Takayuki Haraguchi

Person

Kanagawa-ken, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Stripping solution for photolithography and pattern formation method
- Patent number 9,436,094
- Issue date Sep 6, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Naohisa Ueno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Nonaqueous cleaning liquid and method for etching processing of sil...
- Patent number 9,250,534
- Issue date Feb 2, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Daijiro Mori
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Cleaning liquid and anticorrosive agent comprising a mercapto compo...
- Patent number 8,802,610
- Issue date Aug 12, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoya Kumagai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Titanium nitride-stripping liquid, and method for stripping titaniu...
- Patent number 8,623,236
- Issue date Jan 7, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Akira Kumazawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method for stripping photoresist
- Patent number 8,354,215
- Issue date Jan 15, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Shigeru Yokoi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Cleaning composition and method of cleaning semiconductor substrate
- Patent number 7,442,675
- Issue date Oct 28, 2008
- Tokyo Ohka Kogyo Co., Ltd.
- Shigeru Yokoi
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Liquid coating composition for forming a top antireflective film an...
- Patent number 7,129,020
- Issue date Oct 31, 2006
- Tokyo Ohka Kogyo Co., Ltd.
- Kazumasa Wakiya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative-working photolithographic patterning material and method f...
- Patent number 6,399,275
- Issue date Jun 4, 2002
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshiki Sugeta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
STRIPPING SOLUTION FOR PHOTOLITHOGRAPHY AND PATTERN FORMATION METHOD
- Publication number 20140087313
- Publication date Mar 27, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Naohisa Ueno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CLEANING LIQUID AND ANTICORROSIVE AGENT
- Publication number 20140018281
- Publication date Jan 16, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoya Kumagai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
NONAQUEOUS CLEANING LIQUID AND METHOD FOR ETCHING PROCESSING OF SIL...
- Publication number 20140017902
- Publication date Jan 16, 2014
- Daijiro Mori
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
CLEANING LIQUID, AND ANTICORROSIVE AGENT
- Publication number 20130172224
- Publication date Jul 4, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoya Kumagai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR STRIPPING PHOTORESIST
- Publication number 20110000874
- Publication date Jan 6, 2011
- Shigeru Yokoi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Treating liquid for photoresist removal and method for treating sub...
- Publication number 20100056411
- Publication date Mar 4, 2010
- Takayuki Haraguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for stripping photoresist
- Publication number 20090291565
- Publication date Nov 26, 2009
- Shigeru Yokoi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Treating liquid for photoresist removal, and method for treating su...
- Publication number 20090176677
- Publication date Jul 9, 2009
- Takayuki Haraguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TITANIUM NITRIDE-STRIPPING LIQUID, AND METHOD FOR STRIPPING TITANIU...
- Publication number 20090017636
- Publication date Jan 15, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Akira Kumazawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Method for stripping photoresist
- Publication number 20080280452
- Publication date Nov 13, 2008
- Shigeru Yokoi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Treating liquid for photoresist removal, and method for treating su...
- Publication number 20080242575
- Publication date Oct 2, 2008
- Takayuki Haraguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for stripping photoresist
- Publication number 20070298619
- Publication date Dec 27, 2007
- Shigeru Yokoi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photoresist stripping solution and method of treating substrate wit...
- Publication number 20070105035
- Publication date May 10, 2007
- Shigeru Yokoi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Treating liquid for photoresist removal, and method for treating su...
- Publication number 20060110690
- Publication date May 25, 2006
- Takayuki Haraguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photoresist stripping solution and method of treating substrate wit...
- Publication number 20060063688
- Publication date Mar 23, 2006
- Shigeru Yokoi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Cleaning solution, method for cleaning semiconductor substrate usin...
- Publication number 20050187118
- Publication date Aug 25, 2005
- Takayuki Haraguchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for removing photoresist
- Publication number 20050176259
- Publication date Aug 11, 2005
- Tokyo Ohka Kogyo Co., Ltd.
- Shigeru Yokoi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Cleaning composition, method of cleaning semiconductor substrate, a...
- Publication number 20040259761
- Publication date Dec 23, 2004
- TOKYO OHKA KOGYO CO., LTD. INTEL CORPORATION
- Shigeru Yokoi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Liquid coating composition for forming a top antireflective film an...
- Publication number 20030219682
- Publication date Nov 27, 2003
- Kazumasa Wakiya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Takayuki Haraguchi

Person

Patents Grantslast 30 patents

Stripping solution for photolithography and pattern formation method

Nonaqueous cleaning liquid and method for etching processing of sil...

Cleaning liquid and anticorrosive agent comprising a mercapto compo...

Titanium nitride-stripping liquid, and method for stripping titaniu...

Method for stripping photoresist

Cleaning composition and method of cleaning semiconductor substrate

Liquid coating composition for forming a top antireflective film an...

Negative-working photolithographic patterning material and method f...

Patents Applicationslast 30 patents

STRIPPING SOLUTION FOR PHOTOLITHOGRAPHY AND PATTERN FORMATION METHOD

CLEANING LIQUID AND ANTICORROSIVE AGENT

NONAQUEOUS CLEANING LIQUID AND METHOD FOR ETCHING PROCESSING OF SIL...

CLEANING LIQUID, AND ANTICORROSIVE AGENT

METHOD FOR STRIPPING PHOTORESIST

Treating liquid for photoresist removal and method for treating sub...

Method for stripping photoresist

Treating liquid for photoresist removal, and method for treating su...

TITANIUM NITRIDE-STRIPPING LIQUID, AND METHOD FOR STRIPPING TITANIU...

Method for stripping photoresist

Treating liquid for photoresist removal, and method for treating su...

Method for stripping photoresist

Photoresist stripping solution and method of treating substrate wit...

Treating liquid for photoresist removal, and method for treating su...

Photoresist stripping solution and method of treating substrate wit...

Cleaning solution, method for cleaning semiconductor substrate usin...

Method for removing photoresist

Cleaning composition, method of cleaning semiconductor substrate, a...

Liquid coating composition for forming a top antireflective film an...