Takayuki Katano

Person

Nirasaki-Shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 7,401,988
- Issue date Jul 22, 2008
- Tokyo Electron Limited
- Takayuki Katano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 7,208,066
- Issue date Apr 24, 2007
- Tokyo Electron Limited
- Junichi Kitano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Evaluating method of hydrophobic process, forming method of resist...
- Patent number 6,617,095
- Issue date Sep 9, 2003
- Tokyo Electron Limited
- Junichi Kitano
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 6,485,203
- Issue date Nov 26, 2002
- Tokyo Electron Limited
- Takayuki Katano
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Treatment apparatus, treatment method, and impurity removing apparatus
- Patent number 6,333,003
- Issue date Dec 25, 2001
- Tokyo Electron Limited
- Takayuki Katano
- F24 - HEATING RANGES VENTILATING
Information Patent Grant
Method of processing resist onto substrate and resist processing ap...
- Patent number 6,097,469
- Issue date Aug 1, 2000
- Tokyo Electron Limited
- Hidetami Yaegashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Processing apparatus and method using solution
- Patent number 6,063,439
- Issue date May 16, 2000
- Tokyo Electron Limited
- Norio Semba
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Method of processing resist utilizing alkaline component monitoring
- Patent number 6,017,663
- Issue date Jan 25, 2000
- Tokyo Electron Limited
- Hidetami Yaegashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate treatment system
- Patent number 5,944,894
- Issue date Aug 31, 1999
- Tokyo Electron Limited
- Junichi Kitano
- F24 - HEATING RANGES VENTILATING
Information Patent Grant
Method of processing resist utilizing alkaline component monitoring
- Patent number 5,932,380
- Issue date Aug 3, 1999
- Tokyo Electron Limited
- Hidetami Yaegashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Vertical processing apparatus
- Patent number 5,928,390
- Issue date Jul 27, 1999
- Tokyo Electron Limited
- Hidetami Yaegashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treating system and substrate treating method
- Patent number 5,876,280
- Issue date Mar 2, 1999
- Tokyo Electron Limited
- Junichi Kitano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20070127916
- Publication date Jun 7, 2007
- TOKYO ELECTRON LIMITED
- Junichi Kitano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Substrate processing apparatus and substrate processing method
- Publication number 20040050321
- Publication date Mar 18, 2004
- TOKYO ELECTRON LIMITED
- Junichi Kitano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Evaluating method of hydrophobic process, forming method of resist...
- Publication number 20020009592
- Publication date Jan 24, 2002
- TOKYO ELECTRON LIMITED
- Junichi Kitano
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Substrate processing apparatus and substrate processing method
- Publication number 20010013161
- Publication date Aug 16, 2001
- TOKYO ELECTRON LIMITED
- Junichi Kitano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate processing method and substrate processing apparatus
- Publication number 20010014372
- Publication date Aug 16, 2001
- TOKYO ELECTRON LIMITED
- Takayuki Katano
- H01 - BASIC ELECTRIC ELEMENTS

Takayuki Katano

Person

Patents Grantslast 30 patents

Substrate processing apparatus and substrate processing method

Substrate processing apparatus and substrate processing method

Evaluating method of hydrophobic process, forming method of resist...

Substrate processing method and substrate processing apparatus

Treatment apparatus, treatment method, and impurity removing apparatus

Method of processing resist onto substrate and resist processing ap...

Processing apparatus and method using solution

Method of processing resist utilizing alkaline component monitoring

Substrate treatment system

Method of processing resist utilizing alkaline component monitoring

Vertical processing apparatus

Substrate treating system and substrate treating method

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

Substrate processing apparatus and substrate processing method

Evaluating method of hydrophobic process, forming method of resist...

Substrate processing apparatus and substrate processing method

Substrate processing method and substrate processing apparatus