Takayuki OHNISHI

Person

Konan-ku, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method for evaluating charged particle beam drawing apparatus
- Patent number 9,812,289
- Issue date Nov 7, 2017
- NuFlare Technology, Inc.
- Satoru Hirose
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming resist film and charged particle beam writing me...
- Patent number 9,633,820
- Issue date Apr 25, 2017
- NuFlare Technology, Inc.
- Takayuki Ohnishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for evaluating charged particle beam drawing apparatus
- Patent number 9,514,915
- Issue date Dec 6, 2016
- NuFlare Technology, Inc.
- Satoru Hirose
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam writing apparatus, and charged particle beam...
- Patent number 9,190,245
- Issue date Nov 17, 2015
- NuFlare Technology, Inc.
- Tomoo Motosugi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus of mask drawing using a grounding body at lowe...
- Patent number 8,742,376
- Issue date Jun 3, 2014
- Nuflare Technology, Inc.
- Takayuki Ohnishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask blank and method of manufacturing mask
- Patent number 8,367,276
- Issue date Feb 5, 2013
- Hoya Corporation
- Yasushi Okubo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method, charged particle beam writing apparatus, an...
- Patent number 8,133,402
- Issue date Mar 13, 2012
- Nuflare Technology, Inc.
- Takayuki Ohnishi
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR EVALUATING CHARGED PARTICLE BEAM DRAWING APPARATUS
- Publication number 20160365223
- Publication date Dec 15, 2016
- NuFlare Technology, Inc.
- Satoru HIROSE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR EVALUATING CHARGED PARTICLE BEAM DRAWING APPARATUS
- Publication number 20160233052
- Publication date Aug 11, 2016
- NuFlare Technology, Inc.
- Satoru HIROSE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING RESIST FILM AND CHARGED PARTICLE BEAM WRITING ME...
- Publication number 20160111253
- Publication date Apr 21, 2016
- NuFlare Technology, Inc.
- Takayuki OHNISHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS, AND CHARGED PARTICLE BEAM...
- Publication number 20150228455
- Publication date Aug 13, 2015
- NuFlare Technology, Inc.
- Tomoo MOTOSUGI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM WRITING METHOD
- Publication number 20140197326
- Publication date Jul 17, 2014
- NUFLARE TECHNOLOGY, INC.
- Takayuki OHNISHI
- B82 - NANO-TECHNOLOGY
Information Patent Application
MASK DRAWING METHOD, MASK DRAWING APPARATUS
- Publication number 20140001380
- Publication date Jan 2, 2014
- NuFlare Technology, Inc.
- Takayuki OHNISHI
- B82 - NANO-TECHNOLOGY
Information Patent Application
MASK BLANK AND METHOD OF MANUFACTURING MASK
- Publication number 20090075185
- Publication date Mar 19, 2009
- HOYA CORPORATION
- Yasushi OKUBO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD, CHARGED PARTICLE BEAM WRITING APPARATUS, AN...
- Publication number 20080185538
- Publication date Aug 7, 2008
- NuFlare Technology, Inc.
- Takayuki OHNISHI
- B82 - NANO-TECHNOLOGY
Information Patent Application
FORMING METHOD OF RESIST PATTERN AND WRITING METHOD OF CHARGED PART...
- Publication number 20070243487
- Publication date Oct 18, 2007
- NuFlare Technology, Inc.
- Hirohito Anze
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Takayuki OHNISHI

Person

Patents Grantslast 30 patents

Method for evaluating charged particle beam drawing apparatus

Method for forming resist film and charged particle beam writing me...

Method for evaluating charged particle beam drawing apparatus

Charged particle beam writing apparatus, and charged particle beam...

Method and apparatus of mask drawing using a grounding body at lowe...

Mask blank and method of manufacturing mask

Pattern forming method, charged particle beam writing apparatus, an...

Patents Applicationslast 30 patents

METHOD FOR EVALUATING CHARGED PARTICLE BEAM DRAWING APPARATUS

METHOD FOR EVALUATING CHARGED PARTICLE BEAM DRAWING APPARATUS

METHOD FOR FORMING RESIST FILM AND CHARGED PARTICLE BEAM WRITING ME...

CHARGED PARTICLE BEAM WRITING APPARATUS, AND CHARGED PARTICLE BEAM...

CHARGED PARTICLE BEAM WRITING METHOD

MASK DRAWING METHOD, MASK DRAWING APPARATUS

MASK BLANK AND METHOD OF MANUFACTURING MASK

PATTERN FORMING METHOD, CHARGED PARTICLE BEAM WRITING APPARATUS, AN...

FORMING METHOD OF RESIST PATTERN AND WRITING METHOD OF CHARGED PART...