
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive resist composition, method of forming resist pattern, and...
- Patent number 8,088,553
- Issue date Jan 3, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroaki Shimizu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Fluorine-containing compound, resist composition for immersion expo...
- Patent number 7,989,138
- Issue date Aug 2, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Sanae Furuya
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Fluorine-containing compound, resist composition for immersion expo...
- Patent number 7,914,967
- Issue date Mar 29, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Sanae Furuya
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Polymer compound, positive resist composition, and method of formin...
- Patent number 7,767,379
- Issue date Aug 3, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Takahiro Dazai
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polymer compound, positive resist composition and method of forming...
- Patent number 7,745,098
- Issue date Jun 29, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Takahiro Dazai
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
Silver halide photographic emulsion
- Patent number 7,314,707
- Issue date Jan 1, 2008
- FUJIFILM Corporation
- Mikio Ihama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Black and white photothermographic material and image forming method
- Patent number 7,129,032
- Issue date Oct 31, 2006
- Fuji Photo Film Co., Ltd.
- Takayoshi Mori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photothermographic material and image forming method
- Patent number 7,129,033
- Issue date Oct 31, 2006
- Fuji Photo Film Co., Ltd.
- Takayoshi Mori
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photothermographic material and image forming method using the same
- Patent number 7,108,965
- Issue date Sep 19, 2006
- Fuji Photo Film Co., Ltd.
- Takayoshi Mori
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Silver halide photographic emulsion and silver halide photographic...
- Patent number 6,720,134
- Issue date Apr 13, 2004
- Fuji Photo Film Co., Ltd.
- Yasushi Miyamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
RESIN COMPOSITION FOR FORMING PHASE-SEPARATED STRUCTURE, METHOD FOR...
- Publication number 20220017741
- Publication date Jan 20, 2022
- Tokyo Ohka Kogyo Co., Ltd.
- Teruaki HAYAKAWA
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
METHOD FOR FORMING RESIST PATTERN
- Publication number 20170168396
- Publication date Jun 15, 2017
- Tokyo Ohka Kogyo Co., Ltd.
- Takayoshi MORI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST PATTERN FORMING METHOD AND DEVELOPER FOR LITHOGRAPHY
- Publication number 20170059994
- Publication date Mar 2, 2017
- Tokyo Ohka Kogyo Co., Ltd.
- Kazufumi SATO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FORMING RESIST PATTERN
- Publication number 20160349617
- Publication date Dec 1, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoyuki HIRANO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FORMING RESIST PATTERN
- Publication number 20160266495
- Publication date Sep 15, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoyuki HIRANO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR FORMING RESIST PATTERN, RESIST PATTERN SPLITTING AGENT,...
- Publication number 20160091790
- Publication date Mar 31, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Yoichi Hori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR FORMING RESIST PATTERN AND RESIST COMPOSITION
- Publication number 20150118616
- Publication date Apr 30, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Takayoshi Mori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD
- Publication number 20140287360
- Publication date Sep 25, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi Nakamura
- C07 - ORGANIC CHEMISTRY
Information Patent Application
NOVEL SULFONIUM SALT, METHOD FOR PRODUCING THE SAME, AND PHOTOACID...
- Publication number 20140163254
- Publication date Jun 12, 2014
- Hironori Kinoshita
- C07 - ORGANIC CHEMISTRY
Information Patent Application
POSITIVE-TYPE PHOTORESIST COMPOSITION, PHOTORESIST LAMINATE, METHOD...
- Publication number 20130230801
- Publication date Sep 5, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Takahiro Shimizu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION FOR IMMERSION EXPOSURE, METHOD OF FORMING RESIST...
- Publication number 20120077125
- Publication date Mar 29, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Daiju Shiono
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20100310985
- Publication date Dec 9, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Takayoshi MORI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLYMER COMPOUND, POSITIVE RESIST COMPOSITION, AND METHOD OF FORMIN...
- Publication number 20100248148
- Publication date Sep 30, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Takahiro Dazai
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COM...
- Publication number 20100178609
- Publication date Jul 15, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Takahiro Dazai
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND...
- Publication number 20090269694
- Publication date Oct 29, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroaki Shimizu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION FOR IMMERSION EXPOSURE, METHOD OF FORMING RESIST...
- Publication number 20090197204
- Publication date Aug 6, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Daiju Shiono
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION FOR LIQUID IMMERSION LITHOGRAPHY, METHOD OF FORM...
- Publication number 20090186300
- Publication date Jul 23, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Sanae Furuya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FLUORINE-CONTAINING COMPOUND, RESIST COMPOSITION FOR IMMERSION EXPO...
- Publication number 20090142699
- Publication date Jun 4, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Sanae Furuya
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLYMER COMPOUND, POSITIVE RESIST COMPOSITION, AND METHOD OF FORMIN...
- Publication number 20090068590
- Publication date Mar 12, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Takahiro Dazai
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLYMER COMPOUND, POSITIVE RESIST COMPOSITION AND METHOD OF FORMING...
- Publication number 20090061356
- Publication date Mar 5, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Takahiro Dazai
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Application
FLUORINE-CONTAINING COMPOUND, RESIST COMPOSITION FOR IMMERSION EXPO...
- Publication number 20090047602
- Publication date Feb 19, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Sanae Furuya
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Photothermographic material and image forming method using the same
- Publication number 20060057515
- Publication date Mar 16, 2006
- Fuji Photo Film Co., Ltd.
- Takayoshi Mori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photothermographic material and image forming method
- Publication number 20060035178
- Publication date Feb 16, 2006
- Takayoshi Mori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photothermographic material and image forming method using the same
- Publication number 20060035180
- Publication date Feb 16, 2006
- Fuji Photo Film Co., Ltd.
- Takayoshi Mori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Black and white photothermographic material and image forming method
- Publication number 20050118542
- Publication date Jun 2, 2005
- Takayoshi Mori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photosensitive silver halide emulsion, silver halide photographic p...
- Publication number 20050069827
- Publication date Mar 31, 2005
- Fumito Nariyuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Silver halide photographic emulsion and silver halide photographic...
- Publication number 20030068592
- Publication date Apr 10, 2003
- Fuji Photo Film Co., Ltd.
- Yasushi Miyamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Silver halide photographic emulsion
- Publication number 20020068247
- Publication date Jun 6, 2002
- Mikio Ihama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Takayoshi MORI

Person

Patents Grantslast 30 patents

Resin composition for forming phase-separated structure, method for...

Method for forming resist pattern

Resist pattern forming method and developer for lithography

Method of forming resist pattern

Method of forming resist pattern

Method for forming resist pattern, resist pattern splitting agent,...

Method for forming resist pattern and resist composition

Positive resist composition and method of forming resist pattern

Positive-type photoresist composition, photoresist laminate, method...

Resist composition and resist pattern forming method

Sulfonium salt, method for producing the same, and photoacid generator

Resist composition for immersion exposure, method of forming resist...

Resist composition for immersion exposure, method of forming resist...

Resist composition for immersion exposure, method of forming resist...

Resist composition, method of forming resist pattern, polymeric com...

Polymer compound, positive resist composition, and method of formin...

Positive resist composition, method of forming resist pattern, and...

Fluorine-containing compound, resist composition for immersion expo...

Fluorine-containing compound, resist composition for immersion expo...

Polymer compound, positive resist composition, and method of formin...

Polymer compound, positive resist composition and method of forming...

Silver halide photographic emulsion

Black and white photothermographic material and image forming method

Photothermographic material and image forming method

Photothermographic material and image forming method using the same

Silver halide photographic emulsion and silver halide photographic...

Patents Applicationslast 30 patents

RESIN COMPOSITION FOR FORMING PHASE-SEPARATED STRUCTURE, METHOD FOR...

METHOD FOR FORMING RESIST PATTERN

RESIST PATTERN FORMING METHOD AND DEVELOPER FOR LITHOGRAPHY

METHOD OF FORMING RESIST PATTERN

METHOD OF FORMING RESIST PATTERN

METHOD FOR FORMING RESIST PATTERN, RESIST PATTERN SPLITTING AGENT,...

METHOD FOR FORMING RESIST PATTERN AND RESIST COMPOSITION

RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD

NOVEL SULFONIUM SALT, METHOD FOR PRODUCING THE SAME, AND PHOTOACID...

POSITIVE-TYPE PHOTORESIST COMPOSITION, PHOTORESIST LAMINATE, METHOD...

RESIST COMPOSITION FOR IMMERSION EXPOSURE, METHOD OF FORMING RESIST...

POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

POLYMER COMPOUND, POSITIVE RESIST COMPOSITION, AND METHOD OF FORMIN...

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COM...

POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND...

RESIST COMPOSITION FOR IMMERSION EXPOSURE, METHOD OF FORMING RESIST...

RESIST COMPOSITION FOR LIQUID IMMERSION LITHOGRAPHY, METHOD OF FORM...

FLUORINE-CONTAINING COMPOUND, RESIST COMPOSITION FOR IMMERSION EXPO...

POLYMER COMPOUND, POSITIVE RESIST COMPOSITION, AND METHOD OF FORMIN...

POLYMER COMPOUND, POSITIVE RESIST COMPOSITION AND METHOD OF FORMING...

FLUORINE-CONTAINING COMPOUND, RESIST COMPOSITION FOR IMMERSION EXPO...

Photothermographic material and image forming method using the same

Photothermographic material and image forming method

Photothermographic material and image forming method using the same

Black and white photothermographic material and image forming method

Photosensitive silver halide emulsion, silver halide photographic p...

Silver halide photographic emulsion and silver halide photographic...

Silver halide photographic emulsion