Takayuki Katsunuma

Person

Kurokawa-gun, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma etching method
- Patent number 12,154,792
- Issue date Nov 26, 2024
- Tokyo Electron Limited
- Takayuki Katsunuma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method, substrate processing apparatus, and substrate proce...
- Patent number 12,112,954
- Issue date Oct 8, 2024
- Tokyo Electron Limited
- Maju Tomura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method, method for manufacturing semiconducor...
- Patent number 11,955,316
- Issue date Apr 9, 2024
- Tokyo Electron Limited
- Takayuki Katsunuma
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing method and substrate processing system
- Patent number 11,955,337
- Issue date Apr 9, 2024
- Tokyo Electron Limited
- Toru Hisamatsu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of etching film and plasma processing apparatus
- Patent number 11,664,236
- Issue date May 30, 2023
- Tokyo Electron Limited
- Takayuki Katsunuma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for etching film and plasma processing apparatus
- Patent number 11,637,003
- Issue date Apr 25, 2023
- Tokyo Electron Limited
- Tomohiko Niizeki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 11,501,975
- Issue date Nov 15, 2022
- Tokyo Electron Limited
- Daisuke Nishide
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method, plasma processing apparatus, and substrate processi...
- Patent number 11,476,123
- Issue date Oct 18, 2022
- Tokyo Electron Limited
- Takayuki Katsunuma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for controlling a shape of a pattern over a su...
- Patent number 11,443,954
- Issue date Sep 13, 2022
- Tokyo Electron Limited
- Takayuki Katsunuma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and device for controlling a thickness of a protective film...
- Patent number 11,417,527
- Issue date Aug 16, 2022
- Tokyo Electron Limited
- Takayuki Katsunuma
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing method
- Patent number 11,264,236
- Issue date Mar 1, 2022
- Tokyo Electron Limited
- Toru Hisamatsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method
- Patent number 11,114,304
- Issue date Sep 7, 2021
- Tokyo Electron Limited
- Takayuki Katsunuma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of etching film and plasma processing apparatus
- Patent number 10,923,360
- Issue date Feb 16, 2021
- Tokyo Electron Limited
- Takayuki Katsunuma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method
- Patent number 10,916,442
- Issue date Feb 9, 2021
- Tokyo Electron Limited
- Takayuki Katsunuma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method
- Patent number 10,854,430
- Issue date Dec 1, 2020
- Tokyo Electron Limited
- Takayuki Katsunuma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method
- Patent number 10,854,470
- Issue date Dec 1, 2020
- Tokyo Electron Limited
- Takayuki Katsunuma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method and plasma processing apparatus
- Patent number 10,811,274
- Issue date Oct 20, 2020
- Tokyo Electron Limited
- Takayuki Katsunuma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method
- Patent number 10,541,147
- Issue date Jan 21, 2020
- Tokyo Electron Limited
- Masahiro Tabata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective plasma etching method of a first region containing a sili...
- Patent number 10,090,191
- Issue date Oct 2, 2018
- Tokyo Electron Limited
- Maju Tomura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method
- Patent number 9,899,232
- Issue date Feb 20, 2018
- Tokyo Electron Limited
- Takayuki Katsunuma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a semiconductor device
- Patent number 9,881,806
- Issue date Jan 30, 2018
- Tokyo Electron Limited
- Takayuki Katsunuma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for etching organic film
- Patent number 9,735,027
- Issue date Aug 15, 2017
- Tokyo Electron Limited
- Chungjong Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method and plasma etching apparatus
- Patent number 9,460,897
- Issue date Oct 4, 2016
- Tokyo Electron Limited
- Takayuki Katsunuma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method
- Patent number 9,396,962
- Issue date Jul 19, 2016
- Tokyo Electron Limited
- Keiji Kitagaito
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma etching method and semiconductor device manufacturing method
- Patent number 9,330,930
- Issue date May 3, 2016
- Tokyo Electron Limited
- Kazuhiro Kubota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a semiconductor device
- Patent number 9,318,340
- Issue date Apr 19, 2016
- Tokyo Electron Limited
- Takayuki Katsunuma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method and plasma processing apparatus
- Patent number 9,147,580
- Issue date Sep 29, 2015
- Tokyo Electron Limited
- Takayuki Katsunuma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 9,087,676
- Issue date Jul 21, 2015
- Tokyo Electron Limited
- Takayuki Katsunuma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method and semiconductor device manufacturing method
- Patent number 9,048,178
- Issue date Jun 2, 2015
- Tokyo Electron Limited
- Kazuhiro Kubota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device manufacturing method and computer-readable sto...
- Patent number 8,735,299
- Issue date May 27, 2014
- Tokyo Electron Limited
- Seiichi Watanabe
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20240355590
- Publication date Oct 24, 2024
- TOKYO ELECTRON LIMITED
- Takayuki KATSUNUMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM
- Publication number 20240282578
- Publication date Aug 22, 2024
- TOKYO ELECTRON LIMITED
- Toru HISAMATSU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ETCHING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20230420263
- Publication date Dec 28, 2023
- TOKYO ELECTRON LIMITED
- Takayuki KATSUNUMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20230282447
- Publication date Sep 7, 2023
- TOKYO ELECTRON LIMITED
- Takahiro YONEZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR ETCHING FILM AND PLASMA PROCESSING APPARATUS
- Publication number 20230215707
- Publication date Jul 6, 2023
- TOKYO ELECTRON LIMITED
- Tomohiko NIIZEKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD, PLASMA PROCESSING APPARATUS, AND SUBSTRATE PROCESSI...
- Publication number 20230058079
- Publication date Feb 23, 2023
- TOKYO ELECTRON LIMITED
- Takayuki KATSUNUMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR CONTROLLING A SHAPE OF A PATTERN OVER A SU...
- Publication number 20220375764
- Publication date Nov 24, 2022
- TOKYO ELECTRON LIMITED
- Takayuki KATSUNUMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND DEVICE FOR CONTROLLING A THICKNESS OF A PROTECTIVE FILM...
- Publication number 20220344158
- Publication date Oct 27, 2022
- TOKYO ELECTRON LIMITED
- Takayuki KATSUNUMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM
- Publication number 20220115235
- Publication date Apr 14, 2022
- TOKYO ELECTRON LIMITED
- Toru HISAMATSU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND DEVICE FOR CONTROLLING A THICKNESS OF A PROTECTIVE FILM...
- Publication number 20220068645
- Publication date Mar 3, 2022
- TOKYO ELECTRON LIMITED
- Takayuki KATSUNUMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20220068629
- Publication date Mar 3, 2022
- TOKYO ELECTRON LIMITED
- Takayuki KATSUNUMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD, SUBSTRATE PROCESSING APPARATUS, AND SUBSTRATE PROCE...
- Publication number 20210233778
- Publication date Jul 29, 2021
- TOKYO ELECTRON LIMITED
- Maju TOMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20210202262
- Publication date Jul 1, 2021
- TOKYO ELECTRON LIMITED
- Daisuke NISHIDE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR CONTROLLING A SHAPE OF A PATTERN OVER A SU...
- Publication number 20210175091
- Publication date Jun 10, 2021
- TOKYO ELECTRON LIMITED
- Takayuki KATSUNUMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR ETCHING FILM AND PLASMA PROCESSING APPARATUS
- Publication number 20210151301
- Publication date May 20, 2021
- TOKYO ELECTRON LIMITED
- Tomohiko NIIZEKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF ETCHING FILM AND PLASMA PROCESSING APPARATUS
- Publication number 20210143019
- Publication date May 13, 2021
- TOKYO ELECTRON LIMITED
- Takayuki KATSUNUMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD
- Publication number 20210134604
- Publication date May 6, 2021
- TOKYO ELECTRON LIMITED
- Takayuki KATSUNUMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD, METHOD FOR MANUFACTURING SEMICONDUCOR...
- Publication number 20210098234
- Publication date Apr 1, 2021
- TOKYO ELECTRON LIMITED
- Takayuki KATSUNUMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ETCHING METHOD, PLASMA PROCESSING APPARATUS, AND SUBSTRATE PROCESSI...
- Publication number 20210082713
- Publication date Mar 18, 2021
- TOKYO ELECTRON LIMITED
- Takayuki KATSUNUMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING METHOD
- Publication number 20210050222
- Publication date Feb 18, 2021
- TOKYO ELECTRON LIMITED
- Takayuki Katsunuma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD
- Publication number 20200194257
- Publication date Jun 18, 2020
- TOKYO ELECTRON LIMITED
- Toru HISAMATSU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD
- Publication number 20200176265
- Publication date Jun 4, 2020
- TOKYO ELECTRON LIMITED
- Takayuki KATSUNUMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD
- Publication number 20200111679
- Publication date Apr 9, 2020
- TOKYO ELECTRON LIMITED
- Masahiro TABATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF ETCHING FILM AND PLASMA PROCESSING APPARATUS
- Publication number 20190362984
- Publication date Nov 28, 2019
- TOKYO ELECTRON LIMITED
- Takayuki KATSUNUMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20190318936
- Publication date Oct 17, 2019
- TOKYO ELECTRON LIMITED
- Takayuki KATSUNUMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING METHOD
- Publication number 20190139781
- Publication date May 9, 2019
- TOKYO ELECTRON LIMITED
- Takayuki Katsunuma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING METHOD
- Publication number 20180151333
- Publication date May 31, 2018
- TOKYO ELECTRON LIMITED
- Takayuki KATSUNUMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD
- Publication number 20180130670
- Publication date May 10, 2018
- TOKYO ELECTRON LIMITED
- Takayuki KATSUNUMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD
- Publication number 20170323825
- Publication date Nov 9, 2017
- TOKYO ELECTRON LIMITED
- Maju Tomura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD
- Publication number 20170011939
- Publication date Jan 12, 2017
- TOKYO ELECTRON LIMITED
- Masahiro TABATA
- H01 - BASIC ELECTRIC ELEMENTS

Takayuki Katsunuma

Person

Patents Grantslast 30 patents

Plasma etching method

Etching method, substrate processing apparatus, and substrate proce...

Substrate processing method, method for manufacturing semiconducor...

Substrate processing method and substrate processing system

Method of etching film and plasma processing apparatus

Method for etching film and plasma processing apparatus

Substrate processing method and substrate processing apparatus

Etching method, plasma processing apparatus, and substrate processi...

Method and apparatus for controlling a shape of a pattern over a su...

Method and device for controlling a thickness of a protective film...

Substrate processing method

Substrate processing method

Method of etching film and plasma processing apparatus

Etching method

Plasma etching method

Plasma etching method

Etching method and plasma processing apparatus

Etching method

Selective plasma etching method of a first region containing a sili...

Etching method

Method of manufacturing a semiconductor device

Method for etching organic film

Plasma etching method and plasma etching apparatus

Etching method

Plasma etching method and semiconductor device manufacturing method

Method of manufacturing a semiconductor device

Plasma etching method and plasma processing apparatus

Plasma processing method and plasma processing apparatus

Plasma etching method and semiconductor device manufacturing method

Semiconductor device manufacturing method and computer-readable sto...

Patents Applicationslast 30 patents

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM

ETCHING METHOD AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

METHOD FOR ETCHING FILM AND PLASMA PROCESSING APPARATUS

ETCHING METHOD, PLASMA PROCESSING APPARATUS, AND SUBSTRATE PROCESSI...

METHOD AND APPARATUS FOR CONTROLLING A SHAPE OF A PATTERN OVER A SU...

METHOD AND DEVICE FOR CONTROLLING A THICKNESS OF A PROTECTIVE FILM...

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM

METHOD AND DEVICE FOR CONTROLLING A THICKNESS OF A PROTECTIVE FILM...

SUBSTRATE PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

ETCHING METHOD, SUBSTRATE PROCESSING APPARATUS, AND SUBSTRATE PROCE...

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

METHOD AND APPARATUS FOR CONTROLLING A SHAPE OF A PATTERN OVER A SU...

METHOD FOR ETCHING FILM AND PLASMA PROCESSING APPARATUS

METHOD OF ETCHING FILM AND PLASMA PROCESSING APPARATUS

ETCHING METHOD

SUBSTRATE PROCESSING METHOD, METHOD FOR MANUFACTURING SEMICONDUCOR...

ETCHING METHOD, PLASMA PROCESSING APPARATUS, AND SUBSTRATE PROCESSI...

PLASMA ETCHING METHOD

SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING METHOD

ETCHING METHOD

METHOD OF ETCHING FILM AND PLASMA PROCESSING APPARATUS

ETCHING METHOD AND PLASMA PROCESSING APPARATUS

PLASMA ETCHING METHOD

PLASMA ETCHING METHOD

ETCHING METHOD

ETCHING METHOD

ETCHING METHOD