Takeharu Motokawa

Person

Zushi-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method of manufacturing template and method of forming pattern
- Patent number 11,931,923
- Issue date Mar 19, 2024
- Kioxia Corporation
- Takeharu Motokawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 11,789,365
- Issue date Oct 17, 2023
- Kioxia Corporation
- Ryu Komatsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern forming method and template manufacturing method
- Patent number 11,493,846
- Issue date Nov 8, 2022
- Kioxia Corporation
- Takeharu Motokawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern-forming method
- Patent number 10,811,252
- Issue date Oct 20, 2020
- TOSHIBA MEMORY CORPORATION
- Ryosuke Yamamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 10,111,313
- Issue date Oct 23, 2018
- Shibaura Mechatronics Corporation
- Takeharu Motokawa
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Phase separation observation method, phase separation observation a...
- Patent number 9,976,948
- Issue date May 22, 2018
- TOSHIBA MEMORY CORPORATION
- Takeharu Motokawa
- G01 - MEASURING TESTING
Information Patent Grant
Patterning method, and template for nanoimprint and producing metho...
- Patent number 9,841,674
- Issue date Dec 12, 2017
- TOSHIBA MEMORY CORPORATION
- Hideaki Sakurai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for manufacturing reflective mask and apparatus for manufact...
- Patent number 9,507,251
- Issue date Nov 29, 2016
- Shibaura Mechatronics Corporation
- Tomoaki Yoshimori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Plasma etching apparatus
- Patent number 8,834,674
- Issue date Sep 16, 2014
- Kabushiki Kaisha Toshiba
- Takeharu Motokawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for manufacturing reflective mask and apparatus for manufact...
- Patent number 8,702,901
- Issue date Apr 22, 2014
- Shibaura Mechatronics Corporation
- Tomoaki Yoshimori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
TARGET PROCESSING DEVICE AND TARGET PROCESSING METHOD
- Publication number 20240096601
- Publication date Mar 21, 2024
- KIOXIA Corporation
- Takeharu MOTOKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD, ETCHING APPARATUS, MANUFACTURING METHOD OF SEMICOND...
- Publication number 20230307233
- Publication date Sep 28, 2023
- KIOXIA Corporation
- Noriko Sakurai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TEMPLATE AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
- Publication number 20230296979
- Publication date Sep 21, 2023
- KIOXIA Corporation
- Takeharu MOTOKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA TREATMENT APPARATUS, PLASMA TREATMENT METHOD, AND ORIGINAL P...
- Publication number 20230290619
- Publication date Sep 14, 2023
- KIOXIA Corporation
- Takeharu MOTOKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TEMPLATE AND MANUFACTURING METHOD THEREOF
- Publication number 20220291581
- Publication date Sep 15, 2022
- KIOXIA Corporation
- Takeharu MOTOKAWA
- B82 - NANO-TECHNOLOGY
Information Patent Application
PATTERN FORMATION METHOD AND TEMPLATE MANUFACTURING METHOD
- Publication number 20220206382
- Publication date Jun 30, 2022
- KIOXIA Corporation
- Noriko SAKURAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING TEMPLATE AND METHOD OF FORMING PATTERN
- Publication number 20210291408
- Publication date Sep 23, 2021
- KIOXIA Corporation
- Takeharu MOTOKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING APPARATUS AND PROCESSING METHOD
- Publication number 20210238739
- Publication date Aug 5, 2021
- KIOXIA Corporation
- Ryu KOMATSU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN FORMING METHOD AND TEMPLATE MANUFACTURING METHOD
- Publication number 20210088906
- Publication date Mar 25, 2021
- KIOXIA Corporation
- Takeharu MOTOKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20210080831
- Publication date Mar 18, 2021
- KIOXIA Corporation
- Ryu KOMATSU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN-FORMING METHOD
- Publication number 20190259606
- Publication date Aug 22, 2019
- Toshiba Memory Corporation
- Ryosuke YAMAMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTI-PROCESSING APPARATUS AND METHOD FOR MANUFACTURING SEMICONDUCT...
- Publication number 20160240411
- Publication date Aug 18, 2016
- Kabushiki Kaisha Toshiba
- Takeharu MOTOKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERNING METHOD, AND TEMPLATE FOR NANOIMPRINT AND PRODUCING METHO...
- Publication number 20160077436
- Publication date Mar 17, 2016
- Kabushiki Kaisha Toshiba
- Hideaki SAKURAI
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
PATTERN FORMING METHOD, PHOTOMASK, AND TEMPLATE FOR NANOIMPRINT
- Publication number 20160068429
- Publication date Mar 10, 2016
- Kabushiki Kaisha Toshiba
- Masatoshi TERAYAMA
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
PATTERNING METHOD
- Publication number 20160068430
- Publication date Mar 10, 2016
- Kabushiki Kaisha Toshiba
- Machiko SUENAGA
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
PHASE SEPARATION OBSERVATION METHOD, PHASE SEPARATION OBSERVATION A...
- Publication number 20160061716
- Publication date Mar 3, 2016
- Kabushiki Kaisha Toshiba
- TAKEHARU MOTOKAWA
- G01 - MEASURING TESTING
Information Patent Application
METHOD FOR MANUFACTURING REFLECTIVE MASK AND APPARATUS FOR MANUFACT...
- Publication number 20140186754
- Publication date Jul 3, 2014
- Kabushiki Kaisha Toshiba
- Tomoaki Yoshimori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20130256270
- Publication date Oct 3, 2013
- Kabushiki Kaisha Toshiba
- Takeharu MOTOKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING REFLECTIVE MASK AND APPARATUS FOR MANUFACT...
- Publication number 20120129083
- Publication date May 24, 2012
- Kabushiki Kaisha Toshiba
- Tomoaki Yoshimori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PLASMA ETCHING APPARATUS
- Publication number 20100300623
- Publication date Dec 2, 2010
- Takeharu Motokawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20080283500
- Publication date Nov 20, 2008
- Takeharu MOTOKAWA
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Photomask plasma etching apparatus, etching method, and photomask f...
- Publication number 20060292727
- Publication date Dec 28, 2006
- Takeharu Motokawa
- H01 - BASIC ELECTRIC ELEMENTS

Takeharu Motokawa

Person

Patents Grantslast 30 patents

Method of manufacturing template and method of forming pattern

Substrate processing method and substrate processing apparatus

Pattern forming method and template manufacturing method

Pattern-forming method

Plasma processing apparatus and plasma processing method

Phase separation observation method, phase separation observation a...

Patterning method, and template for nanoimprint and producing metho...

Method for manufacturing reflective mask and apparatus for manufact...

Plasma etching apparatus

Method for manufacturing reflective mask and apparatus for manufact...

Patents Applicationslast 30 patents

TARGET PROCESSING DEVICE AND TARGET PROCESSING METHOD

ETCHING METHOD, ETCHING APPARATUS, MANUFACTURING METHOD OF SEMICOND...

TEMPLATE AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE

PLASMA TREATMENT APPARATUS, PLASMA TREATMENT METHOD, AND ORIGINAL P...

TEMPLATE AND MANUFACTURING METHOD THEREOF

PATTERN FORMATION METHOD AND TEMPLATE MANUFACTURING METHOD

METHOD OF MANUFACTURING TEMPLATE AND METHOD OF FORMING PATTERN

PROCESSING APPARATUS AND PROCESSING METHOD

PATTERN FORMING METHOD AND TEMPLATE MANUFACTURING METHOD

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

PATTERN-FORMING METHOD

MULTI-PROCESSING APPARATUS AND METHOD FOR MANUFACTURING SEMICONDUCT...

PATTERNING METHOD, AND TEMPLATE FOR NANOIMPRINT AND PRODUCING METHO...

PATTERN FORMING METHOD, PHOTOMASK, AND TEMPLATE FOR NANOIMPRINT

PATTERNING METHOD

PHASE SEPARATION OBSERVATION METHOD, PHASE SEPARATION OBSERVATION A...

METHOD FOR MANUFACTURING REFLECTIVE MASK AND APPARATUS FOR MANUFACT...

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

METHOD FOR MANUFACTURING REFLECTIVE MASK AND APPARATUS FOR MANUFACT...

PLASMA ETCHING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

Photomask plasma etching apparatus, etching method, and photomask f...