Takayuki Iwamatsu

Person

Abiko, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Exposure mask and method and apparatus for manufacturing the same
- Patent number 5,907,393
- Issue date May 25, 1999
- Kabushiki Kaisha Toshiba
- Kenji Kawano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure mask and method and apparatus for manufacturing the same
- Patent number 5,728,494
- Issue date Mar 17, 1998
- Kabushiki Kaisha Toshiba
- Kenji Kawano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask for light exposure and process for production of the same
- Patent number 5,700,605
- Issue date Dec 23, 1997
- Kabushiki Kaisha Toshiba
- Shin-ichi Ito
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shifting mask and method of forming a pattern using the same
- Patent number 5,686,209
- Issue date Nov 11, 1997
- Kabushiki Kaisha Toshiba
- Takayuki Iwamatsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure mask and method and apparatus for manufacturing the same
- Patent number 5,629,115
- Issue date May 13, 1997
- Kabushiki Kaisha Toshiba
- Kenji Kawano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflection phase shifting mask and method of forming a pattern usin...
- Patent number 5,609,977
- Issue date Mar 11, 1997
- Kabushiki Kaisha Toshiba
- Takayuki Iwamatsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shifting mask comprising a multilayer structure and method of...
- Patent number 5,514,499
- Issue date May 7, 1996
- Kabushiki Kaisha Toshiba
- Takayuki Iwamatsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Takayuki Iwamatsu

Person

Patents Grantslast 30 patents

Exposure mask and method and apparatus for manufacturing the same

Exposure mask and method and apparatus for manufacturing the same

Mask for light exposure and process for production of the same

Phase shifting mask and method of forming a pattern using the same

Exposure mask and method and apparatus for manufacturing the same

Reflection phase shifting mask and method of forming a pattern usin...

Phase shifting mask comprising a multilayer structure and method of...