Takayuki Asano

Person

Ibaraki, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Ti-Nb alloy sputtering target and production method thereof
- Patent number 11,837,449
- Issue date Dec 5, 2023
- JX Metals Corporation
- Kunihiro Oda
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Cobalt sputtering target
- Patent number 11,830,711
- Issue date Nov 28, 2023
- JX Metals Corporation
- Kunihiro Oda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Tungsten silicide target and method of manufacturing same
- Patent number 11,046,616
- Issue date Jun 29, 2021
- JX Nippon Mining & Metals Corporation
- Kunihiro Oda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Master alloy for sputtering target and method for producing sputter...
- Patent number 10,704,137
- Issue date Jul 7, 2020
- JX Nippon Mining & Metals Corporation
- Takayuki Asano
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
Tungsten Silicide Target Member And Method For Manufacturing Same,...
- Publication number 20210025049
- Publication date Jan 28, 2021
- JX Nippon Mining & Metals Corporation
- Takafumi Dasai
- B22 - CASTING POWDER METALLURGY
Information Patent Application
Co Anode, And Co Electroplating Method Using Co Anode
- Publication number 20210010149
- Publication date Jan 14, 2021
- JX Nippon Mining & Metals Corporation
- Shuhei Murata
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Master Alloy for Sputtering Target and Method for Producing Sputter...
- Publication number 20200308692
- Publication date Oct 1, 2020
- JX NIPPON MINING & METALS CORPORATION
- Takayuki Asano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Tungsten Silicide Target And Method Of Manufacturing Same
- Publication number 20200071232
- Publication date Mar 5, 2020
- JX NIPPON MINING & METALS CORPORATION
- Kunihiro Oda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Ti-Nb ALLOY SPUTTERING TARGET AND PRODUCTION METHOD THEREOF
- Publication number 20190115196
- Publication date Apr 18, 2019
- JX NIPPON MINING & METALS CORPORATION
- Kunihiro Oda
- B22 - CASTING POWDER METALLURGY
Information Patent Application
Cobalt Sputtering Target
- Publication number 20170236696
- Publication date Aug 17, 2017
- JX Nippon Mining & Metal Corproation
- Kunihiro Oda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Master Alloy For Sputtering Target and Method For Producing Sputter...
- Publication number 20170218502
- Publication date Aug 3, 2017
- JX NIPPON MINING & METALS CORPORATION
- Takayuki Asano
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...

Takayuki Asano

Person

Patents Grantslast 30 patents

Ti-Nb alloy sputtering target and production method thereof

Cobalt sputtering target

Tungsten silicide target and method of manufacturing same

Master alloy for sputtering target and method for producing sputter...

Patents Applicationslast 30 patents

Tungsten Silicide Target Member And Method For Manufacturing Same,...

Co Anode, And Co Electroplating Method Using Co Anode

Master Alloy for Sputtering Target and Method for Producing Sputter...

Tungsten Silicide Target And Method Of Manufacturing Same

Ti-Nb ALLOY SPUTTERING TARGET AND PRODUCTION METHOD THEREOF

Cobalt Sputtering Target

Master Alloy For Sputtering Target and Method For Producing Sputter...