Takayoshi Tsutsumi

Person

Nagoya, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Methods for filling a gap and related systems and devices
- Patent number 12,027,365
- Issue date Jul 2, 2024
- ASM IP Holding B.V.
- Zecheng Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective cyclic dry etching process of dielectric materials using...
- Patent number 10,720,334
- Issue date Jul 21, 2020
- ASM IP Holding B.V.
- Rene Henricus Jozef Vervuurt
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Pre-cleaning for etching of dielectric materials
- Patent number 10,720,337
- Issue date Jul 21, 2020
- ASM IP Holding B.V.
- Rene Henricus Jozef Vervuurt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of atomic layer etching using hydrogen plasma
- Patent number 10,504,742
- Issue date Dec 10, 2019
- ASM IP Holding B.V.
- Masaru Zaitsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of cyclic dry etching using etchant film
- Patent number 9,793,135
- Issue date Oct 17, 2017
- ASM IP Holding B.V.
- Masaru Zaitsu
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK BLANK MANUFACTURING METHOD,...
- Publication number 20250036020
- Publication date Jan 30, 2025
- AGC Inc.
- Wataru NISHIDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS AND ASSEMBLIES FOR DEPOSITING MATERIAL IN A GAP
- Publication number 20250006489
- Publication date Jan 2, 2025
- ASM IP HOLDING B.V.
- Ranjit Borude
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
REFLECTION TYPE MASK BLANK AND METHOD FOR MANUFACTURING SAME
- Publication number 20240231215
- Publication date Jul 11, 2024
- AGC Inc.
- Wataru NISHIDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTION TYPE MASK BLANK AND METHOD FOR MANUFACTURING SAME
- Publication number 20240134267
- Publication date Apr 25, 2024
- AGC Inc.
- Wataru NISHIDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ETCHING PROCESSES AND PROCESSING ASSEMBLIES
- Publication number 20230386792
- Publication date Nov 30, 2023
- ASM IP HOLDING B.V.
- Bablu Mukherjee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND SYSTEMS FOR TOPOGRAPHY-SELECTIVE DEPOSITIONS
- Publication number 20220375744
- Publication date Nov 24, 2022
- ASM IP HOLDING B.V.
- Akiko Kobayashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
AREA-SELECTIVE ETCHING
- Publication number 20220359215
- Publication date Nov 10, 2022
- ASM IP HOLDING B.V.
- René Henricus Jozef Vervuurt
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR FILLING A GAP AND RELATED SYSTEMS AND DEVICES
- Publication number 20220165569
- Publication date May 26, 2022
- ASM IP HOLDING B.V.
- Zecheng Liu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELECTIVE CYCLIC DRY ETCHING PROCESS OF DIELECTRIC MATERIALS USING...
- Publication number 20200027740
- Publication date Jan 23, 2020
- ASM IP HOLDING B.V.
- Rene Henricus Jozef Vervuurt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PRE-CLEANING FOR ETCHING OF DIELECTRIC MATERIALS
- Publication number 20200027746
- Publication date Jan 23, 2020
- ASM IP HOLDING B.V.
- Rene Henricus Jozef Vervuurt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF ATOMIC LAYER ETCHING USING HYDROGEN PLASMA
- Publication number 20180350620
- Publication date Dec 6, 2018
- ASM IP HOLDING B.V.
- Masaru Zaitsu
- H01 - BASIC ELECTRIC ELEMENTS

Takayoshi Tsutsumi

Person

Patents Grantslast 30 patents

Methods for filling a gap and related systems and devices

Selective cyclic dry etching process of dielectric materials using...

Pre-cleaning for etching of dielectric materials

Method of atomic layer etching using hydrogen plasma

Method of cyclic dry etching using etchant film

Patents Applicationslast 30 patents

REFLECTIVE MASK BLANK, REFLECTIVE MASK BLANK MANUFACTURING METHOD,...

METHODS AND ASSEMBLIES FOR DEPOSITING MATERIAL IN A GAP

REFLECTION TYPE MASK BLANK AND METHOD FOR MANUFACTURING SAME

REFLECTION TYPE MASK BLANK AND METHOD FOR MANUFACTURING SAME

ETCHING PROCESSES AND PROCESSING ASSEMBLIES

METHODS AND SYSTEMS FOR TOPOGRAPHY-SELECTIVE DEPOSITIONS

AREA-SELECTIVE ETCHING

METHODS FOR FILLING A GAP AND RELATED SYSTEMS AND DEVICES

SELECTIVE CYCLIC DRY ETCHING PROCESS OF DIELECTRIC MATERIALS USING...

PRE-CLEANING FOR ETCHING OF DIELECTRIC MATERIALS

METHOD OF ATOMIC LAYER ETCHING USING HYDROGEN PLASMA